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Optics and Photonics News

Quantum Lithography

Pieter Kok, Samuel L. Braunstein, Jonathon P. Dowling

Published Sep 1, 2002• 3 citations
Publisher

Abstract

Optical lithography is used in the manufacture of microchips to etch patterns on silicon wafers. Because of diffraction, the size of these patterns is limited by the wavelength of the light used. The authors present a new lithographic protocol that uses the quantum properties of light. With this new technique, it is possible to beat the diffraction limit and, in principle, continue the miniaturization process until the atomic scale is reached.

DOI
10.1364/opn.13.9.000024

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We have learnt in Chapter 5 how to reduce fluctuations of an electromagnetic (EM) field below the quantum (Heisenberg) limit imposed by the quantum nature of light. It has been shown that the quantum limit can be beaten using non-classical squeezed light of reduced fluctuations. Another issue of significant interest in quantum optics is to beat the diffraction limit imposed on the resolution of measured objects by the wave nature of light. In this chapter, we will illustrate how one can beat the diffraction limit by using the quantumnature of entangled light beams.We shall see that entangled light can lead us to a new domain of quantum optics in which detectors can resolve two closely spaced objects or spectral lines with the minimal resolvable limit significantly reduced or even completely suppressed. This subject is generally known as quantum optical lithography and could be described in short as the ability to print patterns onto certain materials using non-classical light. The developments in this area are of fundamental interest, and they hold promise for advances in optical interferometry and in applications such as quantummetrology and gravitational wave studies.

•Apr 19, 2016•0 citations
Optical lithography is used in the manufacture of microchips to etch patterns on silicon wafers. Because of diffraction, the size of these patterns is limited by the wavelength of the light used. The authors present a new lithographic protocol that uses the quantum properties of light. With this new technique, it is possible to beat the diffraction limit and, in principle, continue the miniaturization process until the atomic scale is reached.
Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the "quantum weight" from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimentally by two-photon interference in atomic Rubidium, to obtain focal spots that beat the diffraction limit by a factor of 2.
We have learnt in Chapter 5 how to reduce fluctuations of an electromagnetic (EM) field below the quantum (Heisenberg) limit imposed by the quantum nature of light. It has been shown that the quantum limit can be beaten using non-classical squeezed light of reduced fluctuations. Another issue of significant interest in quantum optics is to beat the diffraction limit imposed on the resolution of measured objects by the wave nature of light. In this chapter, we will illustrate how one can beat the diffraction limit by using the quantumnature of entangled light beams.We shall see that entangled light can lead us to a new domain of quantum optics in which detectors can resolve two closely spaced objects or spectral lines with the minimal resolvable limit significantly reduced or even completely suppressed. This subject is generally known as quantum optical lithography and could be described in short as the ability to print patterns onto certain materials using non-classical light. The developments in this area are of fundamental interest, and they hold promise for advances in optical interferometry and in applications such as quantummetrology and gravitational wave studies.