NbN FILM DEVELOPMENT FOR PHONON-COOLED HEB DEVICES
Eyal Gerecht, Ashok K. Bhupathiraju, Erich N. Grossman, John Nicholson, Fernando Rodríguez‐Morales, Dazhen Gu, K. S. Yngvesson
Abstract
Superconducting Hot-electron Bolometric (HE.B) mixers employing thin films ofNbN have become the devices of choice for heterodyne detection at tera,hertz frequen- cies. HEB mixers are inherently insensitive to the bandgap frequency of the superconducting material used in the device, in contrast to SIS mixers,. We have developed a fabrication pro- cess for thin NbN films at the National Institute of Standards and Technology in Boulder, CO. A two-fold approach can be taken. The first is to maximize the critical temperature of the superconducting device by growing thicker films at the expense of IF bandwidth, whereas the second approach focuses on maximizing the IF bandwidth at the expense of the critical tem- perature. So far, we have developed a film-deposition process utilizing our DC reactive mag- netron sputtering chamber. By current-biasing the RF plasma in a mixture of Ar and N2, while using a Nb target, we can control the film stoichiometry and produce films with thicknesses of 5 nm. The films are deposited on MgO substrates that are heated to about 800 °C during depo- sition. A typical critical temperature (TO is about 10 K and the transition width is very small (0.5 K). The films are evaluated by measuring their superconducting characteristics as well as their thickness and surface roughness by means of AFM analysis. Phonon-cooled HEB devices are fabricated from the films to study their performance as HEB mixers. The device fabrication process at UMass/Amherst involves lift-off lithography of the antenna (gold), and Reactive ion etching (R1E) or wet etching of the NbN. The I-V char- acteristics and noise temperatures of the devices were measured in order to determine their quality for PHEB applications.