arXiv:2211.16437 · Materials for Quantum Technology
Low-loss α-tantalum coplanar waveguide resonators on silicon wafers: fabrication, characterization and surface modification
Daniel Pérez Lozano, Massimo Mongillo, X Piao, Sébastien Couet, D Wan, Yann Canvel, A. M. Vadiraj, Todor Trendafilov Ivanov, Jeroen Verjauw, R. Acharya, Jo Van Damme, Fahd A. Mohiyaddin, Julien Jussot, Pallavi Puttarame Gowda, Antoine Pacco, Bart Raes, Joris Van de Vondel, Iuliana P. Radu, B. Govoreanu, J. Swerts, Anton Potočnik, Kristiaan De Greve
Abstract The performance of state-of-the-art superconducting quantum devices is currently limited by microwave dielectric loss at different interfaces. α -tantalum is a superconductor that has proven effective in reducing dielectric loss and improving device performance due to its thin low-loss oxide. Here, we demonstrate the fabrication of high-quality factor α -tantalum coplanar-waveguide resonators directly on pristine 300 mm silicon wafers over a variety of metal deposition conditions and perform a comprehensive material and electrical characterization study. Additionally, we apply a surface treatment based on hydrofluoric acid that allows us to modify different resonators surfaces, leading to a reduction in two-level system loss in the devices by a factor of three. This loss reduction can be entirely attributed to the removal of surface oxides. Our study indicates that large scale manufacturing of low-loss superconducting circuits should indeed be feasible and suggests a viable avenue to materials-driven advancements in superconducting circuit performance.
Abstract The performance of state-of-the-art superconducting quantum devices is currently limited by microwave dielectric loss at different interfaces. α -tantalum is a superconductor that has proven effective in reducing dielectric loss and improving device performance due to its thin low-loss oxide. Here, we demonstrate the fabrication of high-quality factor α -tantalum coplanar-waveguide resonators directly on pristine 300 mm silicon wafers over a variety of metal deposition conditions and perform a comprehensive material and electrical characterization study. Additionally, we apply a surface treatment based on hydrofluoric acid that allows us to modify different resonators surfaces, leading to a reduction in two-level system loss in the devices by a factor of three. This loss reduction can be entirely attributed to the removal of surface oxides. Our study indicates that large scale manufacturing of low-loss superconducting circuits should indeed be feasible and suggests a viable avenue to materials-driven advancements in superconducting circuit performance.
We demonstrate a substantial reduction in two-level system loss in tantalum coplanar waveguide resonators fabricated on high-resistivity silicon substrates through the use of an ultrathin titanium sacrificial layer. A 0.2nm titanium film, deposited atop pre-sputtered α-tantalum, acts as a solid-state oxygen getter that chemically modifies the native Ta oxide at the metal-air interface. After device fabrication, the titanium layer is removed using buffered oxide etchant, leaving behind a chemically reduced Ta oxide surface. Subsequent high-vacuum annealing further suppresses two-level system loss. Resonators treated with this process exhibit internal quality factors Qi exceeding an average of 1.5 million in the single-photon regime across ten devices, over three times higher than otherwise identical devices lacking the titanium layer. These results highlight the critical role of interfacial oxide chemistry in superconducting loss and reinforce atomic-scale surface engineering as an effective approach to improving coherence in tantalum-based quantum circuits. The method is compatible with existing fabrication workflows applicable to tantalum films, offering a practical route to further extending T1 lifetimes in superconducting qubits.
Tantalum is a promising platform for superconducting quantum circuits, yet coherence times remain limited by dielectric losses from interfacial two-level systems (TLS), exacerbated by native oxide regrowth. Here, we implement molecular surface passivation using self-assembled organic monolayers on freshly etched tantalum and silicon in coplanar waveguide resonators. Surface characterization by contact angle, XPS, FTIR and TEM confirm the formation of ordered, nanometer-thick films that suppress oxide formation. Microwave measurements in the ~5-9 GHz range reveal internal quality factors up to 1.8x10^6 in the single-photon regime at 100 mK, representing a ~140% improvement over untreated devices with native oxide. Power and temperature dependent measurements attribute this enhancement to reduced TLS-induced losses. These results demonstrate that molecular passivation effectively engineers low-loss interfaces and provides a scalable route toward high-coherence superconducting quantum devices.
