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IEEE Transactions on Applied Superconductivity

Processing and characterization of high Jc NbN superconducting tunnel junctions for THz analog circuits and RSFQ

Vincent Larrey, J.C. Villégier, Morvan C. Salez, F. Miletto Granozio, Alexandre Karpov

Published Jun 1, 1999• 14 citations
Publisher

Abstract

A generic NbN Superconducting Tunnel Junctions (STJ) technology has been developed using conventional substrates (Si and SOI-SIMOX) for making THz spectrometers including SIS receivers and RSFQ logic gates. NbN/MgO/NbN junctions with area of 1 /spl mu/m/sup 2/, Jc of 10 kA/cm/sup 2/ and low sub-gap leakage current (Vm>25 mV) are currently obtained from room temperature sputtered multilayers followed by a post-annealing at 250/spl deg/C. Using a thin MgO buffer layer deposited underneath the NbN electrodes, ensures lower NbN surface resistance values (Rs=7 /spl mu//spl Omega/) at 10 GHz and 4 K. Epitaxial NbN [100] films on MgO [100] with high gap frequency (1.4 THz) have also been achieved under the same deposition conditions at room temperature. The NbN SIS has shown good I-V photon induced steps when LO pumped at 300 GHz. We have developed an 8 levels Al/NbN multilayer process for making 1.5 THz SIS mixers (including Al antennas) on Si membranes patterned in SOI-SIMOX. Using the planarization techniques developed at the Si-MOS CEA-LETI Facility, we have also demonstrated on the possibility of extending our NbN technology to high level RSFQ circuit integration with 0.5 /spl mu/m/sup 2/ junction area, made on large area substrates (up to 8 inches).

