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Acta Physica Sinica

Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave

Chen Xian-Zhong, Hanmin Yao, Chen Xu-Nan, 中国科学院光电技术研究所微细加工光学技术国家重点实验室，成都 610209

Published Jan 1, 2005• 1 citation
Publisher

Abstract

The focusing of a thermal atomic beam to nanometer_scale dimensions can be rea lized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on a tom focusing are analyzed using the Monte_Carlo scheme and trajectory tracing me thod, and the simulation results have shown that the effective size of the targe t has a much more important effect on feature width than beam spread and longitu dinal velocity spread. Several methods for improving experiments are presented.

DOI
10.7498/aps.54.2645

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The focusing of a thermal atomic beam to nanometer_scale dimensions can be rea lized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on a tom focusing are analyzed using the Monte_Carlo scheme and trajectory tracing me thod, and the simulation results have shown that the effective size of the targe t has a much more important effect on feature width than beam spread and longitu dinal velocity spread. Several methods for improving experiments are presented.
The two-level atom focusing in a Gaussian standing wave laser field was analyzed from the perspective of both classical mechanics and wave mechanics. The effects of source imperfection such as velocity spread and beam spread on atom focusing were analyzed by numerically integrating the classical equation of atomic motion. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the standing wave laser field as a function of traveling distance. In the absence of source imperfection, the contribution of diffractive aberration originating from the wave nature of the atom to broadening of feature width is larger than that of spherical aberration. Several methods for improving atom lithography experiments were presented.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
We present a calculation model to investigate the focusing characteristics of an atomic beam in a laser standing wave, taking the wave nature of the atomic propagation into account. The effects of atom source, optical parameters of the laser field and the substrate position on atom focusing are analyzed. Numerical simulations indicate that the best focusing performance can be obtained by repositioning the substrate or optimizing the longitudinal atomic beam speed, laser intensity and the detuning of the laser beam. The feature width of the nanostructure is mainly determined by the transverse speed distribution of atoms. Some methods for optimizing experimental parameters are suggested.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atoraic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
Atom lens generated by a laser standing wave can be used to focus an atomic beam to nanometer dimensions. Aberrations exist in atom lens owing to the influence of velocity spread, beam spread, wave nature of atoms and so on. Two theoretical models were built to describe atom lens. Spherical aberration, chromatic aberration and the aberration caused by angular spread were analyzed with semi-classical model, and diffractive aberration was analyzed using quantum model. Simulation results show that aberration originates mainly from beam spread, and diffractive aberration is larger than spherical aberration and chromatic aberration. Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
A grating structure with period of half of the laser wavelength generated by focusing Cr atoms with nearly resonant laser standing wave atom lens was simulated using a quantum-mechanical model.The influence of thermal atomic source on atom focusing,including the statistical distribution of the longitudinal veloc- ity and the beam divergence,was discussed.The background and full-width at half-maximum （FWHM） of atomic density peaks with vz in Maxwell distribution and vx0 in Gaussian distribution increase sig- nificantly compared with ideal atoms.Collimating atoms with laser cooling is necessary to decrease the peak broadening.更多还原