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Quantum Electronics and Laser Science Conference

Laser manipulation of an atomic Cr beam for controlled deposition studies

Jabez J. McClelland, Robert E Scholten, Robert Celotta

Published May 2, 1993• 0 citations
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Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of 52 Cr through an off-resonant laser standing wave with the wavelength of 425.55 nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3 nm with height of 1 nm.

Chinese Physics Letters•Oct 26, 2006•4 citations
A well collimated atomic beam plays an important role in laser focused Cr atom deposition. The simulations of one-dimensional (1D) transverse laser cooling of Cr atomic beam is performed with the Monte Carlo method. Taking into account the stochastic initial conditions of each atom, isotopes other than 52Cr, longitudinal velocity distribution and transverse divergence, the atomic beam cooled by laser is optimized and evaluated. The obtained results are consistent with experimental. In addition, with picking out the trajectories of isotopes other than 52Cr that are not cooled by the laser the center maximum value can be reduced by 9.3%, and the FWHM is increased by 11% of the transverse distribution.