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Chinese Optics Letters

Classical simulation of atomic beam focusing and deposition for atom lithography

陈献忠, 姚汉民, 陈旭南

Published Jan 1, 2004• 0 citations
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Abstract

We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atoraic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.

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We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atoraic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
The two-level atom focusing in a Gaussian standing wave laser field was analyzed from the perspective of both classical mechanics and wave mechanics. The effects of source imperfection such as velocity spread and beam spread on atom focusing were analyzed by numerically integrating the classical equation of atomic motion. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the standing wave laser field as a function of traveling distance. In the absence of source imperfection, the contribution of diffractive aberration originating from the wave nature of the atom to broadening of feature width is larger than that of spherical aberration. Several methods for improving atom lithography experiments were presented.
The focusing of a thermal atomic beam to nanometer_scale dimensions can be rea lized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on a tom focusing are analyzed using the Monte_Carlo scheme and trajectory tracing me thod, and the simulation results have shown that the effective size of the targe t has a much more important effect on feature width than beam spread and longitu dinal velocity spread. Several methods for improving experiments are presented.
We present a calculation model to investigate the focusing characteristics of an atomic beam in a laser standing wave, taking the wave nature of the atomic propagation into account. The effects of atom source, optical parameters of the laser field and the substrate position on atom focusing are analyzed. Numerical simulations indicate that the best focusing performance can be obtained by repositioning the substrate or optimizing the longitudinal atomic beam speed, laser intensity and the detuning of the laser beam. The feature width of the nanostructure is mainly determined by the transverse speed distribution of atoms. Some methods for optimizing experimental parameters are suggested.
Recent experiments have demonstrated that the light pressure force from an optical standing wave (SW) focuses an atomic beam to sub-micrometre dimensions. We start from a two-dimensional time-dependent Schrödinger equation and reduce it to a one-dimensional equation by a paraxial approximation. We calculate some theoretical limits on the focusing of an atomic beam by an SW optical field. It is found that two parameters, the atomic velocity and the intensity of the laser beam, play an important role in determining the deposition quality.