arXiv:quant-ph/0305042

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Ole Steuernagel

Published May 8, 2003• 14 citations

Abstract

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.

DOI: 10.48550/arxiv.quant-ph/0305042

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