Physics World

Atom lithography unveils its new mask

Edwin Cartlidge

Published Nov 1, 2002• 0 citations

Abstract

Researchers in the US have developed a new technique that could ensure the continued miniaturization of integrated circuits. Developed by Joseph Thywissen and Mara Prentiss at Harvard University in the US, the technique uses atoms rather than light to carve the features in chips. Their work shows that the resolution of atom lithography, which could replace optical lithography in chip-fabrication plants, need not be limited by the wavelength of light.

DOI: 10.1088/2058-7058/15/11/12

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