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Stark level one-phonon dephasing process of Nd/sup 3+/ silicate glass fiber

Ryuzi Yano, N. Uesugi

Published Aug 24, 2005• 0 citations
Publisher
DOI
10.1109/cleopr.1995.527106

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Measurements of the homogeneous width of the 4^{4}4 G5/2{\mathrm{G}}_{5\mathrm{/}2}G5/2​ , 2^{2}2 G7/2{\mathrm{G}}_{7\mathrm{/}2}G7/2​ ${\mathrm{\ensuremath{-}}}^{4}$ I9/2{\mathrm{I}}_{9\mathrm{/}2}I9/2​ transition of Nd3+{\mathrm{Nd}}^{3+}Nd3+ in a silicate glass fiber at low temperatures by the technique of accumulated photon echoes show that the dephasing processes are one-phonon processes between the Stark levels of Nd3+{\mathrm{Nd}}^{3+}Nd3+ . These dephasing processes differ from the commonly observed processes of rare-earth ion-doped glasses: the local-configurational-change-induced dephasing process and the Raman process with low-frequency modes. The densely distributed Stark levels of the 4^{4}4 G5/2{\mathrm{G}}_{5\mathrm{/}2}G5/2​ and 2^{2}2 G7/2{\mathrm{G}}_{7\mathrm{/}2}G7/2​ states are responsible for one-phonon processes. The transition-wavelength dependences of the homogeneous widths ${\mathrm{\ensuremath{\Gamma}}}_{\mathrm{h}}$ (4.2 K) and ${\mathrm{\ensuremath{\Gamma}}}_{\mathrm{h}}$ (T\ensuremath{\rightarrow}0) are explained by using the one-phonon process model.