DOI
10.1109/77.783713

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A generic NbN Superconducting Tunnel Junctions (STJ) technology has been developed using conventional substrates (Si and SOI-SIMOX) for making THz spectrometers including SIS receivers and RSFQ logic gates. NbN/MgO/NbN junctions with area of 1 /spl mu/m/sup 2/, Jc of 10 kA/cm/sup 2/ and low sub-gap leakage current (Vm>25 mV) are currently obtained from room temperature sputtered multilayers followed by a post-annealing at 250/spl deg/C. Using a thin MgO buffer layer deposited underneath the NbN electrodes, ensures lower NbN surface resistance values (Rs=7 /spl mu//spl Omega/) at 10 GHz and 4 K. Epitaxial NbN [100] films on MgO [100] with high gap frequency (1.4 THz) have also been achieved under the same deposition conditions at room temperature. The NbN SIS has shown good I-V photon induced steps when LO pumped at 300 GHz. We have developed an 8 levels Al/NbN multilayer process for making 1.5 THz SIS mixers (including Al antennas) on Si membranes patterned in SOI-SIMOX. Using the planarization techniques developed at the Si-MOS CEA-LETI Facility, we have also demonstrated on the possibility of extending our NbN technology to high level RSFQ circuit integration with 0.5 /spl mu/m/sup 2/ junction area, made on large area substrates (up to 8 inches).
ABSTRACT: Active superconducting circuits based on picoseconds switching, i.e. THz oscillating, Josephson tunnel junctions are expected to find a large domain of applications in spatial sub-millimeter wave and FIR detectors as well as in satellite based wideband signal and data processors. In the first case SIS (superconductor-insulator-superconductor) tunnel junctions are required, while in the second case SNS (superconductor-normal metal-superconductor) self-shunted junctions are preferred. We present the advantages of the nitride junction technology currently developed at CEA-Grenoble, based on high-performance MTS (medium temperature superconductor) NbN films in both SIS and SNS junctions. In the SIS case the device performances rely on a sputter deposited and post-annealed, only 0.5-0.7 nm thick, dielectric MgO barrier. This leads to junctions with a Josephson critical current in the range of 10-25 kA/cm, and a large superconducting energy gap (> 5 meV) associated with a low sub-gap quasi-particle leakage current. These parameters are suitable for low “noise temperature ” heterodyne mixers, local oscillators, and integrated receivers in the 0.8 to 1.4 THz frequency range. In the SNS case, a new
The authors report on the fabrication and testing of all-refractory NbN/MgO/NbN SIS (superconductor-insulator-superconductor) tunnel junctions for use as high-frequency mixers. Progress in the development of techniques for the fabrication of submicron-area tunnel junctions is described. Junction structures which have been investigated include mesa, crossline, and edge geometries. Using reactive sputtering techniques, NbN tunnel junctions with critical currents in excess of 10/sup 4/ A/cm/sup 2/ have been fabricated with V/sub m/ values as high as 65 mV and areas down to 0.1 mu m/sup 2/. Specific capacitance measurements on NbN/MgO/NbN mesa-type tunnel junctions give values in the range 60-90 fF/ mu m/sup 2/. These SIS tunnel junctions have been integrated with antennas and coupling structures for mixer tests in a waveguide receiver at 207 GHz. Preliminary mixer results are reported.>
We report on the fabrication and properties of high current density NbN/AlN/NbN tunnel junctions for the application of superconducting SIS mixers in the submillimeter wave regions. Junctions having current densities as high as 50 kA/cm/sup 2/ exhibited a good Josephson tunneling behaviour, excellent terahertz response, and sensitive heterodyne mixing properties. Accurate values of junction capacitance were estimated by measuring dc-SQUID resonant steps for the design of tuning circuits. The measured specific capacitance gives values in the range of 20-200 fF//spl mu/m/sup 2/ for the current density range of 1-100 kA/cm/sup 2/. The NbN/AlN/NbN tunnel junctions were integrated with a NbN thin film antenna to investigate the terahertz responses and mixing tests in a quasi-optical testing system. Photon-assisted tunneling steps were clearly observed on the I-V curve with irradiation up to 1.02 THz, and a low-noise heterodyne mixing was demonstrated in the 300-GHz band.
A new NbN multilayer technology has been developed on 3 inch diameter R-plane sapphire substrates, for combining on-chip fast RSFQ circuits with GHz bandwidth optical links, The circuits take advantage of two high quality [110] NbN layers sputtered epitaxially on sapphire at 600/spl deg/C and selectively patterned: a 400 nm thick layer (/spl lambda//sub L//spl sim/250 nm at 6 K) acts for the ground-plane and microbridge photodetectors are made of a 3.5-8 nm thick NbN epilayer with T/sub c/ above 11 K. Innovative dielectrics formed of 10 nm thick MgO sputtered on top of 200 mm SiO/sub 2/ layers are found to improve significantly the superconductivity of NbN junction electrode lines deposited below 300/spl deg/C. Good quality, hysteretic 2 /spl mu/m/sup 2/ area, NbN/MgO/NbN junctions with high J/sub c/ (up to 50 kA/cm/sup 2/) are obtained with very large gap voltage (6.20 mV) and low sub-gap leakage current (V/sub m/>15 mV) at 4.2 K. At 11 K such junctions are found self-shunted (J/sub c//spl sim/10 k4/cm/sup 2/) with R/sub n/I/sub c/ above 0.5 mV and with low J/sub c/ spread in arrays. J/sub c/ can be adjusted (reduced) without any detrimental effect on the junction quality or spread by annealing at 250/spl deg/C.
We have fabricated both NbN/Ta x N/NbN SN*S-type, NbN/MgO/NbN SIS-type Josephson junctions and microwave band-pass filters on different substrates (Si, Sapphire, MgO). NbN films have been deposited on both sides of (100) oriented, 250 µm thick, MgO substrates with a high crystalline texture quality. The aim was to investigate the performances and the maximum achievable operating frequency in an NbN based RSFQ modulator front-end of an ADC in the 4 K-10 K temperature range. We observed that Ta x N thin films can be tuned from an insulating phase to a superconducting phase (Tc ∼4K) by varying the nitrogen content during sputter deposition while the barrier height of MgO can also be controlled by deposition conditions and by tri-layer postdeposition annealing. Junction properties (Jc∼10-25 kA/cm 2 ), Mac Cumber parameter and RnIc product measured up to 1 mV are shown to be controlled by the reactive sputtering conditions. We have designed three pole band-pass filters and resonators in a micro-strip configuration and studied the junction coupling with the filters. We will show that a sigma-delta NbN technology is a suitable solution for analogue-to-digital conversion in the future generations of telecommunication satellites to achieve high sampling frequency and large bandwidth at high carrier frequency signal.
Heterodyne mixers based on superconducting SIS (superconductor-insulator-superconductor) tunnel junctions have been demonstrated to be the most sensitive coherent detectors at millimeter and submillimeter wavelengths. In fact, conventional superconducting SIS mixers with Nb/AlOx/Nb junction and Nb/SiO2/Nb tuning circuit have shown good performances with the noise temperature reaching as low as three times the quantum limit below 0.7THz, which is the gap frequency of Nb-based SIS junctions. However, due to the large loss in Nb thin-film superconducting microstrip lines, the noise performance of Nb SIS mixers deteriorates significantly above 0.7THz. With a gap frequency double that of Nb-based SIS junctions, NbN-based SIS junctions are of particular interest for the development of heterodyne mixers in the terahertz region. Considering the bandwidth and output power of local-oscillator (LO) signal sources are quite limited around 1THz, we firstly develop a waveguide NbN-based SIS mixer at 0.5THz. Three types of SIS junctions, i.e., long junction, parallel-connected tunnel junction (PCTJ) and distributed junction array (DJ) are investigated. They are all comprised of NbN-AlN-NbN tri-layer fabricated on an MgO substrate and have the same current density (Jc) of 10kA/cm2. In this paper, we describe their design, fabrication and preliminary experimental results.