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Material exploration towards high quality factor microwave resonators

Francesco Crisa, S. Garattoni, Jaeyel Lee, Paul Heidler, D. M. T. van Zanten, Zuhawn Sung, Songyan Zhu, Akshay A. Murthy, J. Zasadzinski, A. Romanenko, Mustafa Bal, A. Grassellino

Published Sep 26, 2024• 0 citations
Publisher

Abstract

Niobium and aluminum have been widely used to realize superconducting resonators and qubits. However, the native oxide at the metal air interface limits the devices results. This layer is highly disordered, and it induces losses limiting the performances of the resonators or qubits. Recently, tantalum led to great improvement in qubit relaxation time. This improvement has been attributed to a thinner and less disordered oxide layer compared to Nb and Al. This study is aimed to limit the formation of the oxide layer, by the introduction of novel superconducting materials such as rhenium or by encapsulating the Nb surface with other superconducting materials such as Ta, Al, Re or other non-superconducting materials such as Au. To better understand the results, we are realizing these studies on coplanar waveguide resonators where the relation between surface losses and quality factor is clear. We are also analyzing different fabrication techniques to completely characterize our devices, linking material properties to the performances. In this work we are also varying the participation ratio of the devices in order to extract with higher fidelity and precision the losses introduced by the involved interfaces.

