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arXiv:2509.04917 · Applied Physics Reviews

Investigation of tantalum films growth for coplanar resonators with internal quality factors above ten million

E. V. Zikiy, N. S. Smirnov, Elizaveta A. Krivko, Aleksei R. Matanin, A. I. Ivanov, Elizaveta I. Malevannaya, Victor I. Polozov, Sergey V. Bukatin, Dmitry A. Baklykov, I. A. Stepanov, S. A. Kotenkov, С. П. Бычков, Denis A. Fokin, I. A. Ryzhikov, Aleksander V. Andriyash, Ilya A. Rodionov

Published Jun 1, 2026• 1 citation
arXivHTMLPDF

Abstract

Alpha-tantalum on silicon is a promising platform for high-coherence superconducting quantum circuits. However, the growth mechanism of alpha-tantalum on silicon remains poorly understood. We present a comprehensive study on alpha-tantalum film growth on various substrates. The decisive role of a substrate material Debye temperature on the phase selection mechanism in tantalum film growth is experimentally confirmed, contradicting the prior assumptions on substrate temperature influence. Crucially, we confirm that alpha-tantalum starts growing only after a 7–10- nm-thick beta-tantalum sublayer. It results in ranging the critical temperature of α-Ta films from 3.77 to 4.39 K for the total thickness from 20 to 150 nm, respectively. Finally, we compared high-quality Al and Ta coplanar resonators on silicon, demonstrating compact tantalum resonators (4/10.5/4 μm) with an internal quality factor exceeding 10 × 106 at single-photon excitation powers.

