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arXiv:0803.2557 · Physical Review A

Optical imaging beyond the diffraction limit via dark states

Hebin Li, Vladimir A. Sautenkov, Michael M. Kash, Alexei V. Sokolov, George R. Welch, Yuri V. Rostovtsev, Muhammad Suhail Zubairy, Marlan O. Scully

Published Jul 1, 2008• 82 citations
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Abstract

We study the possibility of creating spatial patterns having subwavelength size by using the so-called dark states formed by the interaction between atoms and optical fields. These optical fields have a specified spatial distribution. Our experiments in Rb vapor display spatial patterns that are smaller than the length determined by the diffraction limit of the optical system used in the experiment. This approach may have applications to interference lithography and might be used in coherent Raman spectroscopy to create patterns with subwavelength spatial resolution.

DOI
10.1103/physreva.78.013803

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We study the possibility of creating spatial patterns having subwavelength size by using the so-called dark states formed by the interaction between atoms and optical fields. These optical fields have a specified spatial distribution. Our experiments in Rb vapor display spatial patterns that are smaller than the length determined by the diffraction limit of the optical system used in the experiment. This approach may have applications to interference lithography and might be used in coherent Raman spectroscopy to create patterns with subwavelength spatial resolution.
We theoretically study possibilities of creating spatial patterns having subwavelength length by using so-called dark states. These dark states are formed via interaction with bichromatic optical fields. Performing experiments in Rb vapor, we experimentally demonstrated spatial patterns that are smaller than the length determined by the diffraction limit of optical system used in the experiment. This approach has applications to interference lithography and can be used in coherent Raman spectroscopy to reach subwavelength spatial resolution.
The resolutions of the optical lithography is limited by the well-known Rayleigh limit. Although the atom lithography can generate features smaller than this limit, the spacing of the pattern is still limited by the optical wavelength. Here, we proposed two atom lithography methods, both of which used the coherent Rabi oscillation to break the diffraction limit. One is in the microwave regime where the Rydberg atom is used and micrometer resolution can be achieved. The other is in the optical regime where sub-10 nanometer resolution is possible.
A novel approach for the generation of subwavelength structures in interferometric optical lithography is described. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. Since this process only comprises resonant atom-field interactions, a multiphoton absorption medium is not required. The contrast of the induced pattern does only depend on the ratios of the applied field strengths such that our method in principle works at very low laser intensities.
The resolution of traditional optical microscope and optical lithography is limited by about half wavelength of the light source, which is well known as the diffraction limit or Abbe limit. The resolution limit is due to the missing of high spatial frequency components in the far-field. One way to achieve high resolution is to move the detector into the near-field region where the evanescent wave can be collected. However, these methods are surface-bound and usually very slow which have limited applications. It has long been an interesting and important question about how to overcome the diffraction limit in the far-field.\n\nFor optical lithography, a number of methods have been proposed to overcome the diffraction limit such as multi-photon scanning, quantum entanglement, quantum inspired process (e.g., dopperlon), and quantum dark state. However, these methods either require multi-photon absorber, quantum entanglement, or multi-energy levels, which restrict them from extending to higher resolution in practice. In this thesis, we showed that sub-diffraction-limited resolution can be generated by the coherent Rabi gradient. This method does not require multi-photon absorber or quantum entanglement but just quantum coherence of the medium. Extension from lower resolution to higher resolution is very straightforward where we just need to increase the pulse intensity or pulse duration. We also proposed two atom lithography experiments based on the Rabi gradient. The first one uses Rubidium Rydberg atom and microwave where we showed that sub-micrometer line spacing is possible. The second one uses Chromium atom and optical field where we showed that sub-10nm line spacing is possible while the wavelength of the light is about 400nm.\n\nFor optical imaging, a number of methods have also been proposed to achieve super-resolution such as multi-photon microscope, stimulated-emission-depletion, structured illumination microscopy, centroid-based techniques and metamaterial-based lens. Here, we will show a new method to achieve resolution beyond the diffraction limit which we called it resonance fluorescence microscopy. Resonance fluorescence has been proposed to localize a single atom with resolution beyond the diffraction limit. The separation between two atoms can also be extracted from the resonance\nfluorescence spectrum. To develop it as microscopy, we need to evaluate the resonance fluorescence spectrum of multiple-atom system. We analytically solved the general feature of the spectrum when the Rabi frequency is much larger than the dipole-dipole interaction and showed how to extract the spatial information of the atoms with resolution far beyond the diffraction limit. This method is entirely based on far-field techniques and it does not require point-by-point scanning.
We propose a method for creating far-field optical barrier potentials for ultracold atoms with widths that are narrower than the diffraction limit and can approach tens of nanometers. The reduced widths stem from the nonlinear atomic response to control fields that create spatially varying dark resonances. The subwavelength barrier is the result of the geometric scalar potential experienced by an atom prepared in such a spatially varying dark state. The performance of this technique, as well as its applications to the study of many-body physics and to the implementation of quantum-information protocols with ultracold atoms, are discussed, with a focus on the implementation of tunnel junctions.