Journal of Physics Conference Series
A two-step transition description of underdamped phase diffusion
Haifeng Yu, X. B. Zhu, Hui Deng, G. M. Xue, Ye Tian, Yanjun Ren, G H Chen, Dongning Zheng, X.N. Jing, Li Lü, S. P. Zhao, Siyuan Han
Abstract
A two-step transition model describing phase diffusion and switching process in underdamped Josephson junctions is discussed. The model takes into account the phase particle's escape rate out of the potential well and transition rate from phase diffusion to the running state. Using as examples the experimental switching current distributions of two Nb/AlO x /Nb junctions of different sizes fabricated on the same chip, we extract the transition rate, which turns out to follow the predicted Arrhenius law in the thermal regime but is greatly enhanced when macroscopic quantum tunneling becomes the dominant escape mechanism. Our results show the validity of applying the model to obtain the transition rate out of the phase diffusion state into the running state from measured switching current distribution of underdamped Josephson junctions. The temperature and bias-current dependent data provide strong evidence for phase diffusion in both thermal and quantum regimes.