Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Log inSign up
Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Blog
Job Board
Q3AS

© 2026 Aqora Quantum S.A.S.

TermsPrivacyLegal Notice

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

A study of quantum lithography for diffraction limit

Sang-Kon Kim

Published Mar 10, 2011• 1 citation
Publisher

Abstract

Since the diffraction limit of Rayleigh criterion hardly creates finer features, the development of technologies beyond the diffraction limit is a key merit without the shorter-wavelength source tool. In this paper, nano-phenomena to beat the Rayleigh criterion are described. For quantum lithography, collective behaviour of N-photon entangled states is modeled and simulated to show the effect of photon entangled states to 3-dimensional arbitrary pattern formation.

DOI
10.1117/12.879562

Related papers

Beyond the Rayleigh Limit in Optical Lithography

Muhammad Suhail Zubairy

It is well known that the classical schemes for microscopy and lithography are restricted by the diffraction limit. The precision with which a pattern could be etched in interference lithography is limited by the wavelength of the light. In recent years, a number of schemes have been proposed via quantum interferometry to improve the resolution. Some of these schemes are based on quantum entanglement and multiphoton processes.

Frontiers in Optics•Jan 1, 2011•0 citations

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

Agedi N. Boto, Pieter Kok, Daniel S. Abrams +3 more

Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.

arXiv:quant-ph/9912052•Physical Review Letters•Sep 25, 2000•1,515 citations

Quantum lithography: Toward entangled-photon optics

Luis Lorenzo Sánchez-Soto, Gunnar G. Bjork, Jonas Söderholm

The advantages of using nonclassical states of light for optical imaging are discussed, with special emphasis on the new field of quantum optical lithography. The classical resolution limit given by the Rayleigh criterion is approximately half of the optical wavelength. However, it has been argued that, by using special quantum states of light and a multiphoton-sensitive material or detector, this limit can be broken. Here, a brief and rigorous overview of this problem is provided, some particularly widespread misconceptions are addressed, and turning quantum lithography into a practical technology is discussed.

Optics and Spectroscopy•May 1, 2003•1 citation

Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns

Pieter Kok, Agedi N. Boto, Daniel S. Abrams +3 more

As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.

arXiv:quant-ph/0011088•Physical Review A•May 9, 2001•127 citations

Is entanglement dispensable in quantum lithography?

Milena D’Angelo, Giuliano Scarcelli, Yanhua H. Shih

The working principle of quantum lithography has been demonstrated a few years ago: entangled N-photon systems can improve the spatial resolution of an imaging system by a factor of N, despite the classical Rayleigh limit. Recently, a number of experiments successfully simulated certain features of quantum imaging and two-photon interference-diffraction by using chaotic light in coincidence detection experiments. Can classical light simulate the effect of imaging type quantum lithography? This article attempts to provide an answer to this currently debated question.

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE•Aug 31, 2006•3 citations

Recent progress in quantum and nonlinear optical lithography

Robert W. Boyd, Sean J. Bentley

We review the status of the field of quantum lithography, that is, the use of quantum-mechanical effects to write lithographic features with resolution finer than that achievable according to the Rayleigh criterion. In particular, we first review the original quantum lithography proposal by Boto et al., and we then describe the status of research aimed at realizing this process.

Journal of Modern Optics•Feb 21, 2006•32 citations
Since the diffraction limit of Rayleigh criterion hardly creates finer features, the development of technologies beyond the diffraction limit is a key merit without the shorter-wavelength source tool. In this paper, nano-phenomena to beat the Rayleigh criterion are described. For quantum lithography, collective behaviour of N-photon entangled states is modeled and simulated to show the effect of photon entangled states to 3-dimensional arbitrary pattern formation.
Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.
The advantages of using nonclassical states of light for optical imaging are discussed, with special emphasis on the new field of quantum optical lithography. The classical resolution limit given by the Rayleigh criterion is approximately half of the optical wavelength. However, it has been argued that, by using special quantum states of light and a multiphoton-sensitive material or detector, this limit can be broken. Here, a brief and rigorous overview of this problem is provided, some particularly widespread misconceptions are addressed, and turning quantum lithography into a practical technology is discussed.
The working principle of quantum lithography has been demonstrated a few years ago: entangled N-photon systems can improve the spatial resolution of an imaging system by a factor of N, despite the classical Rayleigh limit. Recently, a number of experiments successfully simulated certain features of quantum imaging and two-photon interference-diffraction by using chaotic light in coincidence detection experiments. Can classical light simulate the effect of imaging type quantum lithography? This article attempts to provide an answer to this currently debated question.