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IEEE Transactions on Applied Superconductivity

Planarization Process for Fabricating Multi-Layer Nb Integrated Circuits Incorporating Top Active Layer

T. Satoh, K. Hinode, Shuichi Nagasawa, Y. Kitagawa, M. Hidaka, Nobuyuki Yoshikawa, Hiroyuki Akaike, Akira Fujimaki, Kazuyoshi Takagi, Naofumi Takagi

Published Jun 1, 2009• 16 citations
Publisher

Abstract

We have developed an advanced process for fabricating a next-generation multi-layer Nb integrated circuit structure incorporating a top active layer. In this structure, the passive-transmission-line (PTL) layer is placed between the top active layer and a DC-bias current layer at the bottom. This structure will make it possible to flexibly design active circuits and PTL wiring, and will also enable active circuits to be effectively shielded from magnetic fields generated by a large DC-bias current. Both the DC-bias current layer and the PTL layer are planarized; however, the top active layer is fabricated without planarization. To fabricate this new structure, it was necessary to achieve a better planarization process for junctions formed over underlying Nb patterns. The combined process we developed comprising additional SiO2deposition and additional mechanical polishing after the standard Caldera planarization process results in superior planarization for junction formation. We obtained excellent characteristics of junctions formed over underlying pattern edges when they were fabricated on surfaces planarized using this new process. Using the process, we fabricated new 10-Nb-layer integrated circuit structures and estimated the characteristics of their circuit elements.

DOI
10.1109/tasc.2009.2018188

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We have developed an advanced process for fabricating a next-generation multi-layer Nb integrated circuit structure incorporating a top active layer. In this structure, the passive-transmission-line (PTL) layer is placed between the top active layer and a DC-bias current layer at the bottom. This structure will make it possible to flexibly design active circuits and PTL wiring, and will also enable active circuits to be effectively shielded from magnetic fields generated by a large DC-bias current. Both the DC-bias current layer and the PTL layer are planarized; however, the top active layer is fabricated without planarization. To fabricate this new structure, it was necessary to achieve a better planarization process for junctions formed over underlying Nb patterns. The combined process we developed comprising additional SiO2deposition and additional mechanical polishing after the standard Caldera planarization process results in superior planarization for junction formation. We obtained excellent characteristics of junctions formed over underlying pattern edges when they were fabricated on surfaces planarized using this new process. Using the process, we fabricated new 10-Nb-layer integrated circuit structures and estimated the characteristics of their circuit elements.
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Development of 15kA/cm2^22 Fabrication Process for Superconducting Integrated Digital Circuits
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Abstract We present SIMIT-Nb08, an eight-layer Nb-based fabrication process for double-active-layer single-flux-quantum (SFQ) digital circuits, aimed at overcoming the routing congestion and integration ‘density wall’ of planar SFQ designs. Both Nb/Al–AlO x /Nb JJ layers were designed with the same nominal critical current density of J c = 6 kA cm −2 , and the measured values were 6.15 and 6.26 kA cm −2 for the lower and upper JJ layers, respectively. This architecture incorporates a dual-ground-plane structure to reduce interlayer electromagnetic coupling and shield stray magnetic flux generated by bias lines. A stop-on-metal chemical mechanical polishing module was implemented to provide a controlled dielectric thickness and a planar surface for upper-layer device fabrication. We validate a double-layer SFQ logic cell library with wide DC bias margins on both layers, and demonstrate ultra-high-speed dynamic operation via a toggle flip-flop-based frequency-divider test exceeding 100 GHz. In addition, the process and cross-layer interconnect reliability are demonstrated by functional operation of a cross-layer one-bit full adder and an eight-bit shift register (SR), where the SR exhibits an effective junction-density improvement of ∼4× over typical single-layer implementations. Post-route benchmarking on a 320-cell SR indicates that SIMIT-Nb08 delivers substantial improvements in power, performance, and area, including a 32.2% reduction in area, a 25.0% increase in maximum operating frequency ( f max ), and a 65.3% reduction in estimated power compared with SIMIT-Nb03 (29.9%, 6.3%, and 62.5%, respectively, compared with SIMIT-Nb04), indicating its potential for routing-constrained SFQ digital circuits.
We developed a Nb 4-layer process for fabricating superconducting integrated circuits that involves using caldera planarization to increase the flexibility and reliability of the fabrication process. We call this process the planarized high-speed standard process (PHSTP). Planarization enables us to flexibly adjust most of the Nb and SiO2 film thicknesses; we can select reduced film thicknesses to obtain larger mutual coupling depending on the application. It also reduces the risk of intra-layer shorts due to etching residues at the step-edge regions. We describe the detailed process flows of the planarization for the Josephson junction layer and the evaluation of devices fabricated with PHSTP. The results indicated no short defects or degradation in junction characteristics and good agreement between designed and measured inductances and resistances. We also developed single-flux-quantum (SFQ) and adiabatic quantum-flux-parametron (AQFP) logic cell libraries and tested circuits fabricated with PHSTP. We found that the designed circuits operated correctly. The SFQ shift-registers fabricated using PHSTP showed a high yield. Numerical simulation results indicate that the AQFP gates with increased mutual coupling by the planarized layer structure increase the maximum interconnect length between gates.
We describe the recent progress on a Nb nine-layer fabrication process for large-scale single flux quantum (SFQ) circuits. A device fabricated in this process is composed of an active layer including Josephson junctions (JJ) at the top, passive transmission line (PTL) layers in the middle, and a DC power layer at the bottom. We describe the process conditions and the fabrication equipment. We use both diagnostic chips and shift register (SR) chips to improve the fabrication process. The diagnostic chip was designed to evaluate the characteristics of basic elements such as junctions, contacts, resisters, and wiring, in addition to their defect evaluations. The SR chip was designed to evaluate defects depending on the size of the SFQ circuits. The results of a long-term evaluation of the diagnostic and SR chips showed that there was fairly good correlation between the defects of the diagnostic chips and yields of the SRs. We could obtain a yield of 100% for SRs including 70,000JJs. These results show that considerable progress has been made in reducing the number of defects and improving reliability.