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Optical Instruments

Numerical simulation of atomic deposition in the atom lithography

Yan Ma

Published Jan 1, 2010• 0 citations
OpenAlex

Abstract

The experimental researches on atom lithography got a rapid development these years and have made a series of significant progress.The research of the processes of atomic deposition using different atoms in various conditions has an important significance.The finite-differences approximation is used to solve a Schrodinger equation describing the atom-laser field interactions.The effect of laser power,detuning,waist radius and longitudinal velocity of atoms to focusing are analyzed.The effects by some parameter to the atoms in a laser standing wave field are got.

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The experimental researches on atom lithography got a rapid development these years and have made a series of significant progress.The research of the processes of atomic deposition using different atoms in various conditions has an important significance.The finite-differences approximation is used to solve a Schrodinger equation describing the atom-laser field interactions.The effect of laser power,detuning,waist radius and longitudinal velocity of atoms to focusing are analyzed.The effects by some parameter to the atoms in a laser standing wave field are got.
A grating structure with the period of half of the laser wavelength is formed by focusing the atoms with a nearly resonant laser standing wave field. The motion of sodium atoms traversing an unsaturated potential are studied by the semi_classical approximation. The structures of gratings under various conditions were simulated using numerical method. By characterizing the grating with FWHM and contrast, the influence of some factors, such as the transverse temperature, the longitudinal velocity, and the free flight to the atom deposition are analysed. Our work provides a theoretical basis to the ongoing atom lithography experiment.
We analyze by direct numerical simulations the effects of the wave nature of an atom on lithography with a laser standing wave. Specific calculations are done for chromium atom deposition with the experimental parameters given in the literature. In the absence of source imperfections and atomic motion during and after the deposition most of the feature width comes from diffractive aberration. Spontaneous emission broadens the linewidth further, giving a full width at half maximum about 8.9 nm and a contrast about 26:1. These are what may be achieved ultimately with the said experimental parameters and show that the nonclassical properties of the atom cannot simply be ignored. We then suggest some strategies for improving atom lithography experiments.
We present a calculation model to investigate the focusing characteristics of an atomic beam in a laser standing wave, taking the wave nature of the atomic propagation into account. The effects of atom source, optical parameters of the laser field and the substrate position on atom focusing are analyzed. Numerical simulations indicate that the best focusing performance can be obtained by repositioning the substrate or optimizing the longitudinal atomic beam speed, laser intensity and the detuning of the laser beam. The feature width of the nanostructure is mainly determined by the transverse speed distribution of atoms. Some methods for optimizing experimental parameters are suggested.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.