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Jisuan wuli

Numerical Simulation of One-dimensional Atom Lithography

Mingsheng Zhan

Published Jan 1, 2004• 0 citations
OpenAlex

Abstract

Building on direct numerical calculation, it analyzes the dynamics of atoms propagating through a laser standing wave (SW) potential in the regime of immersion-lens.The spot size of Cr atomic deposition is estimated. It is also shown that some physical quantities, such as atomic velocity distribution, laser detuning and laser beam radius, play important roles in determining the quality of atom lithography.

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Building on direct numerical calculation, it analyzes the dynamics of atoms propagating through a laser standing wave (SW) potential in the regime of immersion-lens.The spot size of Cr atomic deposition is estimated. It is also shown that some physical quantities, such as atomic velocity distribution, laser detuning and laser beam radius, play important roles in determining the quality of atom lithography.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atoraic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
The experimental researches on atom lithography got a rapid development these years and have made a series of significant progress.The research of the processes of atomic deposition using different atoms in various conditions has an important significance.The finite-differences approximation is used to solve a Schrodinger equation describing the atom-laser field interactions.The effect of laser power,detuning,waist radius and longitudinal velocity of atoms to focusing are analyzed.The effects by some parameter to the atoms in a laser standing wave field are got.
The dynamics of atoms in laser standing wave (SW) in the regime of over-focused immersion-lens is studied. Through directly evolving a one-dimensional Schrdinger equation, we find that multiple focusing appears when laser intensity is larger than that required for simple focusing. If laser intensity is much higher than that for the single focusing, a channeling phenomenon appears, which is insensitive to the variation of some parameters, such as focal plane position and laser intensity. This channeling phenomenon is advantageous for atomic deposition in laser SW.
Atom lens generated by a laser standing wave can be used to focus an atomic beam to nanometer dimensions. Aberrations exist in atom lens owing to the influence of velocity spread, beam spread, wave nature of atoms and so on. Two theoretical models were built to describe atom lens. Spherical aberration, chromatic aberration and the aberration caused by angular spread were analyzed with semi-classical model, and diffractive aberration was analyzed using quantum model. Simulation results show that aberration originates mainly from beam spread, and diffractive aberration is larger than spherical aberration and chromatic aberration. Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
Recent experiments have demonstrated that the light pressure force from an optical standing wave (SW) focuses an atomic beam to sub-micrometre dimensions. We start from a two-dimensional time-dependent Schrödinger equation and reduce it to a one-dimensional equation by a paraxial approximation. We calculate some theoretical limits on the focusing of an atomic beam by an SW optical field. It is found that two parameters, the atomic velocity and the intensity of the laser beam, play an important role in determining the deposition quality.