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arXiv:1505.04257

Superconducting qubit without Josephson junctions manipulated by the orbital angular momentum of light

Sang Jae Yun

Published May 16, 2015• 0 citations
arXivHTMLPDF

Abstract

Conventional superconducting qubits have used Josephson junctions as an essential part to provide anharmonicity for well-separated energy-level spacings. However, because a superconducting ring without Josephson junctions has intrinsically well-separated energy-level spacings, Josephson junctions are not necessary as long as one can achieve single-qubit operations. We show that the orbital angular momentum of light can be adopted as a qubit-control means and can eliminate the need for Josephson junctions. The feasibility study reveals that the proposed qubit has many advantages over the previous ones. The lifetime of the qubit is extended due to the lack of the junction resistance. Very fast (sub-nanosecond) qubit manipulation in both single- and two-qubit gate is achieved. Without Josephson junctions, the fabrication process is simple and the deviations in the characteristics of each qubit can be improved.

DOI
10.48550/arxiv.1505.04257

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Conventional superconducting qubits have used Josephson junctions as an essential part to provide anharmonicity for well-separated energy-level spacings. However, because a superconducting ring without Josephson junctions has intrinsically well-separated energy-level spacings, Josephson junctions are not necessary as long as one can achieve single-qubit operations. We show that the orbital angular momentum of light can be adopted as a qubit-control means and can eliminate the need for Josephson junctions. The feasibility study reveals that the proposed qubit has many advantages over the previous ones. The lifetime of the qubit is extended due to the lack of the junction resistance. Very fast (sub-nanosecond) qubit manipulation in both single- and two-qubit gate is achieved. Without Josephson junctions, the fabrication process is simple and the deviations in the characteristics of each qubit can be improved.
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We introduce a simplified fabrication technique for Josephson junctions and demonstrate superconducting Xmon qubits with T1 relaxation times averaging above 50 μs (Q>1.5×106). Current shadow-evaporation techniques for aluminum-based Josephson junctions require a separate lithography step to deposit a patch that makes a galvanic, superconducting connection between the junction electrodes and the circuit wiring layer. The patch connection eliminates parasitic junctions, which otherwise contribute significantly to dielectric loss. In our patch-integrated cross-type junction technique, we use one lithography step and one vacuum cycle to evaporate both the junction electrodes and the patch. This eliminates a key bottleneck in manufacturing superconducting qubits by reducing the fabrication time and cost. In a study of more than 3600 junctions, we show an average resistance variation of 3.7% on a wafer that contains forty 0.5×0.5-cm2 chips, with junction areas ranging between 0.01 and 0.16 μm2. The average on-chip spread in resistance is 2.7%, with 20 chips varying between 1.4% and 2%. For the junction sizes used for transmon qubits, we deduce a wafer-level transition-frequency variation of 1.7%–2.5%. We show that 60%–70% of this variation is attributed to junction-area fluctuations, while the rest is caused by tunnel-junction inhomogeneity. Such high frequency predictability is a requirement for scaling-up the number of qubits in a quantum computer.
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Josephson tunnel junctions are the centerpiece of almost any superconducting electronic circuit, including qubits. Typically, the junctions for qubits are fabricated using shadow evaporation techniques to reduce dielectric loss contributions from the superconducting film interfaces. In recent years, however, sub-micrometer scale overlap junctions have started to attract attention. Compared to shadow mask techniques, neither an angle dependent deposition nor free-standing bridges or overlaps are needed, which are significant limitations for wafer-scale processing. This comes at the cost of breaking the vacuum during fabrication, but simplifies integration in multi-layered circuits and implementation of vastly different junction sizes and enables fabrication on a larger scale in an industrially standardized process. In this work, we demonstrate the feasibility of a subtractive process for the fabrication of overlap junctions. In an array of test contacts, we find low aging of the average normal state resistance of only 1.6% over 6 months. We evaluate the coherence properties of the junctions by employing them in superconducting transmon qubits. In time domain experiments, we find that both, the qubit life- and coherence time of our best device, are, on average, greater than 20 μs. Finally, we discuss potential improvements to our technique. This work paves the way toward a more standardized process flow with advanced materials and growth processes, and constitutes an important step for the large scale fabrication of superconducting quantum circuits.
Fabrication of sub-micron Josephson junctions is demonstrated using standard processing techniques for high-coherence, superconducting qubits. These junctions are made in two separate lithography steps with normal-angle evaporation. Most significantly, this work demonstrates that it is possible to achieve high coherence with junctions formed on aluminum surfaces cleaned in situ with Ar milling before the junction oxidation. This method eliminates the angle-dependent shadow masks typically used for small junctions. Therefore, this is conducive to the implementation of typical methods for improving margins and yield using conventional CMOS processing. The current method uses electron-beam lithography and an additive process to define the top and bottom electrodes. Extension of this work to optical lithography and subtractive processes is discussed.