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IEEE Transactions on Applied Superconductivity

Fabrication and characterization of hot-electron bolometers for THz applications

Michael Frommberger, Philippe Sabon, Matthias Schicke, François Mattiocco, Karl-Friedrich Schuster

Published Mar 1, 2001• 6 citations
Publisher

Abstract

Superconducting properties of Nb and NbN thin films for application in diffusion and phonon cooled Hot-Electron Bolometers have been systematically investigated. The materials were sputtered on fused quartz substrates in a wide thickness range. DC-measurements of the Nb films allow us to predict the intermediate frequency bandwidth of a hot-electron bolometer mixer device for a given design. To improve the characteristics of the NbN thin films, we used a 15 nm MgO seed layer.

DOI
10.1109/77.919408

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Superconducting Hot-electron Bolometric (HE.B) mixers employing thin films ofNbN have become the devices of choice for heterodyne detection at tera,hertz frequen- cies. HEB mixers are inherently insensitive to the bandgap frequency of the superconducting material used in the device, in contrast to SIS mixers,. We have developed a fabrication pro- cess for thin NbN films at the National Institute of Standards and Technology in Boulder, CO. A two-fold approach can be taken. The first is to maximize the critical temperature of the superconducting device by growing thicker films at the expense of IF bandwidth, whereas the second approach focuses on maximizing the IF bandwidth at the expense of the critical tem- perature. So far, we have developed a film-deposition process utilizing our DC reactive mag- netron sputtering chamber. By current-biasing the RF plasma in a mixture of Ar and N2, while using a Nb target, we can control the film stoichiometry and produce films with thicknesses of 5 nm. The films are deposited on MgO substrates that are heated to about 800 °C during depo- sition. A typical critical temperature (TO is about 10 K and the transition width is very small (0.5 K). The films are evaluated by measuring their superconducting characteristics as well as their thickness and surface roughness by means of AFM analysis. Phonon-cooled HEB devices are fabricated from the films to study their performance as HEB mixers. The device fabrication process at UMass/Amherst involves lift-off lithography of the antenna (gold), and Reactive ion etching (R1E) or wet etching of the NbN. The I-V char- acteristics and noise temperatures of the devices were measured in order to determine their quality for PHEB applications.

