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arXiv:cond-mat/0605532

Self-shunted Al/AlOx/Al Josephson junctions

S. V. Lotkhov, E. Tolkacheva, D Balashov, M. Khabipov, F.-I. Buchholz, Alexander B Zorin

Published May 22, 2006• 1 citation
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Abstract

Self-shunted aluminum Josephson junctions with high-transparency barriers were fabricated using the shadow-evaporation technique and measured at low temperatures, T=25 mK. Due to high junction transparency, the IV-characteristics were found to be of only small hysteresis with retrapping-to-switching current ratio of up to 80%. The observed critical currents were close to the Ambegaokar-Baratoff values (up to 80-100%). Good barrier quality was confirmed by the low subgap leakage currents in the quasiparticle branches, which makes the self-shunted Al junctions promising for application in integrated RSFQ-qubit circuitry.

DOI
10.48550/arxiv.cond-mat/0605532

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Self-shunted aluminum Josephson junctions with high-transparency barriers were fabricated using the shadow-evaporation technique and measured at low temperatures, T=25 mK. Due to high junction transparency, the IV-characteristics were found to be of only small hysteresis with retrapping-to-switching current ratio of up to 80%. The observed critical currents were close to the Ambegaokar-Baratoff values (up to 80-100%). Good barrier quality was confirmed by the low subgap leakage currents in the quasiparticle branches, which makes the self-shunted Al junctions promising for application in integrated RSFQ-qubit circuitry.
All-aluminum Josephson junctions with high-transparency barriers were fabricated using the shadow-evaporation technique and measured at low temperatures, T≈25mK. Due to the high junction transparency, the IV characteristics showed only small hysteresis with a retrapping-to-switching current ratio of up to 80%. The observed critical currents were as large as 80%-100% of the Ambegaokar-Baratoff values. High barrier quality was confirmed by the low subgap leakage currents in the quasiparticle branches, which makes the low hysteretic Al junctions promising for application in integrated rapid single-flux quantum - qubit circuitry.
Improved Characteristics of Intrinsically Shunted Nb/Al−AlOx−Nb{\rm Nb/Al}-{\rm AlO}_{x}-{\rm Nb}Nb/Al−AlOx​−Nb Josephson Junctions
Josephson junctions with non-hysteretic current-voltage characteristics form the basis of most superconducting electronic circuits including RSFQ logic and programmable Josephson voltage standards. In contrast to conventional SIS devices, Nb/Al-AlOx-Nb (SNIS) junctions with an additional comparatively thick Al interlayer and a comparatively thin barrier AlOxare intrinsically shunted at T ≥ 4.2 K . In this contribution, we provide experimental and theoretical arguments proving that this finding is mainly explained by a broad distribution of highly-conductive barrier transparencies with a significant effect from nearly ballistic modes. An additional advantage of the proposed SNIS junctions is possibility to tune the critical voltage value by modifying Nb and/or Al film thicknesses. With observations of wide Shapiro steps up to 1.25 V at 6.3 K we show that this type of Josephson junctions can be successfully used at temperatures above 4.2 K. The presence of well-developed quantized voltage features even at 7.2 K means that Nb/Al-AlOx-Nb devices can successfully operate far above the liquid helium temperature and, in principle, are compatible with two-stage cryocoolers.
To increase the integration scale of superconductor electronics, we are developing a new node, titled SFQ7ee, of the fabrication process at MIT Lincoln Laboratory. In comparison to the existing SFQ5ee node, we increased the number of fully planarized superconducting layers to ten and utilized NbN and NbN/Nb kinetic inductors to increase the possible inductor number density above a hundred million inductors per cm2. Increasing the Josephson junction number density to the same level requires implementing self-shunted high-JcJosephson junctions. We investigated the properties of Nb/NbNx/Nb trilayer junctions as a potential replacement of high-JcNb/Al-AlOx/Nb junctions, where NbNxis a disordered, overstoichiometric, nonsuperconducting nitride deposited by reactive sputtering. Dependences of theIcRnproduct and Josephson critical current density, Jc on the NbNx barrier thickness and temperature were studied in the thickness range from 5 nm to 20 nm. The fabricated junctions can be well described by the microscopic theory of SNS junctions, assuming no suppression of the energy gap in Nb electrodes near the NbNxinterfaces and a Cooper pair decay length in the NbNx barrier, ξnTcof about 2.3 nm. Current-voltage characteristics of the junctions are well described by the resistively and capacitively shunted junction (RCSJ) model without excess current. In the studied rangeJc2, the Nb/NbNx/Nb junctions have lower values of the specific resistanceRnA, lower IcRn products, and a stronger dependence of theIcRnon temperature than the self-shunted or critically damped externally shunted Nb/Al-AlOx/Nb junctions with the same critical current density; A is the junction area,Icthe junction critical current, and Rnthe effective shunting resistance.
Superconducting digital circuits based on Josephson junctions with amorphous niobium-silicon (a-NbSi) barriers have been designed, fabricated, and tested. Single-flux-quantum (SFQ) shift registers operated with ±30% bias margins, confirming junction reproducibility and uniformity. Static digital dividers operated up to 165 GHz for a single value of bias current, which was only marginally slower than circuits fabricated with externally shunted AlOx-barrier junctions having a comparable critical current density of 4.5 kA/cm2. In comparison, self-shunted a-NbSi junctions enabled a doubling in circuit density. This and their relatively thick 10 nm barriers could increase the yield of complex SFQ circuits.
Aluminum Josephson junctions are the building blocks for the realization of superconducting quantum bits. Attention has been also paid to hybrid ferromagnetic Josephson junctions, which allow switching between different magnetic states, making them interesting for applications such as cryogenic memories, single-photon detectors, and spintronics. In this paper, we report on the fabrication and characterization of high-quality ferromagnetic Josephson junctions based on aluminum technology. We employed an innovative fabrication process inspired by niobium-based technology, allowing us to obtain very high-quality hybrid aluminum Josephson junctions; thus, supporting the use of ferromagnetic Josephson junctions in advanced quantum circuits. The fabrication process is described in detail and the main DC transport properties at low temperatures (current-voltage characteristic, critical current as a function of the temperature, and the external magnetic field) are reported. Here, we illustrate in detail the fabrication process, as well as the main DC transport properties at low temperatures (current-voltage characteristic, critical current as a function of the temperature, and the external magnetic field).
Conventional Josephson metal-insulator-metal devices are inherently underdamped and exhibit hysteretic current-voltage response due to a very high subgap resistance compared to that in the normal state. At the same time, overdamped junctions with single-valued characteristics are needed for most superconducting digital applications. The usual way to overcome the hysteretic behavior is to place an external low-resistance normal-metal shunt in parallel with each junction. Unfortunately, such solution results in a considerable complication of the circuitry design and introduces parasitic inductance through the junction. This paper provides a concise overview of some generic approaches that have been proposed in order to realize internal shunting in Josephson heterostructures with a barrier that itself contains the desired resistive component. The main attention is paid to self-shunted devices with local weak-link transmission probabilities that are so strongly disordered in the interface plane that transmission probabilities are tiny for the main part of the transition region between two super-conducting electrodes, while a small part of the interface is well transparent. We discuss the possibility of realizing a universal bimodal distribution function and emphasize advantages of such junctions that can be considered as a new class of self-shunted Josephson devices promising for practical applications in superconducting electronics operating at 4.2 K.