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IEEE Transactions on Applied Superconductivity

Improved Characteristics of Intrinsically Shunted ${\rm Nb/Al}-{\rm AlO}_{x}-{\rm Nb}$ Josephson Junctions

V. Lacquaniti, Natascia De Leo, Matteo Fretto, A. Sosso, Domenico Andreone, Mikhail A. Belogolovskii

Published Nov 9, 2010• 2 citations
Publisher

Abstract

Josephson junctions with non-hysteretic current-voltage characteristics form the basis of most superconducting electronic circuits including RSFQ logic and programmable Josephson voltage standards. In contrast to conventional SIS devices, Nb/Al-AlOx-Nb (SNIS) junctions with an additional comparatively thick Al interlayer and a comparatively thin barrier AlOxare intrinsically shunted at T ≥ 4.2 K . In this contribution, we provide experimental and theoretical arguments proving that this finding is mainly explained by a broad distribution of highly-conductive barrier transparencies with a significant effect from nearly ballistic modes. An additional advantage of the proposed SNIS junctions is possibility to tune the critical voltage value by modifying Nb and/or Al film thicknesses. With observations of wide Shapiro steps up to 1.25 V at 6.3 K we show that this type of Josephson junctions can be successfully used at temperatures above 4.2 K. The presence of well-developed quantized voltage features even at 7.2 K means that Nb/Al-AlOx-Nb devices can successfully operate far above the liquid helium temperature and, in principle, are compatible with two-stage cryocoolers.