DOI
10.2172/2448577

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Niobium and aluminum have been widely used to realize superconducting resonators and qubits. However, the native oxide at the metal air interface limits the devices results. This layer is highly disordered, and it induces losses limiting the performances of the resonators or qubits. Recently, tantalum led to great improvement in qubit relaxation time. This improvement has been attributed to a thinner and less disordered oxide layer compared to Nb and Al. This study is aimed to limit the formation of the oxide layer, by the introduction of novel superconducting materials such as rhenium or by encapsulating the Nb surface with other superconducting materials such as Ta, Al, Re or other non-superconducting materials such as Au. To better understand the results, we are realizing these studies on coplanar waveguide resonators where the relation between surface losses and quality factor is clear. We are also analyzing different fabrication techniques to completely characterize our devices, linking material properties to the performances. In this work we are also varying the participation ratio of the devices in order to extract with higher fidelity and precision the losses introduced by the involved interfaces.
Superconducting coplanar waveguide resonators are essential components in quantum processors, where their internal quality factor (Qi) constrains qubit coherence and readout fidelity. In niobium devices, microwave losses at millikelvin temperatures are strongly influenced by two-level systems (TLS) associated with the complex NbOx surface oxide. To mitigate these losses, we investigate a surface-engineering approach in which Nb films are capped in situ with a thin tantalum layer to suppress Nb2O5 formation and replace the native NbOx interface with a Ta-based oxide. We fabricate Nb/Ta bilayer and reference Nb resonators on high-resistivity silicon using identical DC sputtering and wet etching conditions, and characterize their performance at millikelvin temperatures. Fresh Ta-encapsulated devices exhibit internal quality factors up to 2.4 x 10^6 in the near-single-photon regime, with power dependence consistent with reduced TLS-related loss at the metal-air interface. A control Nb device fabricated under the same process shows comparatively lower Q_TLS, consistent with the beneficial effect of the Ta capping layer. Furthermore, ageing tests performed on Nb/Ta resonators after six months reveal a moderate reduction in Q_TLS relative to their initial values, yet the performance remains superior to newly fabricated Nb-only devices. These results suggest that thin Ta encapsulation enhances interface quality and contributes to improved temporal stability while remaining compatible with Nb-based fabrication workflows.
Resonators and qubits with a niobium (Nb) base metal layer achieve some of the highest coherence times in superconducting quantum devices. The performance of such devices is often limited by loss associated with two-level systems, which are found primarily at material surfaces and interfaces. The metal-air (MA) interface is a major contributor to device loss. In this work, we develop a fast-sealing microwave cavity that enables devices to be placed under vacuum within five minutes of oxide removal, thereby significantly reducing the MA interface loss compared to common device processing and packaging approaches. Using coplanar stripline resonators, we demonstrate that devices sealed in such a cavity exhibit internal quality factors exceeding one million at single-photon power. After re-exposure to air, the devices show downward resonance frequency shifts and quality factor degradations, quantitatively consistent with a model of Nb oxide regrowth. The fast-sealing microwave cavity provides a practical and consistent method to mitigate MA interface loss and sustain high coherence in Nb devices, and establishes a controlled platform for studying metal oxide regrowth kinetics and dielectric properties, the understanding of which is critical to achieving high coherence in superconducting quantum devices.
Abstract The performance of state-of-the-art superconducting quantum devices is currently limited by microwave dielectric loss at different interfaces. α -tantalum is a superconductor that has proven effective in reducing dielectric loss and improving device performance due to its thin low-loss oxide. Here, we demonstrate the fabrication of high-quality factor α -tantalum coplanar-waveguide resonators directly on pristine 300 mm silicon wafers over a variety of metal deposition conditions and perform a comprehensive material and electrical characterization study. Additionally, we apply a surface treatment based on hydrofluoric acid that allows us to modify different resonators surfaces, leading to a reduction in two-level system loss in the devices by a factor of three. This loss reduction can be entirely attributed to the removal of surface oxides. Our study indicates that large scale manufacturing of low-loss superconducting circuits should indeed be feasible and suggests a viable avenue to materials-driven advancements in superconducting circuit performance.
Transmon qubits have become a leading technology in quantum information science (QIS), with fabrication techniques widely accessible. Historically, devices were predominantly made from aluminum (A1) and niobium (Nb), but state-of-the-art transmons now use tantalum (Ta) achieving coherence times up to and exceeding 0.5 milliseconds [1]–[3]. The differentiation in performance between Ta and Nb-based devices is attributed to the surface oxidation states affecting Two-Level-System (TLS) noise. One approach to quickly evaluating material and device performance consists of fabricating only the readout resonator of a qubit and evaluating the quality factor which is the strategy employed in this project. Our research focuses on Ta coplanar waveguide (CPW) resonators fabricated using a damascene technique producing pristine metal structures within silicon substrates. This approach increases the dielectric substrate's participation ratio while keeping device edges oxide-free due to entrenchment. This collaborative effort, involving Pacific Northwest National Laboratory (PNNL), NY CREATES/SUNY Poly, and Brookhaven National Laboratory (BNL), has resulted in resonators with Q factors as high as 104at low power. Ongoing studies aim to further understand and improve device performance by systematic analysis of oxygen trapped between device layers during processing. This research showcases the potential for significant improvements in superconducting qubit performance via the damascene process, heralding new possibilities for the advancement of scalable QIS technology.
To improve the performance of state-of-the-art superconducting quantum devices, microwave loss due to defects at amorphous interfacial layers must be reduced, via proper surface treatment. The authors study niobium resonators after removing native oxides by HF etching, which reduces losses about tenfold and yields a quality factor of $7\ifmmode\times\else\texttimes\fi{}{10}^{6}$ in the single-photon limit. Losses reappear as oxides form upon exposure to air; Nb2{}_{2}2​O5{}_{5}5​ is the only surface oxide that grows significantly in the first week. These findings are of interest for a panoply of devices, inluding superconducting qubits, quantum-limited amplifiers, microwave kinetic-inductance detectors, and single-photon detectors.
Understanding the correlation between material properties and microwave losses in superconducting films is a crucial subject for developing low-loss materials for quantum circuits. We focus on vanadium (V) as a novel material for superconducting quantum devices and discuss loss in V films in relation to their structural properties. Using a sputtering method, we grow four V-film structures on (001)-oriented Si wafers, employing Nb and Ta as the buffer and capping layer materials, respectively: Nb/V/Ta, Nb/V, V/Ta, and V. X-ray diffraction and atomic force microscopy reveal that the V films grown on the Nb buffer layers have higher uniformity of lattice orientation and smaller grain size than that directly grown on the Si wafer. Coplanar waveguide resonators are fabricated from the four V-film structures, and averaged photon number (⟨nph⟩\langle n_{\rm ph} \rangle⟨nph​⟩) dependences of internal quality factor (QintQ_{\rm int}Qint​) are obtained by performing microwave measurements. By analyzing the obtained QintQ_{\rm int}Qint​ vs ⟨nph⟩\langle n_{\rm ph} \rangle⟨nph​⟩, it is found that loss at the V surface is dominated by ⟨nph⟩\langle n_{\rm ph} \rangle⟨nph​⟩-independent non-two-level-system (non-TLS) losses, which can be mitigated by introducing the Ta capping layer. Furthermore, the V films on the Nb buffer layers exhibit lower QintQ_{\rm int}Qint​ in the ⟨nph⟩\langle n_{\rm ph} \rangle⟨nph​⟩ range from 100^{0}0 to 106^{6}6 and higher non-TLS loss than that directly grown on Si wafers, even though the former has higher lattice-orientation uniformity than the latter. Origins of these trends might be relevant to V oxides, of which presence at surfaces and grain boundaries in bulk regions in the V resonators is suggested by energy dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy, and/or V hydrides.