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New Journal of Physics

Monolithic microfabricated ion trap chip design for scaleable quantum processors

Michael Brownnutt, G. Wilpers, Patrick Robert Gill, Richard Claude Thompson, Alastair G. Sinclair

Published Oct 10, 2006• 39 citations
Publisher

Abstract

A design is proposed for a novel ion trap quantum processor chip, microfabricated using a process based on planar silica-on-silicon techniques. The trap electrodes are of gold-coated silica and are spaced by highly doped silicon in a monolithic structure. This design allows a unit aspect-ratio trap with an ion-electrode separation below 100 μm, when using current fabrication techniques. The trapping potential is modelled and the operating parameters required to achieve motional frequencies of a few MHz are calculated. RF loss and the resultant heating of the trap chip are not found to be a factor limiting the trap's operation. This monolithic unit aspect-ratio trap is therefore expected to exhibit a deep potential well, high trap efficiency, and a low RF loss, when compared to other microfabricated traps. This technological approach is in principle scaleable to complex devices, and may form the basis for large-scale ion trap quantum processors.

DOI
10.1088/1367-2630/8/10/232

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A design is proposed for a novel ion trap quantum processor chip, microfabricated using a process based on planar silica-on-silicon techniques. The trap electrodes are of gold-coated silica and are spaced by highly doped silicon in a monolithic structure. This design allows a unit aspect-ratio trap with an ion-electrode separation below 100 μm, when using current fabrication techniques. The trapping potential is modelled and the operating parameters required to achieve motional frequencies of a few MHz are calculated. RF loss and the resultant heating of the trap chip are not found to be a factor limiting the trap's operation. This monolithic unit aspect-ratio trap is therefore expected to exhibit a deep potential well, high trap efficiency, and a low RF loss, when compared to other microfabricated traps. This technological approach is in principle scaleable to complex devices, and may form the basis for large-scale ion trap quantum processors.
Segmented linear ion trap arrays are versatile devices that are increasingly used to study quantum physics and demonstrate the fundamental principles of quantum information processing. Traps with three-dimensional (3-D) electrode geometries can create a superior confining potential for ions. However, the realization of a monolithic 3-D microchip trap with scalable fabrication technology remains challenging. In this paper the microfabrication of a monolithic array of 3-D ion microtraps in a semiconductor chip is presented. The electrode structure is formed by micromachining a silica-on-silicon wafer and metallizing the dielectric with gold. The fabrication method uses conventional semiconductor wafer processing tools and techniques. The specific operating characteristics which demonstrate the suitability of the chosen material system and fabrication process are presented.
We describe a novel monolithic ion trap that combines the flexibility and scalability of silicon microfabrication technologies with the superior trapping characteristics of traditional four-rod Paul traps. The performace of the proposed microfabricated trap approaches that of the macroscopic structures. The fabrication process creates an angled through-chip slot which allows backside ion loading and through-laser access while avoiding surface light scattering and dielectric charging. The trap geometry and dimensions are optimized for confining long ion chains with equal ion spacing [G.-D. Lin, et al., Europhys. Lett. 86, 60004 (2009)]. Control potentials have been derived to produce linear, equally spaced ion chains of up to 50 ions spaced at 10 um. With the deep trapping depths achievable in this design, we expect that these chains will be sufficiently long-lived to be used in quantum simulations of magnetic systems [E.E. Edwards, et al., Phys. Rev. B 82, 060412(R) (2010)]. The trap is currently being fabricated at Georgia Tech using VLSI techniques.
Trapped ions are among the most promising platforms for realizing a large-scale quantum information processor. Current progress focuses on integrating optical and electronic components into microfabricated ion traps to allow scaling to large numbers of ion qubits. Most available fabrication strategies for such integrated processors employ monolithic integration of all processor components and rely heavily on CMOS-compatible semiconductor fabrication technologies that are not optimized for the requirements of a trapped-ion quantum processor. In this work, we present a modular approach in which the processor modules, called chiplets, have specific functions and are fabricated separately. The individual chiplets are then combined using heterogeneous integration techniques. This strategy opens up the possibility of choosing the optimal materials and fabrication technology for each of the chiplets, with a minimum amount of fabrication limitations compared to the monolithic approach. Chiplet technology furthermore enables novel processor functionalities to be added in a cost-effective, modular fashion by adding or modifying only a subset of the chiplets. We describe the design concept of a chiplet-based trapped-ion quantum processor and demonstrate the technology with an example of an integrated individual-ion addressing system for a ten-ion crystal. The addressing system emphasizes the modularity of the chiplet approach, combining a surface ion trap manufactured on a glass substrate with a silicon substrate carrying integrated waveguides and a stack of 3D-printed micro-optics, achieving diffraction-limited focal spots at the ion positions.
