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Quantum Science and Technology

Design, fabrication and characterization of a micro-fabricated stacked-wafer segmented ion trap with two X-junctions

Chiara Decaroli, Roland Matt, R. Oswald, Christopher J. Axline, Maryse Ernzer, Jeremy Flannery, Simon Ragg, Jonathan Home

Published Jun 3, 2021• 22 citations
Publisher

Abstract

Abstract We describe the implementation of a three-dimensional Paul ion trap fabricated from a stack of precision-machined silica glass wafers, which incorporates a pair of junctions for two-dimensional ion transport. The trap has 142 dedicated electrodes which can be used to define multiple potential wells in which strings of ions can be held. By supplying time-varying potentials, this also allows for transport and re-configuration of ion strings. We describe the design, simulation, fabrication and packaging of the trap, including explorations of different parameter regimes and possible optimizations and design choices. We give results of initial testing of the trap, including measurements of heating rates and junction transport.

DOI
10.1088/2058-9565/ac07ee

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Abstract We describe the implementation of a three-dimensional Paul ion trap fabricated from a stack of precision-machined silica glass wafers, which incorporates a pair of junctions for two-dimensional ion transport. The trap has 142 dedicated electrodes which can be used to define multiple potential wells in which strings of ions can be held. By supplying time-varying potentials, this also allows for transport and re-configuration of ion strings. We describe the design, simulation, fabrication and packaging of the trap, including explorations of different parameter regimes and possible optimizations and design choices. We give results of initial testing of the trap, including measurements of heating rates and junction transport.
We describe the implementation of a three-dimensional Paul ion trap fabricated from a stack of precision-machined silica glass wafers, which incorporates a pair of junctions for 2-dimensional ion transport. The trap has 142 dedicated electrodes which can be used to define multiple potential wells in which strings of ions can be held. By supplying time-varying potentials, this also allows for transport and re-configuration of ion strings. We describe the design, simulation, fabrication and packaging of the trap, including explorations of different parameter regimes and possible optimizations and design choices. We give results of initial testing of the trap, including measurements of heating rates and junction transport.
We present the design, fabrication, and characterization of a monolithic, segmented, three-dimensional linear Paul ion trap for quantum science applications. The trap is fabricated from a single fused-silica block using selective laser-induced etching (SLE) and is subsequently metallized, forming electrodes isolated by self-shadowing trench structures without the need for layer alignment or external shadow masks. The segmented electrodes allow for shaping of the axial potential, enabling the creation of anharmonic potential wells, such as those required for equidistant ion strings. In addition, they enable shuttling and splitting of ion chains. We discuss key design choices and SLE-imposed constraints on achievable feature sizes, and evaluate electron-beam evaporation and magnetron sputtering as metallization approaches. Across two independent experimental setups, we demonstrate stable trapping and control of linear chains of up to 33 40^{40}40Ca+^++ ions, including approximately equally spaced configurations. The measured secular frequencies in both traps agree with boundary-element simulations at the percent level, with residual deviations attributed to stray electric fields in the presence of anharmonic axial potentials, rather than fabrication imperfections. We measure axial micromotion field strengths on the order of 100 V/m along the trap axis, in approximate agreement with simulations. For radial mode frequencies near 2 MHz and an ion-electrode distance of 300 um, we measure heating rates of the order of 10 quanta/s in all but one motional mode, which is elevated by a technical noise source. The presented trap design is thus suitable for a wide range of quantum science applications and demonstrates the viability of SLE for the fabrication of finely segmented, monolithic, three-dimensional ion traps.
We describe the use of laser-enhanced etching of fused silica in order to build multilayer ion traps. This technique offers high precision of both machining and alignment of adjacent wafers. As examples of designs taking advantage of this possibility, we describe traps for realizing two key elements of scaling trapped ion systems. The first is a trap for a cavity-QED interface between single ions and photons, in which the fabrication allows shapes that provide good electrostatic shielding of the ion from charge buildup on the mirror surfaces. The second incorporates two X-junctions allowing two-dimensional shuttling of ions. Here, we are able to investigate designs which explore a trade-off between pseudopotential barriers and confinement at the junction center. In both cases, we illustrate the design constraints arising from the fabrication.
Large ion crystals in diverse geometries are a key resource for quantum simulation experiments. In this work, we introduce a macroscopic rf trap that supports a wide variety of one-dimensional ion configurations as well as lateral two-dimensional crystals with more than 100 ions. Our design is based on precision-machined fused silica wafers that are stacked to form the trap structure. Ten independently biased electrodes provide flexible control over the axial potential, enabling long one-dimensional crystals, isospaced ion strings, split-well chains, and two-dimensional arrays with tunable aspect ratios. We present the design and fabrication process for this trap and demonstrate the ability to tune the radial secular frequencies, detect and compensate micromotion, rotate the principal axes, and characterize trapped ion heating rates. All trap design and documentation files are freely available alongside this work, to facilitate adoption and further development within the ion trap community.
We describe the use of laser-enhanced etching of fused silica in order to build multilayer ion traps. This technique offers high precision of both machining and alignment of adjacent wafers. As examples of designs taking advantage of this possibility, we describe traps for realizing two key elements of scaling trapped ion systems. The first is a trap for a cavity-QED interface between single ions and photons, in which the fabrication allows shapes that provide good electrostatic shielding of the ion from charge buildup on the mirror surfaces. The second incorporates two X-junctions allowing two-dimensional shuttling of ions. Here, we are able to investigate designs which explore a trade-off between pseudopotential barriers and confinement at the junction center. In both cases, we illustrate the design constraints arising from the fabrication.
Abstract Scaling trapped-ion quantum computing will require robust trapping of at least hundreds of ions over long periods, while increasing the complexity and functionality of the trap itself. Symmetric three-dimensional (3D) structures enable high trap depth, but microfabrication techniques are generally better suited to planar structures that produce less ideal conditions for trapping. We present an ion trap fabricated on stacked eight-inch wafers in a large-scale micro-electro-mechanical system microfabrication process that provides reproducible traps at a large volume. Electrodes are patterned on the surfaces of two opposing wafers bonded to a spacer, forming a 3D structure with 2.5 μm standard deviation in alignment across the stack. We implement a design achieving a trap depth of 1 eV for a 40Ca+ ion held at 200 μm from either electrode plane. We characterize traps, achieving measurement agreement with simulations to within ±5% for mode frequencies spanning 0.6–3.8 MHz, and evaluate stray electric field across multiple trapping sites. We measure motional heating rates over an extensive range of trap frequencies, and temperatures, observing 40 phonons/s at 1 MHz and 185 K. This fabrication method provides a highly scalable approach for producing a new generation of 3D ion traps.