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Quantum Electronics and Laser Science Conference

Quantum interferometric lithography: exploiting entanglement to beat the diffraction limit

Boto, Abrams, Williams, Dowling

Published Jan 1, 2000• 1 citation

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Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Ole Steuernagel

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.

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