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Chinese Physics Letters

Analysis of Nanometer Structure for Chromium Atoms in Gauss Standing Laser Wave

Wentao Zhang, Baohua Zhu, Xianming Xiong

Published Dec 1, 2010• 2 citations
Publisher

Abstract

The equation of motion of two-level chromium atoms in Gauss standing laser wave is discussed and the distribution of chromium atoms is given under different transverse velocity conditions. The results show that the focusing position of atoms will be affected by the transverse velocity of atoms. Based on the four-order Runge-Kutta method, the locus of chromium atoms in Gauss standing laser wave is simulated. The three-dimensional characteristics of nanometer structures are stimulated under perfect and emanative conditions.

DOI
10.1088/0256-307x/27/12/123202

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The equation of motion of two-level chromium atoms in Gauss standing laser wave is discussed and the distribution of chromium atoms is given under different transverse velocity conditions. The results show that the focusing position of atoms will be affected by the transverse velocity of atoms. Based on the four-order Runge-Kutta method, the locus of chromium atoms in Gauss standing laser wave is simulated. The three-dimensional characteristics of nanometer structures are stimulated under perfect and emanative conditions.
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The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum (FWHM) of the stripe is 2.75 nm and the contrast is 38.5: 1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8:1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3: 1 and 1.6: 1 when the divergence angles equal 0.5 and 1.0 mrad, respectively.
Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.
We study the propagation of an atomic beam flow in an optical potential generated by a two-dimensional (2D) standing wave produced by two interfering laser beams with a frequency that is close to the resonant frequency of the propagated atoms. We extended the equations of motion of an atom in a light field to three-dimensional (3D) coordinate system and calculated the 3D trajectories of chromium atoms that are thermally evaporated and deflected by the gradient force of the standing wave laser field. The polarization and polarity of detuning of the frequency of the interfering beams are varied to study the formation of chromium atoms on a substrate. Our results show that a combination of parallel polarization and positive detuning forms a 2D grid structure. The rest of the combination of polarization and polarity of detuning yields a 2D array of point structures. An optimum size of the point structure with a diameter of approximately 50 nm can be formed with an orthogonal polarization and positive detuning of the laser frequency.
The ability to fabricate nanometer-sized structures that are stable in air has the potential to contribute significantly to the advancement of new nanotechnologies and our understanding of nanoscale systems. Laser light can be used to control the motion of atoms on a nanoscopic scale. Chromium atoms were focused by a standing-wave laser field as they deposited onto a silicon substrate. The resulting nanostructure consisted of a series of narrow lines covering 0.4 millimeter by 1 millimeter. Atomic force microscopy measurements showed a line width of 65 +/- 6 nanometers, a spacing of 212.78 nanometers, and a height of 34 +/-+ 10 nanometers. The observed line widths and shapes are compared with the predictions of a semiclassical atom optical model.