DOI
10.1109/tasc.2010.2080656

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Improved Characteristics of Intrinsically Shunted Nb/Al−AlOx−Nb{\rm Nb/Al}-{\rm AlO}_{x}-{\rm Nb}Nb/Al−AlOx​−Nb Josephson Junctions
Josephson junctions with non-hysteretic current-voltage characteristics form the basis of most superconducting electronic circuits including RSFQ logic and programmable Josephson voltage standards. In contrast to conventional SIS devices, Nb/Al-AlOx-Nb (SNIS) junctions with an additional comparatively thick Al interlayer and a comparatively thin barrier AlOxare intrinsically shunted at T ≥ 4.2 K . In this contribution, we provide experimental and theoretical arguments proving that this finding is mainly explained by a broad distribution of highly-conductive barrier transparencies with a significant effect from nearly ballistic modes. An additional advantage of the proposed SNIS junctions is possibility to tune the critical voltage value by modifying Nb and/or Al film thicknesses. With observations of wide Shapiro steps up to 1.25 V at 6.3 K we show that this type of Josephson junctions can be successfully used at temperatures above 4.2 K. The presence of well-developed quantized voltage features even at 7.2 K means that Nb/Al-AlOx-Nb devices can successfully operate far above the liquid helium temperature and, in principle, are compatible with two-stage cryocoolers.
Motivated by a search for a suitable technology to fabricate Josephson junctions with a tunable damping regime, we performed a systematic study of the temperature effect on the critical current in Nb/Al-AlO x -Nb heterostructures with a nanometer-thick Al interlayer. For Al layer thicknesses ranging from 40 to 110 nm, we have observed a transition from hysteretic (below 4.2 K) to non-hysteretic (above 4.2 K) current-voltage curves. Measured supercurrent-vs-temperature characteristics which significantly differ from those of traditional SIS and SNS devices are interpreted in terms of the superconducting proximity effect between Al and Nb films. Thermal stability and good reproducibility of our junctions are demonstrated.
An interesting feature of Superconductor Normal metal Superconductor - Josephson junctions for digital applications is due to their non-hysteretic current-voltage characteristics in a broad temperature range below Tc. This allows to design Single-Flux-Quantum (SFQ) cells without the need of external shunts. Two advantages can be drawn from this property: first the SFQ cells can be more compact which leads to a more integrated solution towards nano-devices and more complex circuits; second the absence of electrical parasitic elements associated with the wiring of resistors external to the Josephson junctions increases the performance of SFQ circuits, in particular regarding the ultimate speed of operation. For this purpose Superconductor Normal metal Insulator-Superconductor Nb/Al-AlOx/Nb Josephson junctions have been recently developed at INRiM with aluminum layer thicknesses between 30 and 100 nm. They exhibit non-hysteretic current-voltage characteristics with RnIc values higher than 0.5 mV in a broad temperature range and optimal Stewart McCumber parameters at 4.2 K for RSFQ applications. The main features of obtained SNIS junctions regarding digital applications are presented.
Niobium-based junctions are still the best candidates for many small-scale applications of superconductivity and in particular, for the design and the fabrication of programmable voltage standards and D/A converters of fundamental accuracy. Non-hysteretic junctions with a large current density JC, and a reasonable characteristic voltage Vc are required, while, in order to make these circuits available to a wider market, operation at temperatures above 4.2 K would be important. In this work we report our results achieved on Nb/Al-AlOX/Nb junctions whose properties are studied in order to optimize the aforementioned features. Their behavior is analyzed showing how the overdamped characteristic is obtained with a less critical structure compared to other type of junctions. Moreover, using the scattering matrix approach, we have calculated a deviation of superconducting current-phase relation in such a SNIS Josephson junction from sinusoidal one and its effect on the current amplitudes of Shapiro steps as function of temperature. Measurement of the step dependence on temperature are also reported, where we considered the possibility of using bothn= 1 andn= 2 RF step above 4.2 K, for a possible reduction of the number of junctions in array circuits.
Nb/Al-AlOx/Nb Josephson junctions of few micrometers size, derived by the basic hysteretic SIS process, have shown stable overdamped current voltage, I-V, characteristic with Ic of 1–10 mA and Vc of 100–600 μV at 4.2 K. The moderate dependence on temperature of these parameters has allowed to use them at temperatures above 4.2 K, near the Nb transition temperature, measuring quantized voltage steps several hundreds μA wide on single and 10 junctions arrays at T ≫ 8 K. This paves the way to their use in cryocooler setup of reduced cost and power consumption for a future generation of programmable and AC voltage standard.
Optimization of the performance of Nb-based overdamped Josephson junctions for applications to superconducting electronics is a major issue today. The use of cryocoolers, thus avoiding liquid helium refrigeration, with junctions working at temperatures higher than 4.2 K, could greatly increase the use of these devices in applications such as fundamental metrology and measurement sensors. The question we address here is how to maximize the characteristic voltage and minimize the temperature influence on the current-voltage curves of overdamped junctions enabling their use at T > 4.2K. To optimize the properties of a single Josephson heterostructure, we propose a type of overdamped junction that consists of a relatively thin insulating layer and a thick (tens of nm) normal-metal film between two superconducting electrodes. Measurements of the dependence of the critical current and characteristic voltage as function of temperature for dierent electrodes configurations show how it is possible to improve the design of these junctions.
To increase the integration scale of superconductor electronics, we are developing a new node, titled SFQ7ee, of the fabrication process at MIT Lincoln Laboratory. In comparison to the existing SFQ5ee node, we increased the number of fully planarized superconducting layers to ten and utilized NbN and NbN/Nb kinetic inductors to increase the possible inductor number density above a hundred million inductors per cm2. Increasing the Josephson junction number density to the same level requires implementing self-shunted high-JcJosephson junctions. We investigated the properties of Nb/NbNx/Nb trilayer junctions as a potential replacement of high-JcNb/Al-AlOx/Nb junctions, where NbNxis a disordered, overstoichiometric, nonsuperconducting nitride deposited by reactive sputtering. Dependences of theIcRnproduct and Josephson critical current density, Jc on the NbNx barrier thickness and temperature were studied in the thickness range from 5 nm to 20 nm. The fabricated junctions can be well described by the microscopic theory of SNS junctions, assuming no suppression of the energy gap in Nb electrodes near the NbNxinterfaces and a Cooper pair decay length in the NbNx barrier, ξnTcof about 2.3 nm. Current-voltage characteristics of the junctions are well described by the resistively and capacitively shunted junction (RCSJ) model without excess current. In the studied rangeJc2, the Nb/NbNx/Nb junctions have lower values of the specific resistanceRnA, lower IcRn products, and a stronger dependence of theIcRnon temperature than the self-shunted or critically damped externally shunted Nb/Al-AlOx/Nb junctions with the same critical current density; A is the junction area,Icthe junction critical current, and Rnthe effective shunting resistance.