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IEEE Workshop on Low Temperature Electronics (WOLTE)

Now developments in textured and epitaxial NbN superconducting layers for ultimate sensors and RSFQ digital circuits

Jiirgen Miller, N. Hadacek, Corentin Jorel, Jean-Luc Thomassin, Vincent Bouchiat, Marc Faucher, Pascal Febvre, A. Rousy, G. Lamura

Published Jan 1, 2002• 0 citations
Publisher
DOI
10.1109/wolte.2002.1022465

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Nitride superconductors and specially niobium nitride are key materials for developing high performance optoelectronic and digital circuits. We are presenting a way to achieve such high frequency devices on R-plane sapphire or MgO substrates. Deposition of thin and flat NbN films with Te above 10 K, low and reproducible penetration depth ( L 250 nm) and surface resistance (Rs) values up to I THz, is required and obtained by sputtering on a substrate heated in the 300-600 °C range. Simple sub-micrometer size HEB bridge structures where patterned even in a very thin (2-5 nm thick) NbN layers offering relaxation times below 30 ps. It is then possible to achieve fast optoelectronic data links and sensors on-chip with high clock frequency NbN RSFQ digital circuits.
In recent years, rapid single flux quantum (RSFQ) circuits, which are promising for the development of high-speed digital electronics, have attracted widespread interest. Niobium nitride (NbN) films have also attracted significant attention for high-frequency applications in superconducting electronics because of their superior material parameters, including their high critical temperature Tc and large gap voltage Vg. To enable the development of all-NbN SFQ circuits, we have developed a fabrication process based on NbN junctions and inductors made of NbN strip lines. It is important to evaluate the inductance because it can affect the performance of an RSFQ circuit and is essential for the RSFQ design. We measured the inductance properties of both epitaxial and polycrystalline NbN strip lines using a superconducting quantum interference device modulation technique at 4.2 K and obtained the width dependence on the inductance of the NbN films. The penetration depth was then calculated from these measurements. The NbN inductance values were calculated numerically with respect to the penetration depth and were then compared with the measured values from the experiments. It was demonstrated that the differences between these values were within 5%. The results reported here will be useful for the design and fabrication of all-NbN RSFQ circuits.
A generic NbN Superconducting Tunnel Junctions (STJ) technology has been developed using conventional substrates (Si and SOI-SIMOX) for making THz spectrometers including SIS receivers and RSFQ logic gates. NbN/MgO/NbN junctions with area of 1 /spl mu/m/sup 2/, Jc of 10 kA/cm/sup 2/ and low sub-gap leakage current (Vm>25 mV) are currently obtained from room temperature sputtered multilayers followed by a post-annealing at 250/spl deg/C. Using a thin MgO buffer layer deposited underneath the NbN electrodes, ensures lower NbN surface resistance values (Rs=7 /spl mu//spl Omega/) at 10 GHz and 4 K. Epitaxial NbN [100] films on MgO [100] with high gap frequency (1.4 THz) have also been achieved under the same deposition conditions at room temperature. The NbN SIS has shown good I-V photon induced steps when LO pumped at 300 GHz. We have developed an 8 levels Al/NbN multilayer process for making 1.5 THz SIS mixers (including Al antennas) on Si membranes patterned in SOI-SIMOX. Using the planarization techniques developed at the Si-MOS CEA-LETI Facility, we have also demonstrated on the possibility of extending our NbN technology to high level RSFQ circuit integration with 0.5 /spl mu/m/sup 2/ junction area, made on large area substrates (up to 8 inches).