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arXiv:2603.01844

Mapping g-factors and complex intervalley coupling in Si/SiGe by conveyor-mode shuttling

Mats Volmer, Tom Struck, Arnau Sala, Jhih-Sian Tu, Stefan Trellenkamp, Davide Degli Esposti, Giordano Scappucci, Łukasz Cywiński, Hendrik Bluhm, Lars R. Schreiber

quant-phcond-mat.mtrl-sciSubmitted Mar 2, 2026• Announced Mar 3, 2026• Revised Jul 15, 2026 (v2)
v1 · Mar 2, 2026v2 · Jul 15, 2026v3 · Jul 24, 2026
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Abstract

As silicon spin qubit chips are increasing in qubit number and area, methods for the screening of qubit related material parameters become vital. Here we demonstrate the two-dimensional mapping of small variations of the electron g-factor of quantum dots formed in planar Si/SiGe quantum wells with precision better than $10^{-3}$ and with nanometer lateral resolution. We scan the electron g-factor across a 40 nm $\times$ 400 nm area and observe two g-factors per QD site which obey a striking symmetry and bimodal distribution across the area. These two g-factors relate to valley states of the electron in the quantum dot in agreement with a recent theoretical model. Using conveyor-belt shuttling of entangled electron spin pairs, complementary to the mapping of the local valley-splitting, we map the g-factor. We compare g-factor and valley splitting maps measured on the same device, and extract the complex intervalley coupling parameter along the shuttle trajectories applying a theoretical model of g-factor dependence on intervalley coupling. These maps will allow unprecedented insights into the spin-valley dynamics during qubit manipulation, readout and shuttling and serve as a benchmark for the engineering of Si/SiGe heterostructures for large-scale quantum chips.

