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The Journal of Atomic and Molecular Sciences

Dependence of Four-Wave Mixing Line-Shape on Micrometric Atomic Vapor Thickness

Li Li, Yi-Xin Lu, Yuanyuan Li

Published Jan 1, 2010• 0 citations
Publisher

Abstract

We theoretically examine thickness and wavelength dependence line-shape of four-wave-mixing (FWM) spectroscopy in micrometric thin atomic vapors whose thickness $L$ is assumed to be 10,30,50,80 and 100 $\mu$m respectively. It is found that a narrow centre (Dicke-narrowing) persists for all cases, while wings are broadened as the thickness of the vapor increases or the pump wavelength decreases comparing to the probe wavelength. This type of spectrum is due to the modified velocity distribution and polarization interference from different ensemble of atoms in a confined situation.

DOI
10.4208/jams.060310.072010a

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We theoretically investigate dressed-four-wave mixing (dressed-FWM) spectroscopy of rubidium atoms in a micrometric thin vapour. It is found that Dike-narrowing type Autler–Townes (AT) spectroscopy with high resolution can be achieved in a reverse Y-type four-level atomic system due to the phase-conjugated configuration of laser beams and the transient effects of atom–wall collision in the thin vapour. We also show that controllable suppression and enhancement of the dressed-FWM signal due to the evolution of atomic coherence can be obtained by selecting different coupling field intensities at the proper detuning of the probe and the coupling fields. This control of FWM processes can be interpreted by dressed state analysis and probably used in the design of optical switch and the enhancement of FWM processes for frequency conversion.