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IEEE Transactions on Applied Superconductivity

Wafer-Scale Fabrication Technologies for Integrated Superconducting Quantum Circuits

L. Kaczmarek, Matthias Schmelz, Katja Peiselt, A. Sh. Sultanov, E. Mutsenik, G. Oelsner, Ronny Stolz

Published Dec 13, 2024• 5 citations
Publisher

Abstract

In the upcoming decades quantum technologies, especially quantum computation, will have a strong influence on industrial, technological, economic, and social progress and are, therefore, considered to be one of the key technologies. The fundamental building blocks for quantum computation are quantum bits (qubits). The superconducting platform offers one of the most promising implementations due to its monolithic character and potential for scalability. Present research around the world primarily focusses on scaling up the number of qubits, so reliable wafer-scale fabrication technologies are mandatory. In this paper, we present our recent developments on wafer-scale fabrication of superconducting quantum circuits including Josephson junctions by the Manhattan-type technology. We discuss fabrication parameters as well as electrical characterization. For arrays out of 50 Josephson junctions with structure dimensions of 200 nm × 200 nm, we achieve a critical current standard deviation of approx. 3% on-chip and 7% on-wafer. We also show first measurement results of so fabricated transmon-type qubits with relaxation and decoherence times ofT1= 12.5 µs andT2= 15.0 µs, respectively. With an increasing number of superconducting qubits and, thus, their input and read-out lines, new challenges arise: Crosstalk between qubits, unwanted modes in the qubit environment, and required interconnections. One way to counteract is the implementation of low inductance connections across coplanar waveguides. This can be realized by aluminum air bridges. In this paper we discuss the air bridges’ fabrication parameters and the impact on the integrated circuits’ elements, e.g., Josephson junctions. We show electrical and superconducting measurements with critical temperatures and critical currents ofTc> 1.0 K andIc> 0.6 mA, respectively.