•Mar 1, 2002•1 citation
Superconducting properties of Nb and NbN thin films for application in diffusion and phonon cooled Hot-Electron Bolometers have been systematically investigated. The materials were sputtered on fused quartz substrates in a wide thickness range. DC-measurements of the Nb films allow us to predict the intermediate frequency bandwidth of a hot-electron bolometer mixer device for a given design. To improve the characteristics of the NbN thin films, we used a 15 nm MgO seed layer.
Abstract As part of an effort to develop heterodyne rf receivers operating in the terahertz band, we have fabricated hot‐electron bolometers (HEB) using NbN thin films, and investigated their intermediate frequency (IF) bandwidths. The NbN thin films we studied were grown on single‐crystal MgO substrates by dc reactive sputtering. Our 2.8‐nm‐thick films exhibited superior superconducting properties, including transition temperatures TC of 9.7 K and 20 K resistivities ρ20 of 185 µΩ·cm. Using electron beam diffraction, high‐resolution TEM images, and other techniques to study the crystallinity of these films, we determined that the NbN grows epitaxially on the MgO substrate as single‐crystal material. The HEB elements we made consisted of a NbN microstrip, a Au electrode section, and an Al antenna section. In the course of studying the IF bandwidths of these devices in the millimeter‐wave range, we found one device with an IF bandwidth of 2.5 GHz, the highest of any device we made. © 2002 Wiley Periodicals, Inc. Electron Comm Jpn Pt 2, 85(7): 77–83, 2002; Published online in Wiley InterScience ( www.interscience.wiley.com ). DOI 10.1002/ecjb.1111
The bandwidth of NbN phonon-cooled hot electron bolometer mixers has been systematically investigated with respect to the film thickness and film quality variation. The films, 2.5 to 10 nm thick, were fabricated on sapphire substrates using DC reactive magnetron sputtering. All devices consisted of several parallel strips, each 1 μ wide and 2 μ long, placed between Ti-Au contact pads. To measure the gain bandwidth we used two identical BWOs operating in the 120-140 GHz frequency range, one functioning as a local oscillator and the other as a signal source. The majority of the measurements were made at an ambient temperature of 4.2 K with optimal LO and DC bias. The maximum 3 dB bandwidth (about 4 GHz) was achieved for the devices made of films which were 2.5-3.5 nm thick, had a high critical temperature, and high critical current density. A theoretical analysis of bandwidth for these mixers based on the two-temperature model gives a good description of the experimental results if one assumes that the electron temperature is equal to the critical temperature.
The bandwidth of NbN phonon-cooled hot electron bolometer mixers has been systematically investigated with respect to the film thickness and film quality variation. The films, 2.5 to 10 mm thick, were fabricated on sapphire substrates using DC reactive magnetron sputtering. All devices consisted of several parallel strips, each 1 1.1 wide and 211 long, placed between Ti-Au contact pads. To measure the gain bandwidth we used two identical BWOs operating in the 120-140 GHz frequency range, one functioning as a local oscillator and the other as a signal source. The majority of the measurements were made at an ambient temperature of 4.5 K with optimal LO and DC bias. The maximum 3 dB bandwidth (about 4 GHz) was achieved for the devices made of films which were 2.5-3.5 nm thick, had a high critical temperature, and high critical current density. A theoretical analysis of bandwidth for these mixers based on the two-temperature model gives a good description of the experimental results if one assumes that the electron temperature is equal to the critical temperature.
Experimental work on the development of a quasi-optical heterodyne receiver for the THz frequency range is reported. The mixing device is a superconducting hot electron bolometer (HEB) made from ultrathin, d = 3 - 5 nm, niobium nitride (NbN) films. Work described in this thesis comprises: The design of a prototype receiver using quasi-optical coupling. Device fabrication involving reactive magnetron sputtering of NbN films and lithographic definition of the antenna integrated mixer. An investigation of the receiver performance at frequencies between 0.6 THz and 2.5 THz. The best performance is obtained with HEB mixers made from NbN films with a thickness d = 3-3.5 nm and a critical temperature T c = 9 - 9.5 K. Double-side band receiver noise temperatures are 530 K at 0.6 THz, 650 K at 1.6 THz and 1100 K at 2.5 THz. Corrected for losses in the receiver input optics, these values amount to only 10 times the theoretical quantum limit. MgO as the substrate material has been shown to provide improved acoustic coupling between NbN film and the substrate compared to other materials such as Si or sapphire. A maximum IF gain bandwidth of 4.5 GHz has been measured under the same operating conditions which yield lowest noise temperature. The local oscilltor power requirement is ~250 nW absorbed in the bolometer. Quasi-optically coupled HEB mixers have become the device-of-choice for radio astronomical applications in the frequency regime at and above 1 THz.
Superconducting Hot-electron Bolometric (HE.B) mixers employing thin films ofNbN have become the devices of choice for heterodyne detection at tera,hertz frequen- cies. HEB mixers are inherently insensitive to the bandgap frequency of the superconducting material used in the device, in contrast to SIS mixers,. We have developed a fabrication pro- cess for thin NbN films at the National Institute of Standards and Technology in Boulder, CO. A two-fold approach can be taken. The first is to maximize the critical temperature of the superconducting device by growing thicker films at the expense of IF bandwidth, whereas the second approach focuses on maximizing the IF bandwidth at the expense of the critical tem- perature. So far, we have developed a film-deposition process utilizing our DC reactive mag- netron sputtering chamber. By current-biasing the RF plasma in a mixture of Ar and N2, while using a Nb target, we can control the film stoichiometry and produce films with thicknesses of 5 nm. The films are deposited on MgO substrates that are heated to about 800 °C during depo- sition. A typical critical temperature (TO is about 10 K and the transition width is very small (0.5 K). The films are evaluated by measuring their superconducting characteristics as well as their thickness and surface roughness by means of AFM analysis. Phonon-cooled HEB devices are fabricated from the films to study their performance as HEB mixers. The device fabrication process at UMass/Amherst involves lift-off lithography of the antenna (gold), and Reactive ion etching (R1E) or wet etching of the NbN. The I-V char- acteristics and noise temperatures of the devices were measured in order to determine their quality for PHEB applications.