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Acta Physica Sinica

Focusing characteristic of chromium atoms under elliptical standing wave

Wentao Zhang, Zhu Bao-Hua, Xiong Xian-Ming, 桂林电子科技大学电子工程学院，桂林

Published Jan 1, 2009• 5 citations
Publisher

Abstract

Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.

DOI
10.7498/aps.58.8199

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Acta Physica Sinica•Jan 1, 2011•2 citations
Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.
Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on a substrate. The motorial characteristics of chromium atoms in an elliptical standing wave filed are discussed, and the simulation results are given with different deflective angles of elliptical standing wave. The full width at half maximum (FWHM) is 3.2 nm and the contrast is 36 ∶1 with a deflective angle of 0. The FWHM is 6.5nm and the contrast is 24 ∶1 with a deflective angel of 15, but when the deflective angle reaches 30, the stripe splits and two-peak configuration is formed.
The techniques of atom optics can be applied during the deposition of atoms onto a surface to produce nanostructures. A laser is used to form a standing wave intensity pattern in front of the substrate. An atom beam, which has been collimated by optical means, is focused onto the substrate by dipole forces from the standing wave pattern so as to deposit a series of lines spaced by half the laser wavelength. We describe the fabrication of a Cr nanograting formed using this new technique. The experimental arrangement for deposition and the optical collimation of the atom beam are described. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) images of the resulting nanostructures are presented.
We analyze by direct numerical simulations the effects of the wave nature of an atom on lithography with a laser standing wave. Specific calculations are done for chromium atom deposition with the experimental parameters given in the literature. In the absence of source imperfections and atomic motion during and after the deposition most of the feature width comes from diffractive aberration. Spontaneous emission broadens the linewidth further, giving a full width at half maximum about 8.9 nm and a contrast about 26:1. These are what may be achieved ultimately with the said experimental parameters and show that the nonclassical properties of the atom cannot simply be ignored. We then suggest some strategies for improving atom lithography experiments.
The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum (FWHM) of the stripe is 2.75 nm and the contrast is 38.5: 1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8:1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3: 1 and 1.6: 1 when the divergence angles equal 0.5 and 1.0 mrad, respectively.
Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. The motion of sodium atoms in standing wave filed is discussed. Based on the semi-classical model, this paper analyses the motion equation of sodium atom in the laser standing wave field, and then gets the trajectory of the atoms in the standing wave field by analytical simulation for different longitudinal and transverse velocities. The simulative results show that the FWHM width of stripes was 2.78 nm and the contrast was 38.5 ∶1 for the optimal longitudinal velocity, while that of the stripes was 29.1 nm and the contrast was 15 ∶1 for non-optimal longitudinal velocities. At the same time, the results show that the FWHM width of stripes was 4.2 nm and the contrast was 20 ∶1 when the divergence of atomic beam was 0.15 mrad. Whereas, the stripes presented Multi-peaked configuration and the quality deteriorated with the divergence of atomic beam increased to 1.5 mrad.