Abstract Scaling trapped-ion quantum computing will require robust trapping of at least hundreds of ions over long periods, while increasing the complexity and functionality of the trap itself. Symmetric three-dimensional (3D) structures enable high trap depth, but microfabrication techniques are generally better suited to planar structures that produce less ideal conditions for trapping. We present an ion trap fabricated on stacked eight-inch wafers in a large-scale micro-electro-mechanical system microfabrication process that provides reproducible traps at a large volume. Electrodes are patterned on the surfaces of two opposing wafers bonded to a spacer, forming a 3D structure with 2.5 μm standard deviation in alignment across the stack. We implement a design achieving a trap depth of 1 eV for a 40Ca+ ion held at 200 μm from either electrode plane. We characterize traps, achieving measurement agreement with simulations to within ±5% for mode frequencies spanning 0.6–3.8 MHz, and evaluate stray electric field across multiple trapping sites. We measure motional heating rates over an extensive range of trap frequencies, and temperatures, observing 40 phonons/s at 1 MHz and 185 K. This fabrication method provides a highly scalable approach for producing a new generation of 3D ion traps.
Monolithic three-dimensional (3D) Paul traps combine the high-precision microfabrication of two-dimensional (2D) chip traps with the deep trapping potentials and low heating rates characteristic of macroscopic 3D Paul traps, which are typically machined by traditional means and mechanically assembled. However, achieving low motional heating rates and optical access with a high numerical aperture (NA) while maintaining the high radio-frequency (rf) voltages required for trapping heavy ionic species, such as Yb + and Ba + , remains a significant technical challenge. In this work, we present a fused silica, monolithic segmented 3D Paul trap with an ion-electrode distance of 250 μ m , and stable operation at high rf voltages. We benchmark the trap’s performance using Yb + ions, demonstrating axially homogeneous trapping potentials spanning over 200 μ m about the trap’s axial center, high multidirectional optical access (up to 0.7 NA), and radial motional heating as low as n ¯ ˙ = 1.1 ± 0.1 quanta / s at radial trap frequencies about 3 MHz near room temperature. Furthermore, we observe a motional Ramsey coherence time, T 2 , of about 96 ms for the radial center-of-mass mode. We demonstrate the generation of a two-qubit Bell state with a parity contrast of 99.3 − 1.5 + 0.7 % with state preparation and measurement correction. These results establish fused-silica monolithic 3D Paul traps as a scalable, modular platform for quantum simulation, computation, metrology, and networking with heavy ionic species.
Monolithic three-dimensional (3D) Paul traps combine the high-precision microfabrication of two-dimensional (2D) chip traps with the deep trapping potentials and low heating rates characteristic of macroscopic 3D Paul traps, which are typically machined by traditional means and mechanically assembled. However, achieving low motional heating rates and optical access with a high numerical aperture (NA) while maintaining the high radio-frequency (RF) voltages required for trapping heavy ionic species, such as Yb+^{+}+ and Ba+^{+}+, remains a significant technical challenge. In this work, we present a fused-silica, monolithic segmented 3D Paul trap with an ion-electrode distance of 250 μμμm, and stable operation at high RF voltages. We benchmark the performance of the trap using Yb+^{+}+ ions, demonstrating axially homogeneous trapping potentials spanning over 200 μμμm about the axial center of the trap, high multi-directional optical access (up to 0.7 NA), and radial motional heating as low as $\dot{\bar n}=1.1 \pm 0.1 $ quanta/s at radial trap frequencies about 3 MHz near room temperature. Furthermore, we observe a motional Ramsey coherence time, T2{T}_{2}T2​, of about 95 ms for the radial center-of-mass mode. We demonstrate the generation of a two-qubit Bell state with a parity contrast of 99.3−1.5+0.7{99.3}^{+0.7} _{-1.5}99.3−1.5+0.7​% with state preparation and measurement correction. These results establish fused-silica monolithic 3D Paul traps as a scalable, modular platform for quantum simulation, computation, metrology, and networking with heavy ionic species.