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arXiv:2601.20091 · Nature Materials

Krypton-sputtered tantalum films for scalable high-performance quantum devices

Maciej W. Olszewski, Lingda Kong, Simon Reinhardt, Daniel Tong, Xinyi Du, Gabriele Di Gianluca, Haoran Lu, Saswata Roy, Luojia Zhang, Aleksandra B. Biedron, David A. Muller, Valla Fatemi

quant-phcond-mat.mtrl-sciSubmitted Jan 27, 2026• Announced Jan 29, 2026• 2 citations
arXivHTMLPDF

Abstract

Superconducting qubits based on tantalum (Ta) thin films have demonstrated the highest-performing microwave resonators and qubits. This makes Ta an attractive material for superconducting quantum computing applications, but, so far, direct deposition has largely relied on high substrate temperatures exceeding \SI{400}{\celsius} to achieve the body-centered cubic phase, BCC (\textalpha-Ta). This leads to compatibility issues for scalable fabrication leveraging standard semiconductor fabrication lines. Here, we show that changing the sputter gas from argon (Ar) to krypton (Kr) promotes BCC Ta synthesis on silicon (Si) at temperatures as low as \SI{200}{\celsius}, providing a wide process window compatible with back-end-of-the-line fabrication standards. Furthermore, we find these films to have substantially higher electronic conductivity, consistent with clean-limit superconductivity. We validated the microwave performance through coplanar waveguide resonator measurements, finding that films deposited at \SI{250}{\celsius} and \SI{350}{\celsius} exhibit a tight performance distribution at the state of the art. Higher temperature-grown films exhibit higher losses, in correlation with the degree of Ta/Si intermixing revealed by cross-sectional transmission electron microscopy. Finally, with these films, we demonstrate transmon qubits with a relatively compact, \SI{20}{\micro\meter} capacitor gap, achieving a median quality factor up to 14 million.

DOI
10.1038/s41563-026-02718-z

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Superconducting qubits and microwave resonators based on tantalum thin films have recently demonstrated large increases in performance. This makes Ta an at- tractive material for superconducting quantum computing applications, but, so far, direct deposition has largely relied on high substrate temperatures exceeding 400 ◦C to achieve the cubic (BCC) phase of tantalum. Here, we show that changing the sputter gas from argon to krypton promotes synthesis of very high crystallinity BCC tantalum films on silicon at temperatures as low as 200 ◦C. This provides a wide process window compatible with back-end-of-the-line fabrication standards. The microwave performance of coplanar waveguide resonators fabricated from krypton-sputtered films shows a tight performance distribution at the state of the art. Higher temperature-grown films exhibit higher losses, in correlation with the degree of tantalum/silicon intermixing. Finally, with these films, we demonstrate transmon qubits with a relatively compact, 20 μm capacitor gap, achieving a time-averaged quality factor up to 16.9 million.

