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International Conference on Solid State Devices and Materials (SSDM)

Fabrication of Superconducting NbN Gate MOSFET for Hybrid Circuit Applications

Nobuhiro Suzuki, Keiji Yamamoto, Satoshi Matsumoto, I. Kurosawa, Masahiro Aoyagi, S. Takada

Published Aug 24, 1994• 4 citations
Publisher
DOI
10.7567/ssdm.1994.a-4-4

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Submicron NbN/MgO/NbN Josephson tunnel junctions for Josephson integrated circuits were investigated. The junctions have been fabricated by the cross-line patterning (CLIP) method with an electron-beam (EB) direct-writing technique. The all-refractory fabrication process for logic circuits using the CLIP method is presented. This process is applied to the fabrication of a logic gate of 4JL containing 0.8- mu m-square junctions as an example of digital application. A logic gate has been fabricated by this process, and its characteristics are discussed.>

IEEE Transactions on Magnetics•Mar 1, 1989•9 citations
In this paper, the author describes studies on electronic devices and circuits utilizing both of superconductors and semniconductors. First, a design of an interface circuit composed of Josephson junctions and MOSFETs is described. The Josephson-MOS interface circuit will be used for realizing high-speed data communication between a Josephson digital circuit and a semiconductor one. Second, fabrication and characterization of MOSFETs with superconductive NbN gate electrodes are described. The use of superconductive gates makes it easy to hybridize MOSFETs with Josephson junctions. Finally, studies of Josephson-CMOS hybrid memory circuits are introduced.
The high kinetic inductance of niobium nitride (NbN) thin films can be used for an implementation of compact on-chip inductances in cryoelectronic circuits. Here, for the first time, we demonstrate the implementation of a hybrid superconducting technology that includes the fabrication of standard aluminum submicron Josephson junctions and the NbN atomic layer deposition process. As an example, we fabricated and characterized a single and array of Al Josephson junctions together with NbN interconnections. The main Al Josephson junction parameters as well as NbN superconducting properties are in a good agreement with the values obtained by our standard fabrication process. The combination of technological processes for the NbN layers with Al Josephson junction allows implementing a new generation of innovative superconducting devices for different applications.
Submicron NbN/MgO/NbN Josephson tunnel junctions for Josephson integrated circuits were investigated. The junctions have been fabricated by the cross-line patterning (CLIP) method with an electron-beam (EB) direct-writing technique. The all-refractory fabrication process for logic circuits using the CLIP method is presented. This process is applied to the fabrication of a logic gate of 4JL containing 0.8- mu m-square junctions as an example of digital application. A logic gate has been fabricated by this process, and its characteristics are discussed.>