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Optics Express

Generation of super-resolution atomic state density distribution based on temporallycascaded multiple light exposures

Hee Su Park, Sun Kyung Lee, Jae Yong Lee

Published Dec 18, 2008• 11 citations
Publisher

Abstract

We propose a novel approach to optical generation of superresolution atomic state density distribution based on interaction between Lambda- type atoms and temporally-cascaded driving fields. The scheme effectively inscribes multiplication of optical intensity profiles on atomic state density distribution, which can produce arbitrary patterns beyond the diffraction limit. The degree of resolution enhancement can be increased, not depending on the intrinsic nonlinearity of the photographic medium or the number of simultaneously interacting fields unlike the previous schemes. Procedures for drawing arbitrary two-dimensional patterns and effects of atomic state decoherence are described.

DOI
10.1364/oe.16.021982

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We propose a novel approach to optical generation of superresolution atomic state density distribution based on interaction between Lambda- type atoms and temporally-cascaded driving fields. The scheme effectively inscribes multiplication of optical intensity profiles on atomic state density distribution, which can produce arbitrary patterns beyond the diffraction limit. The degree of resolution enhancement can be increased, not depending on the intrinsic nonlinearity of the photographic medium or the number of simultaneously interacting fields unlike the previous schemes. Procedures for drawing arbitrary two-dimensional patterns and effects of atomic state decoherence are described.
We propose a super-resolution quantum lithography scheme based on coherent population trapping in lambda-type atoms coupled to temporally-cascaded standing-wave driving fields. By realizing effective multiplication of optical intensity profiles on an atomic state density distribution, the scheme enables an arbitrarily high degree of resolution enhancement without modifying the atomic level structure of the photographic medium or the light source configuration. It is also shown that the visibility of the super-resolution patterns is preserved under a significant atomic state decoherence rate.
A novel approach for the generation of subwavelength structures in interferometric optical lithography is described. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. Since this process only comprises resonant atom-field interactions, a multiphoton absorption medium is not required. The contrast of the induced pattern does only depend on the ratios of the applied field strengths such that our method in principle works at very low laser intensities.
Atomic Physics Quantum gas microscopes provide information about the occupancy of individual optical lattice sites. However, the resolution is limited by the wavelength of the imaging light. Two related superresolution schemes now enable researchers to glean even finer details of the atomic density distribution. McDonald et al. and Subhankar et al. studied one-dimensional arrays of ultracold atoms. A well-chosen perturbation provided a narrow window onto a specific position; when information from different positions was pieced together, the researchers were able to reconstruct the atomic density with a resolution of a fraction of the optical wavelength. The schemes were effective in capturing atomic dynamics and are expected to be applicable to a wide range of atomic and molecular species. Phys. Rev. X 9 , 021001, 021002 (2019).
We study the possibility of creating spatial patterns having subwavelength size by using the so-called dark states formed by the interaction between atoms and optical fields. These optical fields have a specified spatial distribution. Our experiments in Rb vapor display spatial patterns that are smaller than the length determined by the diffraction limit of the optical system used in the experiment. This approach may have applications to interference lithography and might be used in coherent Raman spectroscopy to create patterns with subwavelength spatial resolution.
Abstract We theoretically propose a scheme that utilizes the excited state of a Λ-type three-level atom system for atom lithography. A standing-wave coupling field and a probe field provide localized probability distribution of the excited atoms. Unlike the previous studies in atom localization, we focus on splitting the single-peak structure localized on the node of the standing-wave field to a double-peak structure. The shift distance of double-peak related to the parameters of external laser fields is investigated. The period of lithography pattern could reach λ/4, while the resolution of lithography is promising to be smaller than 0.02λ by adjusting system parameters. This scheme can be extended to form a two-dimensional pattern for lithography.
Far-field optical microscopy beyond the Abbe diffraction limit, making use of nonlinear excitation (e.g. STED), or temporal fluctuations in fluorescence (PALM, STORM, SOFI) is already a reality. In contrast, overcoming the diffraction limit using non-classical properties of light is very difficult to achieve due to the fragility of quantum states of light. Here, we experimentally demonstrate superresolution microscopy based on quantum properties of light naturally emitted by fluorophores used as markers in fluorescence microscopy. Our approach is based on photon antibunching, the tendency of fluorophores to emit photons one by one rather than in bursts. Although a distinctively quantum phenomenon, antibunching is readily observed in most common fluorophores even at room temperature. This nonclassical resource can be utilized directly to enhance the imaging resolution, since the non-classical far-field intensity correlations induced by antibunching carry high spatial frequency information on the spatial distribution of emitters. Detecting photon statistics simultaneously in the entire field of view, we were able to detect non-classical correlations of the second and third order, and reconstructed images with resolution significantly beyond the diffraction limit. Alternatively, we demonstrate the utilization of antibunching for augmenting the capabilities of localization-based superresolution imaging in the presence of multiple emitters, using a novel detector comprised of an array of single photon detectors connected to a densely packed fiber bundle. These features allow us to enhance the spatial and temporal resolution with which multiple emitters can be imaged compared with other techniques that rely on CCD cameras.