Niobium and aluminum have been widely used to realize superconducting resonators and qubits. However, the native oxide at the metal air interface limits the devices results. This layer is highly disordered, and it induces losses limiting the performances of the resonators or qubits. Recently, tantalum led to great improvement in qubit relaxation time. This improvement has been attributed to a thinner and less disordered oxide layer compared to Nb and Al. This study is aimed to limit the formation of the oxide layer, by the introduction of novel superconducting materials such as rhenium or by encapsulating the Nb surface with other superconducting materials such as Ta, Al, Re or other non-superconducting materials such as Au. To better understand the results, we are realizing these studies on coplanar waveguide resonators where the relation between surface losses and quality factor is clear. We are also analyzing different fabrication techniques to completely characterize our devices, linking material properties to the performances. In this work we are also varying the participation ratio of the devices in order to extract with higher fidelity and precision the losses introduced by the involved interfaces.
Superconducting coplanar waveguide resonators are essential components in quantum processors, where their internal quality factor (Qi) constrains qubit coherence and readout fidelity. In niobium devices, microwave losses at millikelvin temperatures are strongly influenced by two-level systems (TLS) associated with the complex NbOx surface oxide. To mitigate these losses, we investigate a surface-engineering approach in which Nb films are capped in situ with a thin tantalum layer to suppress Nb2O5 formation and replace the native NbOx interface with a Ta-based oxide.
We fabricate Nb/Ta bilayer and reference Nb resonators on high-resistivity silicon using identical DC sputtering and wet etching conditions, and characterize their performance at millikelvin temperatures. Fresh Ta-encapsulated devices exhibit internal quality factors up to 2.4 x 10^6 in the near-single-photon regime, with power dependence consistent with reduced TLS-related loss at the metal-air interface. A control Nb device fabricated under the same process shows comparatively lower Q_TLS, consistent with the beneficial effect of the Ta capping layer. Furthermore, ageing tests performed on Nb/Ta resonators after six months reveal a moderate reduction in Q_TLS relative to their initial values, yet the performance remains superior to newly fabricated Nb-only devices. These results suggest that thin Ta encapsulation enhances interface quality and contributes to improved temporal stability while remaining compatible with Nb-based fabrication workflows.
Abstract The use of α -tantalum in superconducting circuits has enabled a considerable improvement in the coherence time of transmon qubits. The standard approach to grow α -tantalum thin films on silicon involves heating the substrate, which takes several hours per deposition and prevents the integration of this material with wafers containing temperature-sensitive components. We report a detailed experimental study of an alternative growth method of α -tantalum on silicon, which is achieved at room temperature through the use of a niobium seed layer. Despite a substantially higher density of oxygen-rich grain boundaries in the films sputtered at room temperature, resonators made from these films are found to have state-of-the-art quality factors, comparable to resonators fabricated from tantalum grown at high temperature. This finding challenges previous assumptions about correlations between material properties and microwave loss of superconducting thin films, and opens a new avenue for the integration of tantalum into fabrication flows with limited thermal budget.
Abstract Quantum bits (qubits) with long coherence times are an important element for the implementation of medium- and large-scale quantum computers. In the case of superconducting planar qubits, understanding and improving qubits’ quality can be achieved by studying superconducting planar resonators. In this paper, we fabricate and characterize coplanar waveguide resonators made from aluminum thin films deposited on silicon substrates. We perform three different substrate surface treatments prior to aluminum deposition: one chemical treatment based on a hydrofluoric acid clean; one physical treatment consisting of a thermal annealing at 880 °C in high vacuum; and one combined treatment comprising both the chemical and the physical treatments. The aim of these treatments is to remove the two-level state (TLS) defects hosted by the native oxides residing at the various samples’ interfaces. We first characterize the fabricated samples through cross-sectional tunneling electron microscopy, acquiring electron energy loss spectroscopy maps of the samples’ cross sections. These measurements show that both the chemical and the physical treatments almost entirely remove native silicon oxide from the substrate surface and that their combination results in the cleanest interface. Additionally, we analyze the effects of the various substrate treatments on the roughness of the silicon surface by means of atomic force microscopy surface morphology mapping. We then study the quality of the resonators by means of microwave measurements in the ‘quantum regime’, i.e., at a temperature T ∼ 10 mK and at a mean microwave photon number 〈 n ph 〉 ∼ 1 . In this regime, we find that both surface treatments independently improve the resonator’s intrinsic quality factor by ≈172%. The highest quality factor is obtained for the combined treatment, Q i ≈ 0.82 million, corresponding to an improvement by ≈256%. Finally, we find that the TLS quality factor averaged over a time period of 3 h is ∼3 million at 〈 n ph 〉 ∼ 10 , indicating that substrate surface engineering can potentially reduce the TLS loss below other losses such as quasiparticle loss and flux noise.