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Assessment of Overdamped SNS Niobium-Based Josephson Junctions for Digital Applications

V. Lacquaniti, N. de Leo, M. Fretto, S. Maggi, A. Sosso, David Bouis, Pascal Febvre

Published Aug 17, 2008• 0 citations
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Abstract

SNS Nb/Al-AlOx/Nb Josephson junctions have been recently developed with Al layer thicknesses 30- 100 nm , for which non-hysteretic I-V characteristics have been obtained by oxidation ranging from 150 to 200 Pa.s. The Stewart-McCumber parameter of the junctions can be lower or higher than unity, depending on the above-mentioned conditions. Typical Jc values of several tens of kA/cm2 and RnIc values up to 0.5-0.7 mV at 4.2 K have been obtained, suitable for digital applications. Two interesting features of this technology are: i) the absence of external shunt resistance that can allow higher integration and; ii) the reproducibility of technological parameters that is connected to a least dependence of the Josephson critical current on the barrier thickness. In this work, we will present a detailed analysis of speed and jitter that can be expected from basic digital circuits based on such a technology. This analysis is based on the accurate experimental extraction of typical quantities, like the Stewart-McCumber parameter or specific capacitance. In particular, the influence of the temperature of operation on the performance of elementary cells will be assessed. A comparisonwith similar cells based on externally-shunted Josephson junctions will be presented in order to evaluate the ranges of parameters for which this technology exhibits some clear advantages. In particular we will show the technological constraints that need to be met in order to build circuits that can compete with existing technologies

