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Current Applied Physics

Aerial image formation of quantum lithography for diffraction limit

Sang-Kon Kim

Published May 12, 2012• 1 citation
Publisher
DOI
10.1016/j.cap.2012.05.001

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I propose a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multiphoton absorber or coincidence detection. Using the same nonclassical states of light as those for quantum lithography, the proposed method requires only optical intensity measurements, followed by image postprocessing, to produce the same complex quantum interference patterns as those in quantum lithography. The method is expected to be experimentally realizable using current technology.