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中国科学通报：英文版

Character and fabrication of Al/Al2O3/Al tunnel junctions for qubit application

Shen Shen, Dandan, Zhu, Xu, Wel-wei, chang chang, Junjie, Ji, ZhengMing, Sun, Guo-zhu, Cao, Chunhai, Chen, Jian JIAN

Published Jan 1, 2012• 1 citation
OpenAlex

Abstract

超导的 Josephson 连接是为超导的量计算的关键设备。我们基于一个推迟的阴影面具用一个双角度蒸发方法制作了 Al/Al2O3/Al 隧道连接。Al2O3 连接障碍被在制造过程期间介绍纯氧进房间形成了。我们由在隧道障碍的形成期间改变氧压力或氧化时间控制批评当前的密度 J c 和连接调整了暴露条件特定的电阻 R c。在 Al/Al2O3/Al 隧道连接的漏的大小证明设备对 qubit 应用合适。

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超导的 Josephson 连接是为超导的量计算的关键设备。我们基于一个推迟的阴影面具用一个双角度蒸发方法制作了 Al/Al2O3/Al 隧道连接。Al2O3 连接障碍被在制造过程期间介绍纯氧进房间形成了。我们由在隧道障碍的形成期间改变氧压力或氧化时间控制批评当前的密度 J c 和连接调整了暴露条件特定的电阻 R c。在 Al/Al2O3/Al 隧道连接的漏的大小证明设备对 qubit 应用合适。
The superconductive Josephson junction is the key device for superconducting quantum computation. We have fabricated Al/Al2O3/Al tunnel junctions using a double angle evaporation method based on a suspended shadow mask. The Al2O3 junction barrier has been formed by introducing pure oxygen into the chamber during the fabrication process. We have adjusted exposure conditions by changing either the oxygen pressure or the oxidizing time during the formation of tunnel barriers to control the critical current density J c and the junction specific resistance R c . Measurements of the leakage in Al/Al2O3/Al tunnel junctions show that the devices are suitable for qubit applications.
The authors have developed two distinct processes for the fabrication of mesoscopic Josephson junction qubits that are compatible with conventional CMOS processing. These devices, based on superconducting Al/Al2O3/Al tunnel junctions, are fabricated by electron beam lithography using single-layer and multi-layer resists. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks. It is simpler and more accurate to implement, and avoids the significant areas of redundant metallisation that are an unavoidable by-product of the tri-layer shadow mask method.