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Superconducting qubits based on tantalum (Ta) thin films have demonstrated the highest-performing microwave resonators and qubits. This makes Ta an attractive material for superconducting quantum computing applications, but, so far, direct deposition has largely relied on high substrate temperatures exceeding \SI{400}{\celsius} to achieve the body-centered cubic phase, BCC (\textalpha-Ta). This leads to compatibility issues for scalable fabrication leveraging standard semiconductor fabrication lines. Here, we show that changing the sputter gas from argon (Ar) to krypton (Kr) promotes BCC Ta synthesis on silicon (Si) at temperatures as low as \SI{200}{\celsius}, providing a wide process window compatible with back-end-of-the-line fabrication standards. Furthermore, we find these films to have substantially higher electronic conductivity, consistent with clean-limit superconductivity. We validated the microwave performance through coplanar waveguide resonator measurements, finding that films deposited at \SI{250}{\celsius} and \SI{350}{\celsius} exhibit a tight performance distribution at the state of the art. Higher temperature-grown films exhibit higher losses, in correlation with the degree of Ta/Si intermixing revealed by cross-sectional transmission electron microscopy. Finally, with these films, we demonstrate transmon qubits with a relatively compact, \SI{20}{\micro\meter} capacitor gap, achieving a median quality factor up to 14 million.
Superconducting qubits and microwave resonators based on tantalum thin films have recently demonstrated large increases in performance. This makes Ta an at- tractive material for superconducting quantum computing applications, but, so far, direct deposition has largely relied on high substrate temperatures exceeding 400 ◦C to achieve the cubic (BCC) phase of tantalum. Here, we show that changing the sputter gas from argon to krypton promotes synthesis of very high crystallinity BCC tantalum films on silicon at temperatures as low as 200 ◦C. This provides a wide process window compatible with back-end-of-the-line fabrication standards. The microwave performance of coplanar waveguide resonators fabricated from krypton-sputtered films shows a tight performance distribution at the state of the art. Higher temperature-grown films exhibit higher losses, in correlation with the degree of tantalum/silicon intermixing. Finally, with these films, we demonstrate transmon qubits with a relatively compact, 20 μm capacitor gap, achieving a time-averaged quality factor up to 16.9 million.
Superconducting qubits are a promising platform for large-scale quantum computing. Besides the Josephson junction, most parts of a superconducting qubit are made of a planar, patterned superconducting thin films. In the past, most qubit architectures have relied on niobium (Nb) as the material of choice for the superconducting layer. However, there is also a variety of alternative materials with potentially less losses, which may thereby result in increased qubit performance. One such material is tantalum (Ta), for which high-performance qubit components have already been demonstrated. In this study, we report the sputter-deposition of Ta thin films directly on heated and unheated silicon (Si) substrates as well as onto different, nanometer-thin seed layers from tantalum nitride (TaN), titanium nitride (TiN) or aluminum nitride (AIN) that were deposited first. The thin films are characterized in terms of surface morphology, crystal structure, phase composition, critical temperature, residual resistance ratio (RRR) and RF-performance. We obtain thin films indicative of pure alpha-Ta for high temperature (600°C) sputtering directly on silicon and for Ta deposited on TaN or TiN seed layers. Coplanar waveguide (CPW) resonator measurements show that the Ta deposited directly on the heated silicon substrate performs best with internal quality factors Qi reaching 1xl06in the single-photon regime, measured at T=100 mK.
Abstract The use of α -tantalum in superconducting circuits has enabled a considerable improvement in the coherence time of transmon qubits. The standard approach to grow α -tantalum thin films on silicon involves heating the substrate, which takes several hours per deposition and prevents the integration of this material with wafers containing temperature-sensitive components. We report a detailed experimental study of an alternative growth method of α -tantalum on silicon, which is achieved at room temperature through the use of a niobium seed layer. Despite a substantially higher density of oxygen-rich grain boundaries in the films sputtered at room temperature, resonators made from these films are found to have state-of-the-art quality factors, comparable to resonators fabricated from tantalum grown at high temperature. This finding challenges previous assumptions about correlations between material properties and microwave loss of superconducting thin films, and opens a new avenue for the integration of tantalum into fabrication flows with limited thermal budget.
Tantalum (Ta) is a promising material for reaching long coherence times in superconducting qubits. A detailed understanding of the underlying structure-property relationship remains elusive though. In the present study, we sputter-deposited 200 nm thick Ta films on high-resistivity silicon (100) substrates at temperatures ranging from T = 20°C to 600°C, as well as on different seed layers (Nb, TiN and TaN). Alpha-Ta thin films were readily obtained at temperatures above 500°C and on all seed layers. The films were characterized in terms of surface morphology, residual-resistance ratio, crystal phase composition and superconducting transition temperature, as well as RF-performance using coplanar waveguide resonators. Internal quality factors of up to 1.5 million were measured at 100 mK in the single-photon regime. Despite similar bulk material properties, alpha-Ta films on different seed layers exhibit markedly different RF-performance, which we attribute to dissimilar strain and structural defects at the substrate-metal interfaces. Williamson-Hall analysis of XRD data reveals a clear correlation between decreasing microstrain and increasing quality factor. Cross-sectional HR-TEM further supports this interpretation by directly resolving interfacial disorder. Our results highlight the critical role of interface engineering in optimizing superconducting thin films for low-loss quantum computing circuitry.
Abstract Tantalum (Ta) has recently received considerable attention in manufacturing robust superconducting quantum circuits. Ta offers low microwave loss, high kinetic inductance compared to aluminium (Al) and niobium (Nb), and good compatibility with complementary metal-oxide-semiconductor (CMOS) technology, which is essential for quantum computing applications. Here we demonstrate the fabrication engineering of thickness-dependent high-quality-factor (high-  Qi\:{Q}_{i}Qi​ ) Ta superconducting microwave coplanar waveguide resonators. All films are deposited on high-resistivity silicon substrates at room temperature without additional substrate heating. Before Ta deposition, a niobium (Nb) seed layer is used to promote a body-centred cubic lattice (  α \:\alpha\:α -Ta) formation. We further engineer the kinetic inductance (  LK\:{L}_{K}LK​ ) of the resonators by varying Ta film thicknesses. High  LK\:{L}_{K}LK​ is a key advantage for applications because it facilitates the realisation of high-impedance, compact quantum circuits with enhanced coupling to qubits. The maximum internal quality factor  Qi\:{Q}_{i}Qi​ of  ∼ \:\sim\:∼ 3.6 × 10 6 in the high power regime and  Qi\:{Q}_{i}Qi​ of  ∼ \:\sim\:∼ 4.5 × 10 5 in the single-photon regime is achieved for 100 nm Ta which represents an improvement over previous room-temperature deposited Ta resonators on silicon substrates in the single photon regime, while the highest kinetic inductance of 0.6 pH/sq is obtained for the thinnest film, which is 40 nm. This combination of high  Qi\:{Q}_{i}Qi​ and high  LK\:{L}_{K}LK​ highlights the potential of Ta microwave circuits for high-fidelity operation of compact quantum circuits.
Tantalum thin films sputtered on unheated silicon substrates are characterized with microwaves at around 10 GHz in a 10 mK environment. We show that the phase of tantalum with a body-centered cubic lattice (α-Ta) can be grown selectively by depositing a niobium buffer layer prior to a tantalum film. The physical properties of the films, such as superconducting transition temperature and crystallinity, change markedly with the addition of the buffer layer. Coplanar waveguide resonators based on the composite film exhibit significantly enhanced internal quality factors compared with a film without the buffer layer. The internal quality factor approaches 2 × 107 at a large-photon-number limit. While the quality factor decreases at the single-photon level owing to two-level system (TLS) loss, we have deduced that one of the causes of TLS loss is the amorphous silicon layer at the film–substrate interface, which originates from the substrate cleaning before the film deposition rather than the film itself. The temperature dependence of the internal quality factors shows a marked rise below 200 mK, suggesting the presence of TLS–TLS interactions. The present low-loss tantalum films can be deposited without substrate heating and thus have various potential applications in superconducting quantum electronics.