DOI
10.1063/5.0308010

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Alpha-tantalum on silicon is a promising platform for high-coherence superconducting quantum circuits. However, the growth mechanism of alpha-tantalum on silicon remains poorly understood. We present a comprehensive study on alpha-tantalum film growth on various substrates. The decisive role of a substrate material Debye temperature on the phase selection mechanism in tantalum film growth is experimentally confirmed, contradicting the prior assumptions on substrate temperature influence. Crucially, we confirm that alpha-tantalum starts growing only after a 7–10- nm-thick beta-tantalum sublayer. It results in ranging the critical temperature of α-Ta films from 3.77 to 4.39 K for the total thickness from 20 to 150 nm, respectively. Finally, we compared high-quality Al and Ta coplanar resonators on silicon, demonstrating compact tantalum resonators (4/10.5/4 μm) with an internal quality factor exceeding 10 × 106 at single-photon excitation powers.
Abstract Tantalum (Ta) films with a body-centered cubic α-phase play a crucial role in high-performance Ta-based superconducting quantum processors. The growth of pure α-Ta at low temperatures has been a long-term goal. Existing experience with Ta growth on silicon substrates has led to the belief that α-Ta can only be stabilized at high temperatures. In this study, we systematically analyzed the growth mechanism of Ta films on sapphire substrates using first-principles calculations, revealing a narrow growth energy window for pure α-Ta at room temperature (RT). This finding indicates the feasibility of obtaining pure α-Ta at significantly lower temperatures. Experimentally, we successfully achieved pure α-Ta at RT via magnetron sputtering by meticulously adjusting the growth parameters. The resulting superconducting resonators based on the developed RT α-Ta exhibit an internal quality factor ( Q i ) of approximately 2.1 × 10 6 at single-photon levels, comparable to those fabricated at high temperatures. Additionally, fixed-frequency transmon qubits fabricated using the RT α-Ta film demonstrate a coherence time exceeding 280 µs, underscoring the film’s high quality. The RT α-Ta without a seed layer simplifies the fabrication process, offering a more efficient and flexible approach for producing Ta-based superconducting quantum processors.
Polycrystalline α-tantalum (110) films deposited on the c-plane sapphire substrate by sputtering are used in superconducting qubits nowadays. However, these films always occasionally form other structures, such as α-tantalum (111) grains and β-tantalum grains. To improve the film quality, we investigate the growth of α-tantalum (110) films on the a-plane sapphire substrate under varying conditions by molecular beam epitaxy technology. The optimized α-tantalum (110) film is a single crystal, with a smooth surface and atomically flat metal–substrate interface. The film with thickness of 30 nm shows a Tc of 4.12 K and a high residual resistance ratio of 9.53. The quarter wavelength coplanar waveguide resonators fabricated with the 150 nm optimized α-tantalum (110) film exhibit intrinsic quality factor of over one million under single photon excitation at millikelvin temperature.
Tantalum thin films sputtered on unheated silicon substrates are characterized with microwaves at around 10 GHz in a 10 mK environment. We show that the phase of tantalum with a body-centered cubic lattice (α-Ta) can be grown selectively by depositing a niobium buffer layer prior to a tantalum film. The physical properties of the films, such as superconducting transition temperature and crystallinity, change markedly with the addition of the buffer layer. Coplanar waveguide resonators based on the composite film exhibit significantly enhanced internal quality factors compared with a film without the buffer layer. The internal quality factor approaches 2 × 107 at a large-photon-number limit. While the quality factor decreases at the single-photon level owing to two-level system (TLS) loss, we have deduced that one of the causes of TLS loss is the amorphous silicon layer at the film–substrate interface, which originates from the substrate cleaning before the film deposition rather than the film itself. The temperature dependence of the internal quality factors shows a marked rise below 200 mK, suggesting the presence of TLS–TLS interactions. The present low-loss tantalum films can be deposited without substrate heating and thus have various potential applications in superconducting quantum electronics.
Tantalum (Ta) is a promising material for reaching long coherence times in superconducting qubits. A detailed understanding of the underlying structure-property relationship remains elusive though. In the present study, we sputter-deposited 200 nm thick Ta films on high-resistivity silicon (100) substrates at temperatures ranging from T = 20°C to 600°C, as well as on different seed layers (Nb, TiN and TaN). Alpha-Ta thin films were readily obtained at temperatures above 500°C and on all seed layers. The films were characterized in terms of surface morphology, residual-resistance ratio, crystal phase composition and superconducting transition temperature, as well as RF-performance using coplanar waveguide resonators. Internal quality factors of up to 1.5 million were measured at 100 mK in the single-photon regime. Despite similar bulk material properties, alpha-Ta films on different seed layers exhibit markedly different RF-performance, which we attribute to dissimilar strain and structural defects at the substrate-metal interfaces. Williamson-Hall analysis of XRD data reveals a clear correlation between decreasing microstrain and increasing quality factor. Cross-sectional HR-TEM further supports this interpretation by directly resolving interfacial disorder. Our results highlight the critical role of interface engineering in optimizing superconducting thin films for low-loss quantum computing circuitry.
Abstract The use of α -tantalum in superconducting circuits has enabled a considerable improvement in the coherence time of transmon qubits. The standard approach to grow α -tantalum thin films on silicon involves heating the substrate, which takes several hours per deposition and prevents the integration of this material with wafers containing temperature-sensitive components. We report a detailed experimental study of an alternative growth method of α -tantalum on silicon, which is achieved at room temperature through the use of a niobium seed layer. Despite a substantially higher density of oxygen-rich grain boundaries in the films sputtered at room temperature, resonators made from these films are found to have state-of-the-art quality factors, comparable to resonators fabricated from tantalum grown at high temperature. This finding challenges previous assumptions about correlations between material properties and microwave loss of superconducting thin films, and opens a new avenue for the integration of tantalum into fabrication flows with limited thermal budget.
Superconducting qubits are a promising platform for large-scale quantum computing. Besides the Josephson junction, most parts of a superconducting qubit are made of a planar, patterned superconducting thin films. In the past, most qubit architectures have relied on niobium (Nb) as the material of choice for the superconducting layer. However, there is also a variety of alternative materials with potentially less losses, which may thereby result in increased qubit performance. One such material is tantalum (Ta), for which high-performance qubit components have already been demonstrated. In this study, we report the sputter-deposition of Ta thin films directly on heated and unheated silicon (Si) substrates as well as onto different, nanometer-thin seed layers from tantalum nitride (TaN), titanium nitride (TiN) or aluminum nitride (AIN) that were deposited first. The thin films are characterized in terms of surface morphology, crystal structure, phase composition, critical temperature, residual resistance ratio (RRR) and RF-performance. We obtain thin films indicative of pure alpha-Ta for high temperature (600°C) sputtering directly on silicon and for Ta deposited on TaN or TiN seed layers. Coplanar waveguide (CPW) resonator measurements show that the Ta deposited directly on the heated silicon substrate performs best with internal quality factors Qi reaching 1xl06in the single-photon regime, measured at T=100 mK.