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Superconductor Science and Technology

Room temperature pure α-phase tantalum films on sapphire for superconducting qubits

Kunliang Bu, Zhiwen Zong, Zhenxing Zhang, Xingyu Ma, Ming Shao, Dengfeng Li, Yuan Li, Jingjing Hu, Sainan Huai, Shuoming An, Tianqi Cai, Xiaopei Yang, Maochun Dai, Yi-Cong Zheng, Shengyu Zhang

Published Jan 15, 2025• 1 citation
Publisher

Abstract

Abstract Tantalum (Ta) films with a body-centered cubic α-phase play a crucial role in high-performance Ta-based superconducting quantum processors. The growth of pure α-Ta at low temperatures has been a long-term goal. Existing experience with Ta growth on silicon substrates has led to the belief that α-Ta can only be stabilized at high temperatures. In this study, we systematically analyzed the growth mechanism of Ta films on sapphire substrates using first-principles calculations, revealing a narrow growth energy window for pure α-Ta at room temperature (RT). This finding indicates the feasibility of obtaining pure α-Ta at significantly lower temperatures. Experimentally, we successfully achieved pure α-Ta at RT via magnetron sputtering by meticulously adjusting the growth parameters. The resulting superconducting resonators based on the developed RT α-Ta exhibit an internal quality factor ( Q i ) of approximately 2.1 × 10 6 at single-photon levels, comparable to those fabricated at high temperatures. Additionally, fixed-frequency transmon qubits fabricated using the RT α-Ta film demonstrate a coherence time exceeding 280 µs, underscoring the film’s high quality. The RT α-Ta without a seed layer simplifies the fabrication process, offering a more efficient and flexible approach for producing Ta-based superconducting quantum processors.

