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Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Is entanglement dispensable in quantum lithography?

Milena D’Angelo, Giuliano Scarcelli, Yanhua H. Shih

Published Aug 31, 2006• 3 citations
Publisher

Abstract

The working principle of quantum lithography has been demonstrated a few years ago: entangled N-photon systems can improve the spatial resolution of an imaging system by a factor of N, despite the classical Rayleigh limit. Recently, a number of experiments successfully simulated certain features of quantum imaging and two-photon interference-diffraction by using chaotic light in coincidence detection experiments. Can classical light simulate the effect of imaging type quantum lithography? This article attempts to provide an answer to this currently debated question.

DOI
10.1117/12.696336

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The working principle of quantum lithography has been demonstrated a few years ago: entangled N-photon systems can improve the spatial resolution of an imaging system by a factor of N, despite the classical Rayleigh limit. Recently, a number of experiments successfully simulated certain features of quantum imaging and two-photon interference-diffraction by using chaotic light in coincidence detection experiments. Can classical light simulate the effect of imaging type quantum lithography? This article attempts to provide an answer to this currently debated question.
One of the most surprising consequences of quantum mechanics is the entanglement of two or more distant particles. Even though there are still open questions regarding some fundamental issues related to entangled systems, quantum entanglement has started to play important roles in practical applications. Quantum imaging is one of the hot topics. Quantum imaging has many interesting features which are useful for different applications. For example, quantum imaging can be nonlocal, which is useful for secure two-dimensional information transfer. Quantum imaging can reach a much higher spatial resolution compared with classical imaging, even beyond the diffraction limit. This is useful for lithography and other microsystems fabrication technology. The super-resolution does not represent a violation of the uncertainty principle, it is just a quantum multi-particle phenomenon. Can quantum imaging be simulated classically? This question is closely related to the concerns of Einstein-Podolsky-Rosen of 1935. An attempted answer is given based on the analysis of a recent experiment of biphoton imaging-interference/diffraction.
Since the early days of quantum mechanics, physicists have been puzzled by the counterintuitive consequences of entanglement. Quantum imaging is one of the most intriguing effects exhibiting the typical nonlocal behavior of entangled states and has in fact stimulated an intense debate regarding fundamental issues of quantum theory. Recently, particular attention has been given to the possibility of simulating quantum imaging classically, that is, without entanglement. The study of quantum imaging has also lead to useful practical applications such as high precision nonlocal timing-positioning and quantum lithography, in which measurements may achieve resolution even beyond the classical limits. In this paper, we first introduce the concept of quantum imaging and emphasize its peculiar quantum nature through a set of inequalities derived from the historical argument of Einstein, Podolsky and Rosen (EPR). The EPR inequalities are the quantitative formulation of the very different physics governing entangled and separable systems. We show that two-photon imaging may achieve its fundamental limit only through nonlocal measurements realized on entangled photon pairs. Furthermore, we show that quantum imaging may be exploited to overcome the Rayleigh diffraction limit; this is the basic idea behind quantum lithography. Finally, we discuss the possibility of extending the coherent two-photon imaging typical of entangled photon pairs to incoherent coincidence imaging, by employing chaotic light. From an applicative viewpoint, chaotic radiation may represent the ideal candidate for mimicking quantum ghost imaging, provided adequate detection schemes are developed.
One of the most surprising consequences of quantum mechanics is the entanglement of two or more distance particles. The 'ghost' image experiment demonstrated the astonishing nonlocal behavior of an entangled photon pair. Even though we still have questions in regard to fundamental issues of the entangled quantum systems, quantum entanglement has started to play important roles in practical applications. Quantum lithography is one of the hot topics. We have demonstrated a quantum lithography experiment recently. The experimental results have beaten the classical diffraction limit by a factor of two. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.
One of the most surprising consequences of quantum mechanics is the entanglement of two or more distance particles. The ‘ghost’ image experiment demonstrated the astonishing nonlocal behaviour of an entangled photon pair. Even though we still have questions with regard to fundamental issues of the entangled quantum systems, quantum entanglement has started to play an important role in practical applications. Quantum lithography is one of the hot topics. We have demonstrated a quantum lithography experiment recently, in which the experimental results have beaten the classical diffraction limit by a factor of two. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.