Superconducting digital circuits based on Josephson junctions with amorphous niobium-silicon (a-NbSi) barriers have been designed, fabricated, and tested. Single-flux-quantum (SFQ) shift registers operated with ±30% bias margins, confirming junction reproducibility and uniformity. Static digital dividers operated up to 165 GHz for a single value of bias current, which was only marginally slower than circuits fabricated with externally shunted AlOx-barrier junctions having a comparable critical current density of 4.5 kA/cm2. In comparison, self-shunted a-NbSi junctions enabled a doubling in circuit density. This and their relatively thick 10 nm barriers could increase the yield of complex SFQ circuits.
Superconducting digital circuits based on Josephson junctions with amorphous niobium-silicon (a-NbSi) barriers have been designed, fabricated, and tested. Single-flux-quantum (SFQ) shift registers operated with ±30% bias margins, confirming junction reproducibility and uniformity. Static digital dividers operated up to 165 GHz for a single value of bias current, which was only marginally slower than circuits fabricated with externally shunted AlOx-barrier junctions having a comparable critical current density of 4.5 kA/cm2. In comparison, self-shunted a-NbSi junctions enabled a doubling in circuit density. This and their relatively thick 10 nm barriers could increase the yield of complex SFQ circuits.
Abstract We report on the electrical properties of NbN/TaN/NbN Josephson junctions grown on thermally oxidized silicon substrates, along with the design and fabrication of superconducting single-flux-quantum (SFQ) circuits based on these NbN superconductor/normal metal/superconductor (SNS) junctions. The critical current density ( J c ) of the junctions was found to be relatively sensitive to the barrier thickness, decreasing from 108.0 ± 8.1 kA cm −2 for a 15 nm barrier to 12.8 ± 1.9 kA cm −2 for a 30 nm barrier. For a J c of approximately 24.5 ± 2.1 kA cm −2 and a barrier thickness of 25 nm, the NbN SNS junctions are self-shunted and exhibit nonhysteretic current–voltage ( I – V ) characteristics. Especially for junctions with diameter ( φ ) ranging from 0.8 to 1.6 μ m, their critical current ( I c ) falls within the range of 110–450 μ A, making them suitable for SFQ circuits. By considering the impact of excess current and incorporating it as an additional term in the conventional resistively and capacitively shunted junction model, the I – V curves of NbN SNS junctions can be precisely described, successfully minimizing the deviation between simulations and test results. The DC-SFQ and SFQ-DC interface circuits can both operate normally, and the bias margins of cell circuits such as Josephson transmission line, confluence buffer, D flip-flop, and splitter are greater than 40%. Compared to Nb superconductor/insulator/superconductor junctions, their self-shunting characteristics and relatively thick 25 nm barriers can also enhance the integration of circuits and increase the yield to complex circuits.
We investigated high-current-density Josephson junctions with NbxSi1-xbarriers in single-flux-quantum (SFQ) digital circuits to evaluate their performance at clock frequencies of hundreds of gigahertz. We fabricated static divider SFQ circuits with a-NbxSi1-xand a-Si barriers for Jcranging from 3.5 to 85 kA/cm2. For junctions in the lower Jcrange (3.5-17 kA/cm2), we used optical lithography, and for the 85-kA/cm2junctions, we used electron-beam lithography. We measured SFQ circuits with a maximum operating speed of 300 GHz by use of intrinsically shunted junctions having submicrometer dimensions and an 85-kA/cm2critical current density. These results demonstrate that silicide-barrier junctions have the potential to achieve high-speed SFQ circuits and high-density circuits because the junctions are small and do not require external shunt resistors.
Planarized Process for Single-Flux-Quantum Circuits With Self-Shunted Nb/NbxSi1−x/Nb Josephson Junctions
We describe our process for fabricating single-flux-quantum circuits for applications in communications metrology, advanced computing, and quantum information. The process flow includes four superconducting metal layers, one junction layer, one palladium-gold bias resistor layer, and a contact pad layer. Planarization using chemical-mechanical polishing is performed on the two lower insulating layers. This process is based on Josephson junctions with niobium superconducting electrodes and self-shunted, amorphous niobium-doped silicon barriers on the insulating side near the metal-insulator transition. The barrier material is deposited by cosputtering silicon and niobium, with the junction properties controlled by the relative sputtering powers and the duration of the barrier deposition step. The profiles of the deposition rates across 3-in (76.2 mm) wafers give a corresponding radial profile of the critical current density Jcthat increases by ~46% from the center to the edge of the wafer. To characterize our process, we have measured and show data for niobium metal quality and its magnetic penetration depth, as well as for wire and via inductances, and for via critical currents. The uniformity of the junction critical current Icacross a wafer was measured on test chips with 2.7-μm-diameter junctions. Within a 5 mm × 5 mm area, the standard deviation of Icwas ~2% for chips near the center of the wafer and up to ~7% for chips near the edge. We also describe process improvements and innovations under development aimed at increasing circuit density and high-speed performance.
