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arXiv:quant-ph/9912052 · Physical Review Letters

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Samuel L. Braunstein, Colin P. Williams, Jonathan P. Dowling

Published Sep 25, 2000• 1,515 citations
arXivHTMLPDF

Abstract

Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.

DOI
10.1103/physrevlett.85.2733

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Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

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Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.
Two-photon interferometric quantum photon lithography for light of wavelength \ensuremath{\lambda} is capable of beating the Rayleigh diffraction limit of resolution \ensuremath{\lambda}/4 to the level of \ensuremath{\lambda}/8. The required twin single-photon states ∣1〉a∣1〉b,|1{〉}_{a}|1{〉}_{b},∣1〉a​∣1〉b​, which are converted into maximally entangled states by a 50:50 beam splitter, can be generated from a nondegenerate parametric amplifier initially in vacuum states and with a weak pump field. Increasing the pump strength can slightly increase the production rate of the desired state and it will also increase the production of the twin two-photon states ∣2〉a∣2〉b,|2{〉}_{a}|2{〉}_{b},∣2〉a​∣2〉b​, which leads to an unwanted background term. In this paper we show that, assuming a weak pair coherent state as input to the amplifier, quantum interference can be used to quench the production of the ∣2〉a∣2〉b|2{〉}_{a}|2{〉}_{b}∣2〉a​∣2〉b​ state and to enhance the production of the ∣1〉a∣1〉b|1{〉}_{a}|1{〉}_{b}∣1〉a​∣1〉b​ state by almost sixfold.
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the "quantum weight" from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimentally by two-photon interference in atomic Rubidium, to obtain focal spots that beat the diffraction limit by a factor of 2.