Comments
21 pages, 10 Figures

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As silicon spin qubit chips are increasing in qubit number and area, methods for the screening of qubit related material parameters become vital. Here we demonstrate the two-dimensional mapping of small variations of the electron g-factor of quantum dots formed in planar Si/SiGe quantum wells with precision better than 10−310^{-3}10−3 and with nanometer lateral resolution. We scan the electron g-factor across a 40 nm ×\times× 400 nm area and observe two g-factors per QD site which obey a striking symmetry and bimodal distribution across the area. These two g-factors relate to valley states of the electron in the quantum dot in agreement with a recent theoretical model. Using conveyor-belt shuttling of entangled electron spin pairs, complementary to the mapping of the local valley-splitting, we map the g-factor. We compare g-factor and valley splitting maps measured on the same device, and extract the complex intervalley coupling parameter along the shuttle trajectories applying a theoretical model of g-factor dependence on intervalley coupling. These maps will allow unprecedented insights into the spin-valley dynamics during qubit manipulation, readout and shuttling and serve as a benchmark for the engineering of Si/SiGe heterostructures for large-scale quantum chips.
While bulk silicon has long been understood to exhibit relatively weak spin-orbit coupling (SOC), confinement of electrons to quantum dots (QDs) at a silicon heterointerface results in significantly larger SOC. This is a concern for electron spin qubit performance, as intravalley and intervalley SOC can significantly perturb the operation of electron spin qubits. While these interactions can be harnessed to drive coherent rotations in a singlet-triplet qubit, coupling to low-lying excited valley states can lead to undesirable spin relaxation when valley splitting is on resonance with the Zeeman energy. In this work, we measure the angular dependence of the interfacial spin-orbit interaction as a function of the direction and magnitude of an applied external magnetic field in SiMOS and Si/SiGe heterostructures, two common material platforms for silicon spin qubits. We construct a physical model that accurately infers intra- and inter-valley SOC physics from fits to the data, allowing for a direct comparison between these two material systems. For the devices measured we find that, while the ggg-factor differences are comparable, the SiMOS QDs exhibit an order of magnitude larger spin-valley coupling than for Si/SiGe. Moreover, we find that the angular dependence of the spin-valley coupling is similar for both devices, with similar magnetic field orientations minimizing the spin-valley coupling. Our work points towards operational schemes for optimizing spin-valley coupling to avoid or exploit this mechanism for qubit operation.
Conveyor-mode shuttling in gated Si/SiGe devices enables adiabatic transfer of single electrons, electron patterns and spin qubits confined in quantum dots across several microns with a scalable number of signal lines. To realize their full potential, linear shuttle lanes must connect into a two-dimensional grid with controllable routing. We introduce a T-junction device linking two independently driven shuttle lanes. Electron routing across the junction requires no extra control lines beyond the four channels per conveyor belt. We measure an inter-lane charge transfer fidelity of F=100.0000000−9×10−7+0 %F = 100.0000000^{+0}_{-9\times 10^{-7}}\,\%F=100.0000000−9×10−7+0​% at an instantaneous electron velocity of 270 mm s−1270\,\mathrm{mm}\,\mathrm{s}^{-1}270mms−1. The filling of 54 quantum dots is controlled by simple atomic pulses, allowing us to swap electron patterns, laying the groundwork for a native spin-qubit SWAP gate. This T-junction establishes a path towards scalable, two-dimensional quantum computing architectures with flexible spin qubit routing for quantum error correction.
Single electron spins can be used to encode and process information in semiconductor quantum devices. Progress has been hindered by materials challenges, such as the small energy splitting between low-lying valley states and hyperfine coupling to nuclear spins. Here we use density functional theory to optimize the valley splitting and spin dephasing time in realistic Si/SiGe heterostructures. Reductions in the Si quantum well width generally increase the valley splitting. However, in narrow quantum wells, a larger fraction of the electronic wavefunction resides in the SiGe buffer layers, which increases the hyperfine coupling with spinful 73^{73}73Ge. Our work shows that Si/SiGe heterostructures with 3~--~4~nm wide quantum wells and 73^{73}73Ge and 29^{29}29Si concentrations of 50 ppm should support average valley splittings EvE_{v}Ev​~>>>~500~μμμeV and spin dephasing times T2∗T_2^*T2∗​ exceeding 15~μμμs assuming an effective quantum dot area of 700 nm2^22. In addition, sharper Si/SiGe interfaces in general result in larger valley splittings and longer spin dephasing times.
Valley excitations are considered one of the biggest challenges for a coherent spin shuttling in Si/SiGe heterostructures. In this work we theoretically investigate the valley dynamics during spin shuttling in a Si/SiGe heterostructure by considering a two-level system given by the two low-lying valley states of the mobile quantum dot. We assume that the electron is initially in the valley ground state and analyze the evolution of this state during shuttling. We find that, depending on the shuttling velocity, the system can be in three distinct regimes. In one of these regimes, the quantum information is preserved even in the presence of the valley excitations, allowing for coherent spin shuttling independently of the shuttling distance. This regime is obtained for a shuttling velocity of tens of m/s, a desired regime where dephasing mechanisms, such as spin-valley hotspots and spatially varying spin splitting, can be suppressed. This result is in accordance with recent experimental work that obtained a high spin shuttling fidelity after a fast and long shuttling. We also propose strategies based on the Partial Landau-Zener model to enhance the valley shuttling fidelity, which was found to be much more efficient than previously proposed strategies based on the standard Landau-Zener model.
Spatial variations of the valley splitting in a quantum well present a key challenge for conveyor-mode shuttling of electron spins in Si/SiGe, giving rise to Landau-Zener-like excitations that cause leakage outside the qubit subspace. Here, we propose an unconventional two-electron qubit encoding, based on valley-singlet states, that is largely immune to Landau-Zener leakage processes. In contrast to single-electron spins, the shuttling fidelity actually improves for small valley splittings, in this case. We show that high fidelities can be achieved without applying any special procedures, such as fine-tuning of the shuttling path.
Recent advances in coherent conveyor-mode spin qubit shuttling are paving the way for large-scale quantum computing platforms with qubit connectivity achieved by spin qubit shuttles. We developed a simulation tool to investigate numerically the impact of device imperfections on the spin-coherence of conveyor-mode shuttling in Si/SiGe. We simulate the quantum evolution of a mobile electron spin-qubit under the influence of sparse and singly charged point defects placed in the Si/SiGe heterostructure in close proximity to the shuttle lane. We consider different locations of a single charge defect with respect to the center of the shuttle lane, multiple orbital states of the electron in the shuttle with ggg-factor differences between the orbital levels, and orbital relaxation induced by electron-phonon interaction. With this simulation framework, we identify the critical defect density of charged point defects in the heterostructure for conveyor-mode spin qubit shuttle devices and quantify the impact of a single defect on the coherence of a qubit.