DOI
10.1109/tasc.2024.3516747

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In the upcoming decades quantum technologies, especially quantum computation, will have a strong influence on industrial, technological, economic, and social progress and are, therefore, considered to be one of the key technologies. The fundamental building blocks for quantum computation are quantum bits (qubits). The superconducting platform offers one of the most promising implementations due to its monolithic character and potential for scalability. Present research around the world primarily focusses on scaling up the number of qubits, so reliable wafer-scale fabrication technologies are mandatory. In this paper, we present our recent developments on wafer-scale fabrication of superconducting quantum circuits including Josephson junctions by the Manhattan-type technology. We discuss fabrication parameters as well as electrical characterization. For arrays out of 50 Josephson junctions with structure dimensions of 200 nm × 200 nm, we achieve a critical current standard deviation of approx. 3% on-chip and 7% on-wafer. We also show first measurement results of so fabricated transmon-type qubits with relaxation and decoherence times ofT1= 12.5 µs andT2= 15.0 µs, respectively. With an increasing number of superconducting qubits and, thus, their input and read-out lines, new challenges arise: Crosstalk between qubits, unwanted modes in the qubit environment, and required interconnections. One way to counteract is the implementation of low inductance connections across coplanar waveguides. This can be realized by aluminum air bridges. In this paper we discuss the air bridges’ fabrication parameters and the impact on the integrated circuits’ elements, e.g., Josephson junctions. We show electrical and superconducting measurements with critical temperatures and critical currents ofTc> 1.0 K andIc> 0.6 mA, respectively.
Josephson tunnel junctions represent a key element in superconducting electronics and quantum circuits. For many years, shadow evaporation by means of Dolan-type bridges has been the state-of-the-art for deep sub- micrometer sized structures. Increasing demand in the number of Josephson junctions, e.g. in qubit circuits and travelling wave parametric amplifiers, requests for a wafer-scale fabrication process with precise control of junction parameters and have led to an advanced lift-off technique called Manhattan-type junction technology in recent years. Herein, we report on the development of a 100 mm wafer-scale fabrication technology for deep sub-micrometer sized Al Josephson junctions with linear dimensions down to 180 nm. The critical currentICof the junctions ranges from about 10 to 120 nA scaling with their linear dimensions. Low temperature transport measurements as well as room-temperature characterization has been used forICand process homogeneity determination of series arrays of up to 50 Josephson junctions. We discuss technology parameters such as yield, on-chip and on-wafer reproducibility of the junction's critical currents as well as main process limitations. Moreover, we present experimental results on the characterization of first transmon-type qubits fabricated using this technology.
The performance of superconducting electronic devices such as superconducting quantum bits (qubits) and superconducting quantum interference devices (SQUIDs) strongly relies on high-quality Josephson junctions (JJ) and their integration into surrounding circuit elements. Therefore, a corresponding fabrication technology should allow for the fabrication of all required elements including the JJs, inductances, capacitances and waveguides. For a long time, shadow evaporation technique was the state of the art for the implementation of sub-μ m sized JJs based on aluminum for qubits of high coherence times. Although, the use of a single lithographic step represents a major advantage of this technique. However, shadowing effects limit sample size, device complexity, and thus scalability of the circuitry. To overcome these limitations and to meet the demands of next generation scalable quantum circuits, in this work we introduce our cross -type JJ aluminum technology, where JJs are defined by the overlap of two narrow perpendicular stripes. We discuss the technological challenges, with a focus on our newly developed dry etching process for patterning of the aluminum thin film. Compared to a lift-off based process, this advanced wafer-scale fabrication technology offers a high integration density and the required design flexibility. We will present first results on cross -type aluminum JJs.
We introduce a simplified fabrication technique for Josephson junctions and demonstrate superconducting Xmon qubits with T1 relaxation times averaging above 50 μs (Q>1.5×106). Current shadow-evaporation techniques for aluminum-based Josephson junctions require a separate lithography step to deposit a patch that makes a galvanic, superconducting connection between the junction electrodes and the circuit wiring layer. The patch connection eliminates parasitic junctions, which otherwise contribute significantly to dielectric loss. In our patch-integrated cross-type junction technique, we use one lithography step and one vacuum cycle to evaporate both the junction electrodes and the patch. This eliminates a key bottleneck in manufacturing superconducting qubits by reducing the fabrication time and cost. In a study of more than 3600 junctions, we show an average resistance variation of 3.7% on a wafer that contains forty 0.5×0.5-cm2 chips, with junction areas ranging between 0.01 and 0.16 μm2. The average on-chip spread in resistance is 2.7%, with 20 chips varying between 1.4% and 2%. For the junction sizes used for transmon qubits, we deduce a wafer-level transition-frequency variation of 1.7%–2.5%. We show that 60%–70% of this variation is attributed to junction-area fluctuations, while the rest is caused by tunnel-junction inhomogeneity. Such high frequency predictability is a requirement for scaling-up the number of qubits in a quantum computer.
Abstract To reach large-scale quantum computing, three-dimensional integration of scalable qubit arrays and their control electronics in multi-chip assemblies is promising. Within these assemblies, the use of superconducting interconnections, as routing layers, offers interesting perspectives in terms of (1) thermal management to protect the qubits from control electronics self-heating, (2) passive device performance with significant increase of quality factors and (3) density rise of low and high frequency signals thanks to minimal dispersion. We report on the fabrication, using 200 mm silicon wafer technologies, of a multi-layer routing platform designed for the hybridization of spin qubit and control electronics chips. A routing level couples the qubits and the control circuits through one layer of Al 0.995 Cu 0.005 and superconducting layers of TiN, Nb or NbN, connected between them by W-based vias. Wafer-level parametric tests at 300 K validate the yield of these technologies while low temperature electrical measurements in cryostat are used to extract the superconducting properties of the routing layers. Preliminary low temperature radio-frequency characterizations of superconducting passive elements, embedded in these routing levels, are presented.
Ongoing research at SUNY Polytechnic Institute to enable large scale fabrication of quantum devices with tightly controlled performance characteristics will be presented. Josephson junctions and transmon qubits patterned with 193 nm lithography will be used to illustrate how advanced process tools can control critical dimensions of devices, necessary for building larger ensembles of qubits. Advances in the CMOS industry enable superior surface roughness and interface quality to be achieved across the entire 300mm wafer – some examples will be presented. The integration of photonic circuits (waveguides and on-chip cryogenic IR emitters) with superconducting Josephson junctions to enable large-scale neuromorphic computing structures in the near future will be discussed. Ongoing work on developing materials and processes for UV-transparent photonic circuits at 300mm will be presented – such chips could be useful as part of the interface to trapped ion qubits. The talk will wrap up with a discussion of the synergies in technology development, and functionality integration that can be achieved using an advanced fabrication facility.