DOI
10.1088/1361-6668/adaaa8

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Abstract Tantalum (Ta) films with a body-centered cubic α-phase play a crucial role in high-performance Ta-based superconducting quantum processors. The growth of pure α-Ta at low temperatures has been a long-term goal. Existing experience with Ta growth on silicon substrates has led to the belief that α-Ta can only be stabilized at high temperatures. In this study, we systematically analyzed the growth mechanism of Ta films on sapphire substrates using first-principles calculations, revealing a narrow growth energy window for pure α-Ta at room temperature (RT). This finding indicates the feasibility of obtaining pure α-Ta at significantly lower temperatures. Experimentally, we successfully achieved pure α-Ta at RT via magnetron sputtering by meticulously adjusting the growth parameters. The resulting superconducting resonators based on the developed RT α-Ta exhibit an internal quality factor ( Q i ) of approximately 2.1 × 10 6 at single-photon levels, comparable to those fabricated at high temperatures. Additionally, fixed-frequency transmon qubits fabricated using the RT α-Ta film demonstrate a coherence time exceeding 280 µs, underscoring the film’s high quality. The RT α-Ta without a seed layer simplifies the fabrication process, offering a more efficient and flexible approach for producing Ta-based superconducting quantum processors.
Abstract Tantalum (Ta) is a promising material for superconducting qubits due to its stable chemical properties, formation of a single oxide, and resistance to reaction with other substances. However, achieving the desired α -Ta typically requires high-temperature substrate heating, leading to a time-consuming process and stringent requirements for the film deposition system. Here we demonstrate the deposition of high-quality α -Ta at room temperature using a niobium (Nb) film as a buffer layer. The buffered films are characterized using x-ray diffraction, transmission electron microscopy, and scanning electron microscopy. Transmons with capacitors, transmission lines, and readout resonators fabricated with such Nb-buffered Ta exhibit excellent performance. We observed an “inflection point” in the dependence of the Q i of the resonators on the input microwave photons, which can be fitted well with an expression for the superposition of the buffered resonators. These experimental results show that the buffered films deposited at room temperature have promising applications in superconducting devices.
Tantalum-based transmon qubits are a promising platform for building large-scale quantum processors. So far, these qubits have been made from tantalum films grown exclusively in the alpha phase (α-Ta). The beta phase of tantalum (\{beta}-Ta) readily nucleates at room temperature, making it attractive for scalable qubit fabrication. However, \{beta}-Ta is widely believed to be detrimental to qubit performance because it has a lower superconducting critical temperature than α-Ta. We challenge this prevailing belief by fabricating low-loss transmon qubits from \{beta}-Ta films on sapphire. Across 11 qubits, the mean time-averaged quality factor is (5.6 +/- 2.3) x 10^6, with the best qubit recording a time-averaged quality factor of (10.1 +/- 1.3) x 10^6. Resonator studies demonstrate that the dominant microwave loss channel is surface two-level systems, with the surface loss contribution for \{beta}-Ta being about twice that of α-Ta. \{beta}-Ta films exhibit significant kinetic inductance, consistent with an estimated magnetic penetration depth of (1.78 +/- 0.02) μm. This work establishes \{beta}-Ta on sapphire as a material platform for realizing low-loss transmon qubits and other superconducting devices such as compact resonators, kinetic inductance detectors, and quasiparticle traps.
Abstract Intrigued by the discovery of the long lifetime in the α-Ta/Al2O3-based Transmon qubit, researchers recently found α-Ta film is a promising platform for fabricating multi-qubits with long coherence time. To meet the requirements for integrating superconducting quantum circuits, the ideal method is to grow α-Ta film on silicon substrate compatible with industrial manufacturing. Here we report the α-Ta film sputter-grown on Si (100) with low-loss superconducting TiNx buffer layer. The pure-phase α-Ta film with a large growth temperature window has good crystalline character. The critical temperature (Tc) and residual resistance ration (RRR) in the α-Ta film grown at 500 oC are higher than that in the α-Ta film grown at room temperature. These results provide crucial experimental clues towards understanding the connection between the superconductivity and the materials' properties in the α-Ta film, and open a new route for producing high-quality α-Ta film on silicon substrate for future industrial superconducting quantum computer.
Abstract The use of α -tantalum in superconducting circuits has enabled a considerable improvement in the coherence time of transmon qubits. The standard approach to grow α -tantalum thin films on silicon involves heating the substrate, which takes several hours per deposition and prevents the integration of this material with wafers containing temperature-sensitive components. We report a detailed experimental study of an alternative growth method of α -tantalum on silicon, which is achieved at room temperature through the use of a niobium seed layer. Despite a substantially higher density of oxygen-rich grain boundaries in the films sputtered at room temperature, resonators made from these films are found to have state-of-the-art quality factors, comparable to resonators fabricated from tantalum grown at high temperature. This finding challenges previous assumptions about correlations between material properties and microwave loss of superconducting thin films, and opens a new avenue for the integration of tantalum into fabrication flows with limited thermal budget.
Alpha-tantalum on silicon is a promising platform for high-coherence superconducting quantum circuits. However, the growth mechanism of alpha-tantalum on silicon remains poorly understood. We present a comprehensive study on alpha-tantalum film growth on various substrates. The decisive role of a substrate material Debye temperature on the phase selection mechanism in tantalum film growth is experimentally confirmed, contradicting the prior assumptions on substrate temperature influence. Crucially, we confirm that alpha-tantalum starts growing only after a 7–10- nm-thick beta-tantalum sublayer. It results in ranging the critical temperature of α-Ta films from 3.77 to 4.39 K for the total thickness from 20 to 150 nm, respectively. Finally, we compared high-quality Al and Ta coplanar resonators on silicon, demonstrating compact tantalum resonators (4/10.5/4 μm) with an internal quality factor exceeding 10 × 106 at single-photon excitation powers.
Abstract Tantalum (Ta) is a promising material for superconducting qubits due to its stable chemical properties, formation of a single oxide, and resistance to reaction with other substances. However, achieving the desired α-Ta typically requires high-temperature substrate heating, leading to the time-consuming process and stringent requirements of the film deposition system. Here we demonstrate the deposition of high-quality α-Ta at room temperature using the niobium (Nb) film as a buffer layer. The multilayer films are characterized using X-ray diffraction, transmission electron microscopy, and scanning electron microscopy. Transmons with capacitors, transmission lines, and readout resonators fabricated with such Nb buffered Ta exhibit excellent performance. We observe an “inflection point” in the dependence of the Qi of the resonators on the input microwave photons, which can be fitted well with an expression for the superposition of the multilayer resonators. These experimental results show that the multilayer films deposited at room temperature have promising applications in superconducting devices.