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SNS Nb/Al-AlOx/Nb Josephson junctions have been recently developed with Al layer thicknesses 30- 100 nm , for which non-hysteretic I-V characteristics have been obtained by oxidation ranging from 150 to 200 Pa.s. The Stewart-McCumber parameter of the junctions can be lower or higher than unity, depending on the above-mentioned conditions. Typical Jc values of several tens of kA/cm2 and RnIc values up to 0.5-0.7 mV at 4.2 K have been obtained, suitable for digital applications. Two interesting features of this technology are: i) the absence of external shunt resistance that can allow higher integration and; ii) the reproducibility of technological parameters that is connected to a least dependence of the Josephson critical current on the barrier thickness. In this work, we will present a detailed analysis of speed and jitter that can be expected from basic digital circuits based on such a technology. This analysis is based on the accurate experimental extraction of typical quantities, like the Stewart-McCumber parameter or specific capacitance. In particular, the influence of the temperature of operation on the performance of elementary cells will be assessed. A comparisonwith similar cells based on externally-shunted Josephson junctions will be presented in order to evaluate the ranges of parameters for which this technology exhibits some clear advantages. In particular we will show the technological constraints that need to be met in order to build circuits that can compete with existing technologies
An interesting feature of Superconductor Normal metal Superconductor - Josephson junctions for digital applications is due to their non-hysteretic current-voltage characteristics in a broad temperature range below Tc. This allows to design Single-Flux-Quantum (SFQ) cells without the need of external shunts. Two advantages can be drawn from this property: first the SFQ cells can be more compact which leads to a more integrated solution towards nano-devices and more complex circuits; second the absence of electrical parasitic elements associated with the wiring of resistors external to the Josephson junctions increases the performance of SFQ circuits, in particular regarding the ultimate speed of operation. For this purpose Superconductor Normal metal Insulator-Superconductor Nb/Al-AlOx/Nb Josephson junctions have been recently developed at INRiM with aluminum layer thicknesses between 30 and 100 nm. They exhibit non-hysteretic current-voltage characteristics with RnIc values higher than 0.5 mV in a broad temperature range and optimal Stewart McCumber parameters at 4.2 K for RSFQ applications. The main features of obtained SNIS junctions regarding digital applications are presented.
Intrinsically shunted Josephson junctions based on NbN superconducting material can exhibit RnIc products in the1-3 mV range at temperatures in the 4-10K range, while presenting non hysteretic current-voltage characteristics. For these reasons, they are a suitable alternative for digital electronics since they can be ultimately highly integrated, while operating at clock frequencies above 100 GHz. In this work, departing from some experimental data of Josephson junctions measured in different conditions, we will present the expected performances in terms of ultimate speed, bit-error-rate and temperature of operation that can be reached with such a technology, for a few breadboard digital circuits. Circuits using interface converters, Josephson transmission lines, shift registers and several flip-flop cells are investigated for this purpose. An analysis is done in order to compare the potentialities and drawbacks of this technology with its existing low-Tc and high-Tc counterparts. The emphasis will be put on the technological requirements that are necessary to be met in order to achieve a given performance.
Overdamped Nb/Al-AlOx/Nb Josephson junctions are an intermediate state between the SIS and SNS Josephson junctions. With a proper choice of fabrication parameters, stable and reproducible nonhysteretic curent-voltage characteristics have been obtained Featuring critical current densities up to 70 kA/cm2and characteristic voltages up to 450 μV at 4.2 K, overdamped junctions are suitable for many aplications ranging from RSFQ electronic circuits to programmable and ac voltage standards. Tests on single junctions arrays of series-connected junctions have shown a suitable behaviour when driven by a microwave with frequencies around 75 GHz. The quantized steps have proven to be stable and flat at nV level. These junctions also shown an improved temperature dependence, which can be interesting in view of the development instrumentation with an integrated quantum voltage reference operated in a closed cycle refrigerator.
To increase the integration scale of superconductor electronics, we are developing a new node, titled SFQ7ee, of the fabrication process at MIT Lincoln Laboratory. In comparison to the existing SFQ5ee node, we increased the number of fully planarized superconducting layers to ten and utilized NbN and NbN/Nb kinetic inductors to increase the possible inductor number density above a hundred million inductors per cm2. Increasing the Josephson junction number density to the same level requires implementing self-shunted high-JcJosephson junctions. We investigated the properties of Nb/NbNx/Nb trilayer junctions as a potential replacement of high-JcNb/Al-AlOx/Nb junctions, where NbNxis a disordered, overstoichiometric, nonsuperconducting nitride deposited by reactive sputtering. Dependences of theIcRnproduct and Josephson critical current density, Jc on the NbNx barrier thickness and temperature were studied in the thickness range from 5 nm to 20 nm. The fabricated junctions can be well described by the microscopic theory of SNS junctions, assuming no suppression of the energy gap in Nb electrodes near the NbNxinterfaces and a Cooper pair decay length in the NbNx barrier, ξnTcof about 2.3 nm. Current-voltage characteristics of the junctions are well described by the resistively and capacitively shunted junction (RCSJ) model without excess current. In the studied rangeJc2, the Nb/NbNx/Nb junctions have lower values of the specific resistanceRnA, lower IcRn products, and a stronger dependence of theIcRnon temperature than the self-shunted or critically damped externally shunted Nb/Al-AlOx/Nb junctions with the same critical current density; A is the junction area,Icthe junction critical current, and Rnthe effective shunting resistance.
We present characteristics of overdamped Josephson junctions consisting of Nb/AlOx/Al/ AlOx/Nb structures. The junctions were fabricated using a well-developed Nb/AlOx/Nb-junction technology and showed well-defined Josephson characteristics at 4.2 K. The characteristic voltage Vc [the product of the critical current Ic and the effective normal resistance Rn(eff)] of junctions, which determines high-frequency performance of the junction, was in the range of 0.1–0.5 mV, and the critical current density Jc in the range of 102–104 A/cm2. Maximum-to-minimum variations in Ic over a wafer were ±4% for junctions with Vc=0.15 mV and ±13% for junctions with Vc=0.5 mV.
Josephson junctions (JJs) with non-hysteretic I-V characteristic and high critical parameters are required for many applications; in particular, they are needed to create tunable THz range oscillators. We fabricated and studied shunted superconductor-insulator-superconductor (SIS) Nb-AlOx-Nb tunnel junctions with an area of about 1μm2, estimated their parameters, and compared them with theoretical models. To assess the performance of shunted junctions in the terahertz range, their characteristics were studied under the influence of a high-frequency signal; the estimated value of the characteristic voltage for the shunted junction at a high frequency is about 1 mV. To improve the circuit parameters, a new type of the shunting based on application of NIS junctions was proposed, which reduces the influence of parasitic inductance, expands the frequency range of the generator, and decreases the size of the structure. The JJs with a new type of shunting have been fabricated and studied. The niobium integrated circuits intended for matching the superconducting oscillator and an SIS junction as a microwave detector were designed, fabricated, and tested. Such structures are required for studying the spectral characteristics and analyzing the operation of the oscillator. The developed circuits have demonstrated efficient operation at frequencies from 300 to 700 GHz; the experimental results are in good agreement with the simulated characteristics. The results obtained will be implemented for further development of the THz range oscillators.