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Physica Scripta

Tunable atom lithography scheme with high resolution in atomic system

Mingdong Liu, Hai-Hua Wang, Lei Wang, Jingming Fan, Jia Liu, Yiming Zhang, Yiming Xu, Aijun Li

Published Aug 23, 2023• 2 citations
Publisher

Abstract

Abstract We theoretically propose a scheme that utilizes the excited state of a Λ-type three-level atom system for atom lithography. A standing-wave coupling field and a probe field provide localized probability distribution of the excited atoms. Unlike the previous studies in atom localization, we focus on splitting the single-peak structure localized on the node of the standing-wave field to a double-peak structure. The shift distance of double-peak related to the parameters of external laser fields is investigated. The period of lithography pattern could reach λ/4, while the resolution of lithography is promising to be smaller than 0.02λ by adjusting system parameters. This scheme can be extended to form a two-dimensional pattern for lithography.

DOI
10.1088/1402-4896/acf34e

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Abstract We theoretically propose a scheme that utilizes the excited state of a Λ-type three-level atom system for atom lithography. A standing-wave coupling field and a probe field provide localized probability distribution of the excited atoms. Unlike the previous studies in atom localization, we focus on splitting the single-peak structure localized on the node of the standing-wave field to a double-peak structure. The shift distance of double-peak related to the parameters of external laser fields is investigated. The period of lithography pattern could reach λ/4, while the resolution of lithography is promising to be smaller than 0.02λ by adjusting system parameters. This scheme can be extended to form a two-dimensional pattern for lithography.
Abstract Herein, we propose a scheme for the realization of two-dimensional atomic localization in a λ -type three-level atomic medium such that the atom interacts with the two orthogonal standing-wave fields and a probe field. Because of the spatially dependent atom-field interaction, the information about the position of the atom can be obtained by monitoring the probe transmission spectra of the weak probe field for the first time. A single and double sharp localized peaks are observed in the one-wavelength domain. We have theoretically archived high-resolution and high-precision atomic localization within a region smaller than λ /25 × λ /25. The results may have potential applications in the field of nano-lithography and advance laser cooling technology.
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Localization of the three-level Λ-type atomic system interacting with two orthogonal standing-wave fields is proposed. Two equal and tunable peaks in the 2D plane are obtained by the detunings corresponding to the two orthogonal standing-wave fields when the decreasing intensities of spontaneously generated coherence (SGC) arise in the three-level Λ-type atomic system, while one circular ring with shrinking radii in the 2D plane is obtained by the adjusted phases and wave vectors of the standing-wave fields when the increasing intensities of SGC occur in the three-level Λ-type atomic system. 2D atom localization with the single ring with shrinking radii realized by the multiple parametric manipulations demonstrated the flexibility for our scheme.
Abstract A scheme for three-dimensional (3D) atom localization with high-precision and high-resolution is proposed and its control is studied in a four-level atomic system driven by an additional microwave field. Because of the spatial dependent interaction between atoms and standing wave fields, the atoms can be localized in a domain with widths as small as 0.014 λ by appropriately adjusting the system parameters. The probe absorption spectrum of the atomic system gives the position information of the atoms and different evolution patterns of the localization structures in this study. The population distribution and its 3D localization structures can be easily adjusted by parameters of the microwave field, which can achieve a 100% probability of observing the atom in a specific space and the accuracy with the value of 0.014 λ . Compared with 1D or 2D localizations, 3D localization can further improve the precision of position measurement and develop its spatial resolution, which may produce a wider variety of practical applications with high precision requirement.
By using three mutually perpendicular standing-wave fields, we propose a scheme for three-dimensional (3D) subwavelength atom localization in a five-level M-type atomic system. Based on the electromagnetically induced transparency, position probability distribution of the atom in 3D space could be determined via measuring the probe absorption which is proportional to the filter function. It is shown that patterns of 3D atom localization depends sensitively on the coupling schemes of the standing-wave fields. When the standing-wave fields couple three different transitions, the same atom localization patterns are formed in the eight subspaces of the 3D space. While all the standing-wave fields are applied on one transition, we can realize different atom localization patterns in the eight subspaces. From the view of the xy plane, various symmetric or asymmetric atom localization patterns could be formed at different z positions by adjusting the parameters of the laser fields.