The work aims to develop an atom lithography apparatus by exploiting cold atoms, differently from conventional implementations where thermal atomic sources are used. The cold atomic beam of the apparatus is produced continuously out of a pyramidal magnetooptical trap (MOT) for cesium atoms, a specific configuration of mirrors mounted as the inner part of a hollow pyramid, with a small apical aperture.

European Quantum Electronics Conference (EQEC)Jan 18, 20060 citations

Optical Review

Efficient generation of cold atoms towards a source for atom lithography

R. Ohmukai, Masaharu Hyodo, Masayoshi Watanabe, Hitoshi Gene Kondo

Published Jan 1, 2009• 1 citation

Publisher

DOI: 10.1007/s10043-009-0003-x

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Abstract We report the generation of multiple electron beams using a cold atom electron source (CAES) combined with a spatial light modulator (SLM). In the experiment, neutral

{ }^{87} \mathrm{Rb}

atoms are confined in a magneto-optical trap and cooled to approximately

700 \mu \mathrm{~K}

. By shaping the intensity profile of the excitation laser via the SLM, the spatial distribution of the excited atoms can be precisely controlled. The excited atoms are then ionized by a dye laser, and the ionized electrons are extracted and focused by an electric field to form multiple electron beams. As a demonstration, we generate regular arrays of

3 \times 3,4 \times 4,5 \times 5,6 \times 6

beams, each with a spot size of about

100 \mu \mathrm{~m}

and a normalized transverse emittance of

\sim 0.4 \times 10^{-9} \mathrm{~m} \cdot \mathrm{rad} \cdot \sqrt{\mathrm{eV}}

. This programmable electron beam technique holds potential for applications in electron-beam lithography and wafer inspection.