Light source technology: Atom optics and atom lithography

Tôru Fujii, Naoki Fukutake, Hisao Osawa +1 more

At the end of last century, the name of “quantum lithography” has been emerged. This exciting approach was proposed for making a resolution two times higher than that of the conventional optics without changing a wavelength and a numerical aperture. For those who want optical lithography to last long, this has been thought to be a great technology. However, an applicability of the proposed method to the current exposure system i.e., reduced projection exposure system has not yet been examined clearly. We have investigated the proposed quantum lithography to apply into the current exposure system using reticle. For simplicity, coherent illumination i.e. sigma is zero condition is used for calculation. Our quantum lithography compatible to mask exposure system explains probability of one and two photon absorption on the image plane i.e. on wafer. We have shown that the half-wavelength quantum lithography using conventional mask exposure system is impossible because diffraction at the mask makes biphoton into two photon. We have found that there is still super-resolution quantum lithography using mask exposure, however, there is little possibility of quantum lithography practically today because biphoton light source is as dark as stars. To realize quantum lithography practically, further development of not only biphoton light source but also two-photon absorption resist is indispensable.

Viktor I Balykin

Ryszard S. Romaniuk, Jan Dorosz

A relatively new method of atomic DeBroglie wave transmission in a hollow single mode optical fiber is presented. A slightly blue-detuned, from the atomic resonance, optical evanescent wave in the ring core of the capillary optical fiber creates a potential barrier for co-propagating or counter-propagating DeBroglie wave. The applied optical wavelength, associated with the used atomic transitions, was in the range 1100-400nm. Excited, metastable atoms of chromium, rubidium, cesium, helium, alkalis, etc., were transmitted in the capillary optical fiber. Initially the transmission was multimode and then single mode, with increasing efficiency. There are considered initial application perspectives of this transmission technology of DeBroglie wave for building of coherent cold sources of atoms, atom interferometers, and devices of the inverse lithography, which may possibly compete with the short-wave photo-lithography. The paper is a tutorial and has a teaching and technology review character.

V. I. Balykin

R. Ohmukai, Masaharu Hyodo, Masayoshi Watanabe +1 more

S.J.H. Petra, K. A. H. van Leeuwen, L. Feenstra +2 more