Microwave and Optical Technology Letters
Measurement of the current‐density distribution in high‐temperature superconducting microstrip by means of kinetic‐inductance photoresponse (invited paper)
Harvey S. Newman, James C. Culbertson
Abstract
Abstract We report a technique for measuring the spatial profile of microwave‐frequency currents in resonant thin‐film superconducting microstrip devices operated near resonance. We probe the patterned superconducting device as a function of position by scanning a modulated light beam across the region to be probed. With the light focused to a spot size much smaller than the microstrip width, we have measured the current density distribution as a function of position across the width of the strip. Using an elementary model for the superconducting current density distribution, we fit an effective penetration depth at the edge of the microstrip. © 1993 John Wiley & Sons, Inc.