To increase the integration scale of superconductor electronics, we are developing a new node, titled SFQ7ee, of the fabrication process at MIT Lincoln Laboratory. In comparison to the existing SFQ5ee node, we increased the number of fully planarized superconducting layers to ten and utilized NbN and NbN/Nb kinetic inductors to increase the possible inductor number density above a hundred million inductors per cm2. Increasing the Josephson junction number density to the same level requires implementing self-shunted high-JcJosephson junctions. We investigated the properties of Nb/NbNx/Nb trilayer junctions as a potential replacement of high-JcNb/Al-AlOx/Nb junctions, where NbNxis a disordered, overstoichiometric, nonsuperconducting nitride deposited by reactive sputtering. Dependences of theIcRnproduct and Josephson critical current density, Jc on the NbNx barrier thickness and temperature were studied in the thickness range from 5 nm to 20 nm. The fabricated junctions can be well described by the microscopic theory of SNS junctions, assuming no suppression of the energy gap in Nb electrodes near the NbNxinterfaces and a Cooper pair decay length in the NbNx barrier, ξnTcof about 2.3 nm. Current-voltage characteristics of the junctions are well described by the resistively and capacitively shunted junction (RCSJ) model without excess current. In the studied rangeJc2, the Nb/NbNx/Nb junctions have lower values of the specific resistanceRnA, lower IcRn products, and a stronger dependence of theIcRnon temperature than the self-shunted or critically damped externally shunted Nb/Al-AlOx/Nb junctions with the same critical current density; A is the junction area,Icthe junction critical current, and Rnthe effective shunting resistance.
Abstract We review the existing fabrication processes for superconductor digital electronics and describe approaches to increasing the scale of integration of superconducting digital circuits from the current level of about one million Josephson junctions (JJs) on a 1-cm 2 chip toward ten million JJs per chip. We present designs of ac-clocked Single Flux Quantum (SFQ) shift registers, convenient benchmarking circuits, in a 250-nm-linewidth superconductor electronics fabrication process developed recently at MIT Lincoln Laboratory (MIT LL). For shift registers using resistively shunted JJs with Josephson critical current density, J c of 100 μA/μm 2 , we achieved a record-high circuit density of 4.2·10 6 JJs per cm 2 , a factor of three higher than the previous record obtained in the MIT LL 350-nm-linewidth SFQ5ee process. Using self-shunted JJs with J c of 600 μA/μm 2 , we increased this record circuit density to 7.4·10 6 JJs per cm 2 .
Superconductor electronics fabrication technology developed at MIT Lincoln Laboratory enables the development of VLSI digital circuits with millions of Josephson junctions per square centimeter. However, conventional DC and multi-phase AC biasing techniques already encounter serious challenges for scaling circuits above several hundred thousand junctions. In this work, we propose a novel AC-based biasing scheme for RSFQ-type logic families requiring DC bias. The major step toward this scheme is a superconducting AC/DC rectifier which we introduced at ASC 2014. We proposed to connect the rectifiers to “payload cells” via superconducting inductors with large inductance in order to reduce parasitic effects of flux quantization. Recently, we discovered that this powering scheme works even better at a much lower value of the inductance, when it is just sufficient to hold only one or two flux quanta in the inductive loop between the converter and the payload. In this case, flux quantization in the loop becomes beneficial because the value of current fed into the payload is defined by the value of the coupling inductance. Therefore, our AC/SFQ converter powers the payload cell by single flux quanta rather than by DC current. Such mode of operation is extremely energy efficient because energy is used only to recover the flux quantum consumed by the cell during the logic operation. We present designs of AC/SFQ converters comprising an AC/DC rectifier and a current conditioning circuit which we termed an SFQ filter. We also present test results and demonstrate AC/SFQ powering a payload circuit using circuits fabricated in a new, 150-nm node of Lincoln Laboratory fabrication technology using self-shunted Nb/AlOx-Al/Nb Josephson junctions with 600 μA/μm2critical current density and 200 nm minimum linewidth of inductors.