Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Log inSign up
Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Blog
Job Board
Q3AS

© 2026 Aqora Quantum S.A.S.

TermsPrivacyLegal Notice

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Theoretical analysis of atom focusing for nanostructure fabrication

Xian Z. Chen, Ting W. Xing, Guo B. Yu, Xu N. Chen, Han M. Yao

Published Dec 8, 2004• 0 citations
Publisher

Abstract

The two-level atom focusing in a Gaussian standing wave laser field was analyzed from the perspective of both classical mechanics and wave mechanics. The effects of source imperfection such as velocity spread and beam spread on atom focusing were analyzed by numerically integrating the classical equation of atomic motion. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the standing wave laser field as a function of traveling distance. In the absence of source imperfection, the contribution of diffractive aberration originating from the wave nature of the atom to broadening of feature width is larger than that of spherical aberration. Several methods for improving atom lithography experiments were presented.

DOI
10.1117/12.607464

Related papers

Classical simulation of atomic beam focusing and deposition for atom lithography

Xianzhong Chen, Hanmin Yao, Xunan Chen

We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.

Chinese Optics Letters•Apr 10, 2004•6 citations

Classical simulation of atomic beam focusing and deposition for atom lithography

陈献忠, 姚汉民, 陈旭南

We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atoraic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.

Chinese Optics Letters•Jan 1, 2004•0 citations

Aberration analysis of atom lens generated by a laser standing wave

Zhang Chunmei

Atom lens generated by a laser standing wave can be used to focus an atomic beam to nanometer dimensions. Aberrations exist in atom lens owing to the influence of velocity spread, beam spread, wave nature of atoms and so on. Two theoretical models were built to describe atom lens. Spherical aberration, chromatic aberration and the aberration caused by angular spread were analyzed with semi-classical model, and diffractive aberration was analyzed using quantum model. Simulation results show that aberration originates mainly from beam spread, and diffractive aberration is larger than spherical aberration and chromatic aberration. Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.

High Power Laser and Particle Beams•Jan 1, 2004•0 citations

ANALYSIS OF ATOM FOCUSING IN A STANDING WAVE LASER FIELD FOR NANOMETER-SCALE FABRICATION

Xianzhong Chen, Jianping Shi, Xiangang Luo +5 more

We present a calculation model to investigate the focusing characteristics of an atomic beam in a laser standing wave, taking the wave nature of the atomic propagation into account. The effects of atom source, optical parameters of the laser field and the substrate position on atom focusing are analyzed. Numerical simulations indicate that the best focusing performance can be obtained by repositioning the substrate or optimizing the longitudinal atomic beam speed, laser intensity and the detuning of the laser beam. The feature width of the nanostructure is mainly determined by the transverse speed distribution of atoms. Some methods for optimizing experimental parameters are suggested.

Modern Physics Letters B•Feb 10, 2006•0 citations

Quantum-mechanical analysis of atom lithography

Chang Jae Lee

We analyze by direct numerical simulations the effects of the wave nature of an atom on lithography with a laser standing wave. Specific calculations are done for chromium atom deposition with the experimental parameters given in the literature. In the absence of source imperfections and atomic motion during and after the deposition most of the feature width comes from diffractive aberration. Spontaneous emission broadens the linewidth further, giving a full width at half maximum about 8.9 nm and a contrast about 26:1. These are what may be achieved ultimately with the said experimental parameters and show that the nonclassical properties of the atom cannot simply be ignored. We then suggest some strategies for improving atom lithography experiments.

Physical Review A•May 11, 2000•31 citations

Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave

Chen Xian-Zhong, Hanmin Yao, Chen Xu-Nan +1 more

The focusing of a thermal atomic beam to nanometer_scale dimensions can be rea lized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on a tom focusing are analyzed using the Monte_Carlo scheme and trajectory tracing me thod, and the simulation results have shown that the effective size of the targe t has a much more important effect on feature width than beam spread and longitu dinal velocity spread. Several methods for improving experiments are presented.

Acta Physica Sinica•Jan 1, 2005•1 citation
The two-level atom focusing in a Gaussian standing wave laser field was analyzed from the perspective of both classical mechanics and wave mechanics. The effects of source imperfection such as velocity spread and beam spread on atom focusing were analyzed by numerically integrating the classical equation of atomic motion. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the standing wave laser field as a function of traveling distance. In the absence of source imperfection, the contribution of diffractive aberration originating from the wave nature of the atom to broadening of feature width is larger than that of spherical aberration. Several methods for improving atom lithography experiments were presented.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atoraic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
Atom lens generated by a laser standing wave can be used to focus an atomic beam to nanometer dimensions. Aberrations exist in atom lens owing to the influence of velocity spread, beam spread, wave nature of atoms and so on. Two theoretical models were built to describe atom lens. Spherical aberration, chromatic aberration and the aberration caused by angular spread were analyzed with semi-classical model, and diffractive aberration was analyzed using quantum model. Simulation results show that aberration originates mainly from beam spread, and diffractive aberration is larger than spherical aberration and chromatic aberration. Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
We present a calculation model to investigate the focusing characteristics of an atomic beam in a laser standing wave, taking the wave nature of the atomic propagation into account. The effects of atom source, optical parameters of the laser field and the substrate position on atom focusing are analyzed. Numerical simulations indicate that the best focusing performance can be obtained by repositioning the substrate or optimizing the longitudinal atomic beam speed, laser intensity and the detuning of the laser beam. The feature width of the nanostructure is mainly determined by the transverse speed distribution of atoms. Some methods for optimizing experimental parameters are suggested.
We analyze by direct numerical simulations the effects of the wave nature of an atom on lithography with a laser standing wave. Specific calculations are done for chromium atom deposition with the experimental parameters given in the literature. In the absence of source imperfections and atomic motion during and after the deposition most of the feature width comes from diffractive aberration. Spontaneous emission broadens the linewidth further, giving a full width at half maximum about 8.9 nm and a contrast about 26:1. These are what may be achieved ultimately with the said experimental parameters and show that the nonclassical properties of the atom cannot simply be ignored. We then suggest some strategies for improving atom lithography experiments.
The focusing of a thermal atomic beam to nanometer_scale dimensions can be rea lized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on a tom focusing are analyzed using the Monte_Carlo scheme and trajectory tracing me thod, and the simulation results have shown that the effective size of the targe t has a much more important effect on feature width than beam spread and longitu dinal velocity spread. Several methods for improving experiments are presented.