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Physical Review Letters

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit

Jonathan P. Dowling, Agedi N. Boto, Daniel M. Abrams, Colin P. Williams

Published Jan 1, 1999• 0 citations
OpenAlex

Abstract

Optical masking lithography has been the primary tool of the semiconductor industry for transferring circuit images onto substrates to form semiconductor chips.

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Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Ole Steuernagel

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.

arXiv:quant-ph/0305042•May 8, 2003•14 citations

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

Agedi N. Boto, Pieter Kok, Daniel S. Abrams +3 more

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Quantum interferometric lithography: exploiting entanglement to beat the diffraction limit

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Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns

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As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.

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Classical and Quantum Lithography

Z. Ficek, Mohamed Ridza Wahiddin

We have learnt in Chapter 5 how to reduce fluctuations of an electromagnetic (EM) field below the quantum (Heisenberg) limit imposed by the quantum nature of light. It has been shown that the quantum limit can be beaten using non-classical squeezed light of reduced fluctuations. Another issue of significant interest in quantum optics is to beat the diffraction limit imposed on the resolution of measured objects by the wave nature of light. In this chapter, we will illustrate how one can beat the diffraction limit by using the quantumnature of entangled light beams.We shall see that entangled light can lead us to a new domain of quantum optics in which detectors can resolve two closely spaced objects or spectral lines with the minimal resolvable limit significantly reduced or even completely suppressed. This subject is generally known as quantum optical lithography and could be described in short as the ability to print patterns onto certain materials using non-classical light. The developments in this area are of fundamental interest, and they hold promise for advances in optical interferometry and in applications such as quantummetrology and gravitational wave studies.

•Apr 19, 2016•0 citations

Comment on “Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit”

G. S. Agarwal, Robert W. Boyd, Elna M. Nagasako +1 more

A Comment on the Letter by Agedi N. Boto, et al., Phys. Rev. Lett. 85, 2733 (2000).Received 18 October 2000DOI:https://doi.org/10.1103/PhysRevLett.86.1389©2001 American Physical Society

Physical Review Letters•Feb 12, 2001•73 citations
Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.
We have learnt in Chapter 5 how to reduce fluctuations of an electromagnetic (EM) field below the quantum (Heisenberg) limit imposed by the quantum nature of light. It has been shown that the quantum limit can be beaten using non-classical squeezed light of reduced fluctuations. Another issue of significant interest in quantum optics is to beat the diffraction limit imposed on the resolution of measured objects by the wave nature of light. In this chapter, we will illustrate how one can beat the diffraction limit by using the quantumnature of entangled light beams.We shall see that entangled light can lead us to a new domain of quantum optics in which detectors can resolve two closely spaced objects or spectral lines with the minimal resolvable limit significantly reduced or even completely suppressed. This subject is generally known as quantum optical lithography and could be described in short as the ability to print patterns onto certain materials using non-classical light. The developments in this area are of fundamental interest, and they hold promise for advances in optical interferometry and in applications such as quantummetrology and gravitational wave studies.