High-Tc voltage amplifier based on single flux quantum processing and operating up to 77 K
V. K. Kaplunenko, Huai-ren Yi, Bengt J. Nilsson, T. Claeson, E. Wikborg
Abstract
A voltage amplifier based on single flux quantum processing is fabricated using only a single layer of YBa2Cu3O7 (YBCO) film deposited on a LaAlO3 substrate. Josephson step edge junctions are formed on two steps and show a reasonable spread of parameters. The maximal output voltage of the amplifier is defined by the IcRn product of the junctions and was 0.8 mV at 10 K and 16 V at 77 K. The circuit allows improved SQUID performance and can be used as an rf amplifier