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Science in China. Series G, Physics, mechanics & astronomy/Science in China. Series G, Physics, Mechanics & Astronomy

Influence of laser power on deposition of the chromium atomic beam in laser standing wave

Wentao Zhang, Baohua Zhu, Baowu Zhang, Tongbao Li

Published Jul 1, 2009• 0 citations
Publisher
DOI
10.1007/s11433-009-0161-7

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We developed a laser-beam-controlled atom-manipulation system to deposit nanometric structure of atoms on a substrate. Atom beam of chromium is thermally evaporated and collimated with Doppler cooling technique using frequency-tuned laser diode. The gradient force is exerted on atoms by a standing wave over the substrate, and atoms are trapped in a low potential region of the standing wave. Consequently, a series of lines are formed on the substrate with the same periodicity to the standing wave. We present the analysis of trajectories of atoms in the light force potential to find conditions of the laser power, the sign and the degree of the detuning of the laser frequency from the resonance frequency of the atom, to reduce the width of the structure.
Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.
The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum (FWHM) of the stripe is 2.75 nm and the contrast is 38.5: 1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8:1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3: 1 and 1.6: 1 when the divergence angles equal 0.5 and 1.0 mrad, respectively.