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arXiv:2605.24199

Wideband Balanced Photodetectors for Classical and Quantum Light Detection from Optical, EUV, to X-rays

Ivan Ryger, Terry Brown, Dina S. Eissa, Chen-Ting Liao

physics.ins-detastro-ph.IMphysics.app-phphysics.opticsquant-phSubmitted May 22, 2026• Announced May 26, 2026
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Abstract

The rapid development of coherent short-wavelength light sources in the extreme ultraviolet (EUV) and soft X-ray (SXR) regimes has created a growing need for advanced optoelectronic detection capabilities, particularly for quantum-noise-limited measurements, microelectronics and semiconductor metrology, and emerging quantum information applications. However, extending balanced photodetection to these wavelength regimes is severely hindered by a fundamental bandwidth-noise trade-off imposed by the exceptionally large junction capacitance of EUV-SXR silicon photodiodes. Here, we report a novel wideband photoreceiver architecture that overcomes this bottleneck via a bootstrapped transimpedance amplifier design. By leveraging a low-noise junction field-effect transistor interface, we effectively isolate the photodiode capacitance and suppress the apparent input capacitance seen by the core amplifier. Combined with active compensation of parasitic feedback reactance, this architecture mitigates the conventional trade-off between detector active area and signal bandwidth. Experimentally, we achieved a system-level input-referred noise floor of 13 $fA/\sqrt{Hz}$, closely approaching theoretical thermal limits. Furthermore, we achieved a six-fold extension in signal-to-noise limited bandwidth and, through the implementation of a novel grounded field plate, demonstrated a common-mode rejection ratio (CMRR) exceeding 30 dB up to 100 kHz. This highly scalable, silicon-based architecture effectively bridges the short-wavelength detection gap, establishing a robust experimental platform for next-generation quantum-noise-limited and quantum-enhanced X-ray measurement, as well as ultra-sensitive inspection and metrology applications in high-numerical-aperture EUV lithography.

Comments
16 pages, 11 figures

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